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Results:
1-22
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Results: 22
Authors:
BOUDIOMBO J
BOUDRIOUA A
LOULERGUE JC
MALHOUITRE S
MACHET J
Citation: J. Boudiombo et al., OPTICAL WAVE-GUIDING PROPERTIES AND REFRACTIVE-INDEX ANALYSIS OF BORON-NITRIDE (BN) THIN-FILMS PREPARED BY REACTIVE ION PLATING, Optical materials, 10(2), 1998, pp. 143-153
Authors:
PATURAUD C
FARGES G
SAINTECATHERINE MC
MACHET J
Citation: C. Paturaud et al., INFLUENCE OF PARTICLE ENERGIES ON THE PROPERTIES OF MAGNETRON-SPUTTERED TUNGSTEN FILMS, Surface & coatings technology, 98(1-3), 1998, pp. 1257-1261
Authors:
GRENIER I
MASSEREAU V
CELERIER A
MACHET J
Citation: I. Grenier et al., A SIMPLE ION FLUX ESTIMATION IN A LOW-PRESSURE RF PLASMA (13.56 MHZ), Journal de physique. III, 7(4), 1997, pp. 937-950
Authors:
MEUNIER F
MACHET J
Citation: F. Meunier et J. Machet, EXPERIMENTAL AND THEORETICAL-STUDIES OF GROWTH MECHANISMS OF HARD WEAR-RESISTANT CARBON-BASED FILMS ON 3-DIMENSIONAL SUBSTRATES, DIAMOND AND RELATED MATERIALS, 6(8), 1997, pp. 970-974
Authors:
HEAU C
GUILLON N
FILLIT RY
MACHET J
Citation: C. Heau et al., ULTRA-HARD TI-B-N COATINGS OBTAINED BY MAGNETRON SPUTTERING, Surface & coatings technology, 97(1-3), 1997, pp. 60-65
Authors:
PIOT O
GAUTIER C
MACHET J
Citation: O. Piot et al., COMPARATIVE-STUDY OF CRN COATINGS DEPOSITED BY ION PLATING AND VACUUMARE EVAPORATION - INFLUENCE OF THE NATURE AND THE ENERGY OF THE LAYER-FORMING SPECIES ON THE STRUCTURAL AND THE MECHANICAL-PROPERTIES, Surface & coatings technology, 94-5(1-3), 1997, pp. 409-415
Authors:
GAUTIER C
MACHET J
Citation: C. Gautier et J. Machet, STUDY AND ELABORATION OF TERNARY CHROMIUM BASED COMPOUNDS (CR, O, N) DEPOSITED BY VACUUM-ARC EVAPORATION, Surface & coatings technology, 94-5(1-3), 1997, pp. 422-427
Authors:
CHALEIX L
MACHET J
Citation: L. Chaleix et J. Machet, STUDY OF THE COMPOSITION AND OF THE MECHANICAL-PROPERTIES OF TIBN FILMS OBTAINED BY DC-MAGNETRON SPUTTERING, Surface & coatings technology, 91(1-2), 1997, pp. 74-82
Authors:
COMBADIERE L
MACHET J
Citation: L. Combadiere et J. Machet, REACTIVE MAGNETRON SPUTTERING DEPOSITION OF TIN FILMS .1. INFLUENCE OF THE SUBSTRATE-TEMPERATURE ON STRUCTURE, COMPOSITION AND MORPHOLOGY OF THE FILMS, Surface & coatings technology, 88(1-3), 1997, pp. 17-27
Authors:
COMBADIERE L
MACHET J
Citation: L. Combadiere et J. Machet, REACTIVE MAGNETRON SPUTTERING DEPOSITION OF TIN FILMS .2. INFLUENCE OF SUBSTRATE-TEMPERATURE ON THE MECHANICAL-PROPERTIES OF THE FILMS, Surface & coatings technology, 88(1-3), 1997, pp. 28-37
Authors:
GAUTIER C
MACHET J
Citation: C. Gautier et J. Machet, STUDY OF THE GROWTH MECHANISMS OF CHROMIUM NITRIDE FILMS DEPOSITED BYVACUUM-ARC EVAPORATION, Thin solid films, 295(1-2), 1997, pp. 43-52
Authors:
PIOT O
MALAURIE A
MACHET J
Citation: O. Piot et al., EXPERIMENTAL AND THEORETICAL-STUDIES OF COATING THICKNESS DISTRIBUTIONS OBTAINED FROM HIGH-RATE ELECTRON-BEAM EVAPORATION SOURCES, Thin solid films, 293(1-2), 1997, pp. 124-132
Authors:
CONTOUX G
COSSET F
CELERIER A
MACHET J
Citation: G. Contoux et al., DEPOSITION PROCESS STUDY OF CHROMIUM-OXIDE THIN-FILMS OBTAINED BY DC MAGNETRON SPUTTERING, Thin solid films, 292(1-2), 1997, pp. 75-84
Authors:
GAUTIER C
MOUSSAOUI H
ELSTNER F
MACHET J
Citation: C. Gautier et al., COMPARATIVE-STUDY OF MECHANICAL AND STRUCTURAL-PROPERTIES OF CRN FILMS DEPOSITED BY DC MAGNETRON SPUTTERING AND VACUUM-ARC EVAPORATION, Surface & coatings technology, 87-8(1-3), 1996, pp. 254-262
Authors:
PATURAUD C
FARGES G
CATHERINE MCS
MACHET J
Citation: C. Paturaud et al., INFLUENCE OF SPUTTERING GASES ON THE PROPERTIES OF MAGNETRON-SPUTTERED TUNGSTEN FILMS, Surface & coatings technology, 87-8(1-3), 1996, pp. 388-393
Authors:
COMBADIERE L
MACHET J
Citation: L. Combadiere et J. Machet, STUDY AND CONTROL OF BOTH TARGET-POISONING MECHANISMS AND REACTIVE PHENOMENON IN REACTIVE PLANAR MAGNETRON CATHODIC SPUTTERING OF TIN, Surface & coatings technology, 82(1-2), 1996, pp. 145-157
Authors:
COSSET F
CONTOUX G
CELERIER A
MACHET J
Citation: F. Cosset et al., DEPOSITION OF CORROSION-RESISTANT CHROMIUM AND NITROGEN-DOPED CHROMIUM COATINGS BY CATHODIC MAGNETRON SPUTTERING, Surface & coatings technology, 79(1-3), 1996, pp. 25-34
Authors:
GAUTIER C
MACHET J
Citation: C. Gautier et J. Machet, EFFECTS OF DEPOSITION PARAMETERS ON THE TEXTURE OF CHROMIUM FILMS DEPOSITED BY VACUUM ARE EVAPORATION, Thin solid films, 289(1-2), 1996, pp. 34-38
Authors:
ELSTNER F
GAUTIER C
MOUSSAOUI H
PIOT O
MACHET J
Citation: F. Elstner et al., A COMPARATIVE-STUDY OF STRUCTURE AND RESIDUAL-STRESS IN CHROMIUM NITRIDE FILMS DEPOSITED BY VACUUM ARC EVAPORATION, ION PLATING, AND DC MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 158(2), 1996, pp. 505-521
Authors:
ELSTNER F
GAUTIER C
PIOT O
CONTOUX G
COSSET F
NARDOU F
MACHET J
Citation: F. Elstner et al., COMPARATIVE-STUDY OF THE STRESS IN CHROMIUM FILMS DEPOSITED BY VACUUM-ARC EVAPORATION, VACUUM EVAPORATION, AND DC MAGNETRON SPUTTERING, Physica status solidi. a, Applied research, 154(2), 1996, pp. 669-679
Authors:
CHALEIX D
CHOQUET P
BESSAUDOU A
FRUGIER L
MACHET J
Citation: D. Chaleix et al., A SPATIAL-DISTRIBUTION STUDY OF A BEAM VAPOR EMITTED BY ELECTRON-BEAM-HEATED EVAPORATION SOURCES, Journal of physics. D, Applied physics, 29(1), 1996, pp. 218-224
Authors:
GUILBAUDMASSEREAU V
CELERIER A
MACHET J
Citation: V. Guilbaudmassereau et al., STUDY AND IMPROVEMENT OF THE ADHESION OF CHROMIUM THIN-FILMS DEPOSITED BY MAGNETRON SPUTTERING, Thin solid films, 258(1-2), 1995, pp. 185-193
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