Citation: Br. Sankapal et Cd. Lokhande, Studies on photoelectrochemical (PEC) cell formed with SILAR deposited Bi2Se3-Sb2Se3 multilayer thin films, SOL EN MAT, 69(1), 2001, pp. 43-52
Citation: Sd. Sartale et Cd. Lokhande, Preparation and characterization of nickel sulphide thin films using successive ionic layer adsorption and reaction (SILAR) method, MATER CH PH, 72(1), 2001, pp. 101-104
Citation: Sd. Sartale et Cd. Lokhande, Studies on large area (similar to 50 cm(2)) MoS2 thin films deposited using successive ionic layer adsorption and reaction (SILAR) method, MATER CH PH, 71(1), 2001, pp. 94-97
Citation: Sd. Sartale et Cd. Lokhande, Electrochemical deposition and oxidation of CuFe2 alloy: a new method to deposit CuFe2O4 thin films at room temperature, MATER CH PH, 70(3), 2001, pp. 274-284
Citation: Us. Jadhav et al., Effect of Cd : S ratio on the photoconducting properties of chemically deposited CdS films, MATER CH PH, 69(1-3), 2001, pp. 125-132
Citation: Sj. Lade et al., Photoelectrochemical properties of CdX (X=S, Se, Te) films electrodeposited from aqueous and non-aqueous baths, MATER CH PH, 68(1-3), 2001, pp. 36-41
Authors:
Sartale, SD
Bagde, GD
Lokhande, CD
Giersig, M
Citation: Sd. Sartale et al., Room temperature synthesis of nanocrystalline ferrite (MFe2O4, M = Cu, Co and Ni) thin films using novel electrochemical route, APPL SURF S, 182(3-4), 2001, pp. 366-371
Authors:
Lokhande, CD
Sankapal, BR
Sartale, SD
Pathan, HM
Giersig, M
Ganesan, V
Citation: Cd. Lokhande et al., A novel method for the deposition of nanocrystalline Bi2Se3, Sb2Se3 and Bi2Se3-Sb2Se3 thin films - SILAR, APPL SURF S, 182(3-4), 2001, pp. 413-417
Authors:
Lokhande, CD
Sankapal, BR
Pathan, HM
Muller, M
Giersig, M
Tributsch, H
Citation: Cd. Lokhande et al., Some structural studies on successive ionic layer adsorption and reaction (SILAR)-deposited US thin films, APPL SURF S, 181(3-4), 2001, pp. 277-282
Citation: Rr. Ahire et al., Preparation and characterization of Bi2S3 thin films using modified chemical bath deposition method, MATER RES B, 36(1-2), 2001, pp. 199-210
Citation: Gd. Bagde et al., Preparation and characterization of lanthanum sulphide thin films deposited by Spray Pyrolysis Technique, I J ENG M S, 7(5-6), 2000, pp. 390-394
Citation: Sd. Sartale et Cd. Lokhande, Room temperature preparation of NiFe2O4 thin films by electrochemical route, I J ENG M S, 7(5-6), 2000, pp. 404-410
Citation: Sd. Sartale et Cd. Lokhande, Growth of copper sulphide thin films by successive ionic layer adsorption and reaction (SILAR) method, MATER CH PH, 65(1), 2000, pp. 63-67
Citation: Rs. Mane et al., Thickness dependent properties of chemically deposited AS(2)S(3) thin films from thioacetamide bath, MATER CH PH, 64(3), 2000, pp. 215-221
Citation: Br. Sankapal et al., Preparation and characterization of Bi2Se3 thin films deposited by successive ionic layer adsorption and reaction (SILAR) method, MATER CH PH, 63(3), 2000, pp. 230-234
Citation: Sd. Sartale et Cd. Lokhande, Preparation and characterization of As2S3 thin films deposited using successive ionic layer adsorption and reaction (SILAR) method, MATER RES B, 35(8), 2000, pp. 1345-1353