Citation: Ee. King et al., Influence of the lightly doped drain resistance on the worst-case hot-carrier stress condition for NMOS devices, MICROEL REL, 41(5), 2001, pp. 649-660
Authors:
Witczak, SC
Winokur, PS
Lacoe, RC
Mayer, DC
Citation: Sc. Witczak et al., Charge separation technique for metal-oxide-silicon capacitors in the presence of hydrogen deactivated dopants, J APPL PHYS, 87(11), 2000, pp. 8206-8208
Authors:
Lacoe, RC
Osborn, JV
Koga, R
Brown, S
Mayer, DC
Citation: Rc. Lacoe et al., Application of hardness-by-design methodology to radiation-tolerant ASIC technologies, IEEE NUCL S, 47(6), 2000, pp. 2334-2341
Citation: Sc. Witczak et al., Moderated degradation enhancement of lateral pnp transistors due to measurement bias, IEEE NUCL S, 45(6), 1998, pp. 2644-2648