AAAAAA
Results:
1-14
|
Results: 14
Authors:
NATHAN SS
MURALIDHAR GK
RAO GM
MOHAN S
Citation: Ss. Nathan et al., STUDY OF THE PROCESSES OCCURRING WHEN SPUTTERING YBA2CU3O7-X IN PURE OXYGEN, Vacuum, 49(3), 1998, pp. 221-225
Authors:
MURALIDHAR GK
WINDOW B
SOOD DK
ZMOOD RB
Citation: Gk. Muralidhar et al., STRUCTURAL AND COMPOSITIONAL STUDIES OF MAGNETRON-SPUTTERED ND FE B THIN-FILMS ON SI(100), Journal of Materials Science, 33(5), 1998, pp. 1349-1357
Authors:
MURALIDHAR GK
BHANSALI S
POGANY A
SOOD DK
Citation: Gk. Muralidhar et al., ELECTRON-MICROSCOPY STUDIES OF ION-IMPLANTED SILICON FOR SEEDING ELECTROLESS COPPER-FILMS, Journal of applied physics, 83(11), 1998, pp. 5709-5713
Authors:
NATHAN SS
MURALIDHAR GK
RAO GM
MOHAN S
Citation: Ss. Nathan et al., STUDIES OF PROCESS PARAMETER CONTROLLED COMPOSITION VARIATION IN SPUTTERED YBA2CU3O7-X FILMS, Vacuum, 48(2), 1997, pp. 113-118
Authors:
SWARNALATHA M
SRAVANI C
GUNASEKHAR KR
MURALIDHAR GK
MOHAN S
Citation: M. Swarnalatha et al., ESTIMATION OF DENSITY OF CHARGE SPECIES IN A TRIODE DISCHARGE SYSTEM, Vacuum, 48(10), 1997, pp. 845-848
Authors:
NATHAN SS
MURALIDHAR GK
RAO GM
MOHAN S
Citation: Ss. Nathan et al., EFFECT OF PROCESS PARAMETERS ON GLOW-DISCHARGE AND FILM THICKNESS UNIFORMITY IN FACING TARGET SPUTTERING, Thin solid films, 292(1-2), 1997, pp. 20-25
Authors:
VIJAYA HS
MURALIDHAR GK
SUBBANNA GN
RAO GM
MOHAN S
Citation: Hs. Vijaya et al., CHARACTERIZATION OF TITANIUM THIN-FILMS PREPARED BY BIAS ASSISTED MAGNETRON SPUTTERING, Metallurgical and materials transactions. B, Process metallurgy and materials processing science, 27(6), 1996, pp. 1057-1060
Authors:
MURALIDHAR GK
MUSIL J
KADLEC S
Citation: Gk. Muralidhar et al., DISCHARGE CHARACTERISTICS OF A FACING TARGET SPUTTERING DEVICE USING UNBALANCED MAGNETRONS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(4), 1996, pp. 2182-2186
Authors:
MURALIDHAR GK
MUSIL J
KADLEC S
Citation: Gk. Muralidhar et al., AN UNBALANCED MAGNETRON SPUTTERING DEVICE FOR LOW AND MEDIUM PRESSURES, Review of scientific instruments, 66(10), 1995, pp. 4961-4966
Authors:
MARHAS MK
BALAKRISHNAN K
GANESAN V
SRINIVASAN R
KANJILAL D
MEHTA GK
MURALIDHAR GK
RAO GM
NATHAN S
MOHAN S
Citation: Mk. Marhas et al., CRITICAL EXPONENT OF THE ELECTRICAL-CONDUCTIVITY IN THE PARACOHERENCEREGION OF A THIN-FILM OF YBA2CU3O7-X, Bulletin of Materials Science, 17(6), 1994, pp. 585-594
Authors:
MURALIDHAR GK
RAO GM
MOHAN S
Citation: Gk. Muralidhar et al., FABRICATION AND PERFORMANCE STUDY OF A YBA2CU3O7-DELTA THIN-FILM VARISTOR, Thin solid films, 238(1), 1994, pp. 115-118
Authors:
MURALIDHAR GK
RAO GM
MOHAN S
KULKARNI VN
BALASUBRAMANIAN TV
Citation: Gk. Muralidhar et al., CHARACTERIZATION OF YBA2CU3O7-X THIN-FILMS DEPOSITED BY HIGH-PRESSUREOXYGEN SPUTTERING, Solid state communications, 89(8), 1994, pp. 713-717
Authors:
RAJANNA K
MURALIDHAR GK
NAIR KGM
PANCHAPAGESAN T
NAYAK MM
MOHAN S
Citation: K. Rajanna et al., EFFECT OF STRAIN AND TEMPERATURE ON THE BEHAVIOR OF OXYGEN-ION IMPLANTED MANGANESE FILMS, Journal of applied physics, 76(6), 1994, pp. 3573-3578
Authors:
MURALIDHAR GK
RAO GM
KRISHNA MG
RAO KN
MENON AG
BALASUBRAMANIAN TV
MOHAN S
Citation: Gk. Muralidhar et al., STUDY OF DISCHARGE CHARACTERISTICS IN PURE ARGON AND OXYGEN DURING DCSPUTTERING OF YBACUO FILMS, Vacuum, 44(10), 1993, pp. 1049-1052
Risultati:
1-14
|