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Results: 1-14 |
Results: 14
Properties of thin AIN films prepared by PECVD and rapid thermal processes
Authors: Beshkov, GD Georgiev, SS Grigorov, KG Maciel, HS Djouadi, A Marinov, M
Citation: Gd. Beshkov et al., Properties of thin AIN films prepared by PECVD and rapid thermal processes, J PHYS IV, 11(PR3), 2001, pp. 287-292
Raman active E-2 modes in aluminum nitride films
Authors: Oliveira, IC Otani, C Maciel, HS Massi, M Noda, LK Temperini, MLA
Citation: Ic. Oliveira et al., Raman active E-2 modes in aluminum nitride films, J MAT S-M E, 12(4-6), 2001, pp. 259-262
Electrical and structural characterization of DLC films deposited by magnetron sputtering
Authors: Massi, M Maciel, HS Otani, C Mansano, RD Verdonck, P
Citation: M. Massi et al., Electrical and structural characterization of DLC films deposited by magnetron sputtering, J MAT S-M E, 12(4-6), 2001, pp. 343-346
Wet etching of hydrogenated amorphous carbon films
Authors: Jaramillo, JM Mansano, RD Zambom, LS Massi, M Maciel, HS
Citation: Jm. Jaramillo et al., Wet etching of hydrogenated amorphous carbon films, DIAM RELAT, 10(3-7), 2001, pp. 976-979
Dielectric characteristics of AlN films grown by d.c.-magnetron sputteringdischarge
Authors: Oliveira, IC Massi, M Santos, SG Otani, C Maciel, HS Mansano, RD
Citation: Ic. Oliveira et al., Dielectric characteristics of AlN films grown by d.c.-magnetron sputteringdischarge, DIAM RELAT, 10(3-7), 2001, pp. 1317-1321
Etching of DLC films using a low intensity oxygen plasma jet
Authors: Urruchi, WI Massi, M Maciel, HS Otani, C Nishioka, LN
Citation: Wi. Urruchi et al., Etching of DLC films using a low intensity oxygen plasma jet, DIAM RELAT, 9(3-6), 2000, pp. 685-688
End-point detection of polymer etching using Langmuir probes
Authors: de Castro, RM Verdonck, P Pisani, MB Mansano, RD Cirino, GA Maciel, HS Massi, M
Citation: Rm. De Castro et al., End-point detection of polymer etching using Langmuir probes, IEEE PLAS S, 28(3), 2000, pp. 1043-1049
Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering
Authors: Mansano, RD Massi, M Zambom, LS Verdonck, P Nogueira, PM Maciel, HS Otani, C
Citation: Rd. Mansano et al., Effects of the methane content on the characteristics of diamond-like carbon films produced by sputtering, THIN SOL FI, 373(1-2), 2000, pp. 243-246
Physics and biology: Bio-plasma physics
Authors: Uehara, M Sakane, KK Maciel, HS Urruchi, WI
Citation: M. Uehara et al., Physics and biology: Bio-plasma physics, AM J PHYS, 68(5), 2000, pp. 450-455
The influences of the magnetic field strength on the magnetic confinement of primary electrons in an ion source
Authors: Sandonato, GM Lima, PE Maciel, HS Otani, C
Citation: Gm. Sandonato et al., The influences of the magnetic field strength on the magnetic confinement of primary electrons in an ion source, CONTR PLASM, 39(3), 1999, pp. 187-195
A comparative study of single and double Langmuir probe techniques for RF plasma characterization
Authors: Castro, RM Cirino, GA Verdonck, P Maciel, HS Massi, M Pisani, MB Mansano, RD
Citation: Rm. Castro et al., A comparative study of single and double Langmuir probe techniques for RF plasma characterization, CONTR PLASM, 39(3), 1999, pp. 235-246
Anisotropic inductively coupled plasma etching of silicon with pure SF6
Authors: Mansano, RD Verdonck, P Maciel, HS Massi, M
Citation: Rd. Mansano et al., Anisotropic inductively coupled plasma etching of silicon with pure SF6, THIN SOL FI, 344, 1999, pp. 378-380
Effects of plasma etching on DLC films
Authors: Massi, M Mansano, RD Maciel, HS Otani, C Verdonck, P Nishioka, LNBM
Citation: M. Massi et al., Effects of plasma etching on DLC films, THIN SOL FI, 344, 1999, pp. 381-384
A kinetic model for the charged triple layer in low pressure arc discharges
Authors: Tomimura, A Maciel, HS
Citation: A. Tomimura et Hs. Maciel, A kinetic model for the charged triple layer in low pressure arc discharges, BRAZ J PHYS, 28(3), 1998, pp. 183-190
Risultati: 1-14 |