Citation: Sw. Or et al., ULTRASONIC WIRE-BOND QUALITY MONITORING USING PIEZOELECTRIC SENSOR, Sensors and actuators. A, Physical, 65(1), 1998, pp. 69-75
Citation: Vc. Lo et Jz. Sun, SIMULATION OF UPHILL DIFFUSION BEHAVIOR OF SI-IMPLANTED GAAS, Modelling and simulation in materials science and engineering, 4(6), 1996, pp. 613-621
Citation: Vc. Lo et al., MODELING OF ARGON-IMPLANTATION-INDUCED BORON REDISTRIBUTION IN SILICON, Modelling and simulation in materials science and engineering, 4(2), 1996, pp. 179-191
Citation: Vc. Lo et al., MODELING OF DAMAGE ENHANCED DIFFUSION OF IMPLANTED BORON IN SILICON, Modelling and simulation in materials science and engineering, 2(3), 1994, pp. 395-408
Citation: Cs. Ma et al., DEEP-LEVEL PHOTOLUMINESCENCE STUDIES OF UNDOPED AND TIN-DOPED (LEC) INP, Journal of materials science. Materials in electronics, 5(4), 1994, pp. 215-220
Citation: Cs. Ma et al., INVESTIGATION OF THE 1.20-EV PHOTOLUMINESCENCE BAND IN RAPID THERMAL ANNEALED INP, Journal of electronic materials, 23(5), 1994, pp. 459-464
Citation: Sp. Wong et al., SIMS STUDY OF IMPLANTATION-INDUCED BORON REDISTRIBUTION IN SILICON, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 90(1-4), 1994, pp. 487-490