ACNP - Italian Periodicals Catalogue

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Results: 1-11 |

Results: 11

MICROCOILS FABRICATED BY UV DEPTH LITHOGRAPHY AND GALVANOPLATING

Authors: LOCHEL B MACIOSSEK A ROTHE M WINDBRACKE W

Citation: B. Lochel et al., MICROCOILS FABRICATED BY UV DEPTH LITHOGRAPHY AND GALVANOPLATING, Sensors and actuators. A, Physical, 54(1-3), 1996, pp. 663-668

ELECTRODEPOSITED MAGNETIC-ALLOYS FOR SURFACE MICROMACHINING

Authors: LOCHEL B MACIOSSEK A

Citation: B. Lochel et A. Maciossek, ELECTRODEPOSITED MAGNETIC-ALLOYS FOR SURFACE MICROMACHINING, Journal of the Electrochemical Society, 143(10), 1996, pp. 3343-3348

ULTRAVIOLET DEPTH LITHOGRAPHY AND GALVANOFORMING FOR MICROMACHINING

Authors: LOCHEL B MACIOSSEK A QUENZER HJ WAGNER B

Citation: B. Lochel et al., ULTRAVIOLET DEPTH LITHOGRAPHY AND GALVANOFORMING FOR MICROMACHINING, Journal of the Electrochemical Society, 143(1), 1996, pp. 237-244

MAGNETICALLY DRIVEN MICROSTRUCTURES FABRICATED WITH MULTILAYER ELECTROPLATING

Authors: LOCHEL B MACIOSSEK A QUENZER HJ WAGNER B ENGELMANN G

Citation: B. Lochel et al., MAGNETICALLY DRIVEN MICROSTRUCTURES FABRICATED WITH MULTILAYER ELECTROPLATING, Sensors and actuators. A, Physical, 46(1-3), 1995, pp. 98-103

FABRICATION OF 100 NM POLYSILICON-EMITTER TRANSISTORS USING E-BEAM LITHOGRAPHY

Authors: WEBSTER MN TUINHOUT A VERBRUGGEN AH ROMIJN J RADELAAR S LOCHEL B JOS HFF MOORS PMA

Citation: Mn. Webster et al., FABRICATION OF 100 NM POLYSILICON-EMITTER TRANSISTORS USING E-BEAM LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 91-94

GALVANOPLATING AND SACRIFICIAL LAYERS FOR SURFACE MICROMACHINING

Authors: MACIOSSEK A LOCHEL B QUENZER HJ WAGNER B SCHULZE S NOETZEL J

Citation: A. Maciossek et al., GALVANOPLATING AND SACRIFICIAL LAYERS FOR SURFACE MICROMACHINING, Microelectronic engineering, 27(1-4), 1995, pp. 503-508

3D STRUCTURES FOR MICROSYSTEM TECHNOLOGY USING PROXIMITY LITHOGRAPHY

Authors: CULLMANN E LOCHEL B ENGELMANN G REYERSE C

Citation: E. Cullmann et al., 3D STRUCTURES FOR MICROSYSTEM TECHNOLOGY USING PROXIMITY LITHOGRAPHY, Solid state technology, 38(3), 1995, pp. 93

METALLIZATION OF SUBMICRON MICROWAVE BIPOLAR-TRANSISTORS BY ELECTROPLATING

Authors: WEBSTER MN TUINHOUT A LOCHEL B VERBRUGGEN AH ROMIJN J VANDERDRIFT E RADELAAR S JOS HFF MOORS PMA

Citation: Mn. Webster et al., METALLIZATION OF SUBMICRON MICROWAVE BIPOLAR-TRANSISTORS BY ELECTROPLATING, Microelectronic engineering, 23(1-4), 1994, pp. 441-444

GALVANOPLATED 3D STRUCTURES FOR MICRO SYSTEMS

Authors: LOCHEL B MACIOSSEK A KONIG M QUENZER HJ HUBER HL

Citation: B. Lochel et al., GALVANOPLATED 3D STRUCTURES FOR MICRO SYSTEMS, Microelectronic engineering, 23(1-4), 1994, pp. 455-459

DIAMOND MEMBRANES WITH CONTROLLED STRESS FOR SUBMICRON LITHOGRAPHY

Authors: SCHAFER L BLUHM A KLAGES CP LOCHEL B BUCHMANN LM HUBER HL

Citation: L. Schafer et al., DIAMOND MEMBRANES WITH CONTROLLED STRESS FOR SUBMICRON LITHOGRAPHY, DIAMOND AND RELATED MATERIALS, 2(8), 1993, pp. 1191-1196

FABRICATION OF MAGNETIC MICROSTRUCTURES BY USING THICK LAYER RESISTS

Authors: LOCHEL B MACIOSSEK A KONIG M HUBER HL BAUER G

Citation: B. Lochel et al., FABRICATION OF MAGNETIC MICROSTRUCTURES BY USING THICK LAYER RESISTS, Microelectronic engineering, 21(1-4), 1993, pp. 463-466

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