AAAAAA

   
Results: 1-8 |
Results: 8
ADSORPTION OF METAL-IONS ONTO HYDROPHILIC SILICON SURFACES FROM AQUEOUS-SOLUTION - EFFECT OF PH
Authors: LOEWENSTEIN LM MERTENS PW
Citation: Lm. Loewenstein et Pw. Mertens, ADSORPTION OF METAL-IONS ONTO HYDROPHILIC SILICON SURFACES FROM AQUEOUS-SOLUTION - EFFECT OF PH, Journal of the Electrochemical Society, 145(8), 1998, pp. 2841-2847
ONLINE DIAGNOSTIC MONITORING OF PHOTORESIST ASHING
Authors: STEFANI J LOEWENSTEIN LM SULLIVAN M
Citation: J. Stefani et al., ONLINE DIAGNOSTIC MONITORING OF PHOTORESIST ASHING, IEEE transactions on semiconductor manufacturing, 8(1), 1995, pp. 2-9
HIGH-SPEED SPECTRAL ELLIPSOMETRY FOR IN-SITU DIAGNOSTICS AND PROCESS-CONTROL
Authors: DUNCAN WM HENCK SA KUEHNE JW LOEWENSTEIN LM MAUNG S
Citation: Wm. Duncan et al., HIGH-SPEED SPECTRAL ELLIPSOMETRY FOR IN-SITU DIAGNOSTICS AND PROCESS-CONTROL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2779-2784
1ST-WAFER EFFECT IN REMOTE PLASMA PROCESSING - THE STRIPPING OF PHOTORESIST, SILICON-NITRIDE, AND POLYSILICON
Authors: LOEWENSTEIN LM STEFANI JA BUTLER SW
Citation: Lm. Loewenstein et al., 1ST-WAFER EFFECT IN REMOTE PLASMA PROCESSING - THE STRIPPING OF PHOTORESIST, SILICON-NITRIDE, AND POLYSILICON, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2810-2817
SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE
Authors: BARNA GG LOEWENSTEIN LM BRANKNER KJ BUTLER SW MOZUMDER PK STEFANI JA HENCK SA CHAPADOS P BUCK D MAUNG S SAXENA S UNRUH A
Citation: Gg. Barna et al., SENSOR INTEGRATION INTO PLASMA ETCH REACTORS OF A DEVELOPMENTAL PILOTLINE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2860-2867
MMST MANUFACTURING TECHNOLOGY - HARDWARE, SENSORS, AND PROCESSES
Authors: BARNA GG LOEWENSTEIN LM ROBBINS R OBRIEN S LANE A WHITE DD HANRATTY M HOSCH J SHINN GB TAYLOR K BRANKNER K
Citation: Gg. Barna et al., MMST MANUFACTURING TECHNOLOGY - HARDWARE, SENSORS, AND PROCESSES, IEEE transactions on semiconductor manufacturing, 7(2), 1994, pp. 149-158
DRY ETCH PROCESSES AND SENSORS
Authors: BARNA GG LOEWENSTEIN LM HENCK SA CHAPADOS P BRANKNER KJ GALE RJ MOZUMDER PK BUTLER SW STEFANI JA
Citation: Gg. Barna et al., DRY ETCH PROCESSES AND SENSORS, Solid state technology, 37(1), 1994, pp. 47
MMST WAFER CLEANING
Authors: BOWLING RA OBRIEN SC LOEWENSTEIN LM BENNETT MH BOHANNON BK
Citation: Ra. Bowling et al., MMST WAFER CLEANING, Solid state technology, 37(1), 1994, pp. 61
Risultati: 1-8 |