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Results: 1-17 |
Results: 17
Diagnostics of inductively coupled chlorine plasmas: Measurement of electron and total positive ion densities
Authors: Malyshev, MV Donnelly, VM
Citation: Mv. Malyshev et Vm. Donnelly, Diagnostics of inductively coupled chlorine plasmas: Measurement of electron and total positive ion densities, J APPL PHYS, 90(3), 2001, pp. 1130-1137
Effects of discharge frequency in plasma etching and ultrahigh-frequency plasma source for high-performance etching for ultralarge-scale integrated circuits
Authors: Samukawa, S Donnelly, VM Malyshev, MV
Citation: S. Samukawa et al., Effects of discharge frequency in plasma etching and ultrahigh-frequency plasma source for high-performance etching for ultralarge-scale integrated circuits, JPN J A P 1, 39(4A), 2000, pp. 1583-1596
Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon
Authors: Vyvoda, MA Li, M Graves, DB Lee, H Malyshev, MV Klemens, FP Lee, JTC Donnelly, VM
Citation: Ma. Vyvoda et al., Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon, J VAC SCI B, 18(2), 2000, pp. 820-833
Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power
Authors: Samukawa, S Noguchi, K Colonell, JI Bogart, KHA Malyshev, MV Donnelly, VM
Citation: S. Samukawa et al., Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power, J VAC SCI B, 18(2), 2000, pp. 834-840
Dynamics of inductively-coupled pulsed chlorine plasmas in the presence ofcontinuous substrate bias
Authors: Malyshev, MV Donnelly, VM
Citation: Mv. Malyshev et Vm. Donnelly, Dynamics of inductively-coupled pulsed chlorine plasmas in the presence ofcontinuous substrate bias, PLASMA SOUR, 9(3), 2000, pp. 353-360
Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis
Authors: Fuller, NCM Malyshev, MV Donnelly, VM Herman, IP
Citation: Ncm. Fuller et al., Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis, PLASMA SOUR, 9(2), 2000, pp. 116-127
Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage
Authors: Malyshev, MV Donnelly, VM Downey, SW Colonell, JI Layadi, N
Citation: Mv. Malyshev et al., Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage, J VAC SCI A, 18(3), 2000, pp. 849-859
Feature evolution during plasma etching. II. Polycrystalline silicon etching
Authors: Lane, JM Klemens, FP Bogart, KHA Malyshev, MV Lee, JTC
Citation: Jm. Lane et al., Feature evolution during plasma etching. II. Polycrystalline silicon etching, J VAC SCI A, 18(1), 2000, pp. 188-196
Mask charging and profile evolution during chlorine plasma etching of silicon
Authors: Bogart, KHA Klemens, FP Malyshev, MV Colonell, JI Donnelly, VM Lee, JTC Lane, JM
Citation: Kha. Bogart et al., Mask charging and profile evolution during chlorine plasma etching of silicon, J VAC SCI A, 18(1), 2000, pp. 197-206
Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2(+) and Cl+ densities
Authors: Malyshev, MV Fuller, NCM Bogart, KHA Donnelly, VM Herman, IP
Citation: Mv. Malyshev et al., Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2(+) and Cl+ densities, J APPL PHYS, 88(5), 2000, pp. 2246-2251
Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2 and Cl number densities
Authors: Malyshev, MV Donnelly, VM
Citation: Mv. Malyshev et Vm. Donnelly, Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2 and Cl number densities, J APPL PHYS, 88(11), 2000, pp. 6207-6215
Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions
Authors: Malyshev, MV Donnelly, VM
Citation: Mv. Malyshev et Vm. Donnelly, Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions, J APPL PHYS, 87(4), 2000, pp. 1642-1649
Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature
Authors: Donnelly, VM Malyshev, MV
Citation: Vm. Donnelly et Mv. Malyshev, Diagnostics of inductively coupled chlorine plasmas: Measurements of the neutral gas temperature, APPL PHYS L, 77(16), 2000, pp. 2467-2469
Trace rare gases optical emission spectroscopy: Nonintrusive method for measuring electron temperatures in low-pressure, low-temperature plasmas
Authors: Malyshev, MV Donnelly, VM
Citation: Mv. Malyshev et Vm. Donnelly, Trace rare gases optical emission spectroscopy: Nonintrusive method for measuring electron temperatures in low-pressure, low-temperature plasmas, PHYS REV E, 60(5), 1999, pp. 6016-6029
Langmuir probe studies of a transformer-coupled plasma, aluminum etcher
Authors: Malyshev, MV Donnelly, VM Kornblit, A Ciampa, NA Colonell, JI Lee, JTC
Citation: Mv. Malyshev et al., Langmuir probe studies of a transformer-coupled plasma, aluminum etcher, J VAC SCI A, 17(2), 1999, pp. 480-492
Dynamics of pulsed-power chlorine plasmas
Authors: Malyshev, MV Donnelly, VM Colonell, JI Samukawa, S
Citation: Mv. Malyshev et al., Dynamics of pulsed-power chlorine plasmas, J APPL PHYS, 86(9), 1999, pp. 4813-4820
Laser-induced fluorescence and Langmuir probe determination of Cl-2(+) andCl+ absolute densities in transformer-coupled chlorine plasmas
Authors: Malyshev, MV Fuller, NCM Bogart, KHA Donnelly, VM Herman, IP
Citation: Mv. Malyshev et al., Laser-induced fluorescence and Langmuir probe determination of Cl-2(+) andCl+ absolute densities in transformer-coupled chlorine plasmas, APPL PHYS L, 74(12), 1999, pp. 1666-1668
Risultati: 1-17 |