Authors: Lungu, CP Lungu, AM Sakai, Y Sugawara, H Tabata, M Akazawa, M Miyamoto, M

Citation: Cp. Lungu et al., CxFy polymer film deposition in DC and RF fluorinert vapor plasmas, VACUUM, 59(1), 2000, pp. 210-219

Authors: Lungu, CP Lungu, AM Akazawa, M Sakai, Y Sugawara, H Tabata, M

Citation: Cp. Lungu et al., Fluorinated carbon films with low dielectric constant made from novel fluorocarbon source materials by RF plasma enhanced chemical vapor deposition, JPN J A P 2, 38(12B), 1999, pp. L1544-L1546

Authors: Musa, G Baltog, A Bajeu, G Lungu, CP Raiciu, E Borcoman, I Ricard, A

Citation: G. Musa et al., Influence of the H-2 and SF6 addition to Ne+1%Xe on the narrow barrier discharge spectral radiation, EPJ-APPL PH, 4(2), 1998, pp. 165-169

Authors: Lungu, CP Futsuhara, M Takai, O Braic, M Musa, G

Citation: Cp. Lungu et al., Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films, VACUUM, 51(4), 1998, pp. 635-640

Authors: Xiao, SQ Tsuzuki, K Lungu, CP Takai, P

Citation: Sq. Xiao et al., Structure and properties of CeN thin films deposited in arc discharge, VACUUM, 51(4), 1998, pp. 691-694

Authors: Xiao, SQ Lungu, CP Takai, O

Citation: Sq. Xiao et al., Comparison of TiN deposition by rf magnetron sputtering and electron beam sustained arc ion plating, THIN SOL FI, 334(1-2), 1998, pp. 173-177