Authors: WAYTENA GL HOFF HA ISAACSON IP REBBERT ML MA DI MARRIAN C SUEHLE JS

Citation: Gl. Waytena et al., THE OPTIMIZATION OF THE DOUBLE MASK SYSTEM TO MINIMIZE THE CONTACT RESISTANCE OF A TI PT/AU CONTACT/, Journal of electronic materials, 26(2), 1997, pp. 90-96

Authors: PECKERAR M MARRIAN C PERKINS FK

Citation: M. Peckerar et al., FEATURE CONTRAST IN DOSE-EQUALIZATION SCHEMES USED FOR ELECTRON-BEAM PROXIMITY CONTROL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3880-3886

Authors: CERRINA F MARRIAN C

Citation: F. Cerrina et C. Marrian, A PATH TO NANOLITHOGRAPHY, MRS bulletin, 21(12), 1996, pp. 56-62

Authors: WAYTENA GL HOFF HA MA DI ISAACSON IP REBBERT ML MARRIAN C SUEHLE JS

Citation: Gl. Waytena et al., THE USE OF A DOUBLE MASK SYSTEM TO PREVENT TI DIFFUSION FROM A TI PT/AU OHMIC CONTACT ON DIAMOND/, Journal of the Electrochemical Society, 143(7), 1996, pp. 2392-2395

Authors: MURDAY J MARRIAN C COLTON R

Citation: J. Murday et al., NANOMETER-SCALE RESEARCH BRINGS REEL APPLICATIONS INTO FOCUS, R & D. Research and development, 37(2), 1995, pp. 53-54