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Vyvoda, MA
Li, M
Graves, DB
Lee, H
Malyshev, MV
Klemens, FP
Lee, JTC
Donnelly, VM
Citation: Ma. Vyvoda et al., Role of sidewall scattering in feature profile evolution during Cl-2 and HBr plasma etching of silicon, J VAC SCI B, 18(2), 2000, pp. 820-833
Authors:
Samukawa, S
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Malyshev, MV
Donnelly, VM
Citation: S. Samukawa et al., Reduction of plasma induced damage in an inductively coupled plasma using pulsed source power, J VAC SCI B, 18(2), 2000, pp. 834-840
Citation: Mv. Malyshev et Vm. Donnelly, Dynamics of inductively-coupled pulsed chlorine plasmas in the presence ofcontinuous substrate bias, PLASMA SOUR, 9(3), 2000, pp. 353-360
Authors:
Malyshev, MV
Donnelly, VM
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Layadi, N
Citation: Mv. Malyshev et al., Diagnostic studies of aluminum etching in an inductively coupled plasma system: Determination of electron temperatures and connections to plasma-induced damage, J VAC SCI A, 18(3), 2000, pp. 849-859
Authors:
Malyshev, MV
Fuller, NCM
Bogart, KHA
Donnelly, VM
Herman, IP
Citation: Mv. Malyshev et al., Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2(+) and Cl+ densities, J APPL PHYS, 88(5), 2000, pp. 2246-2251
Citation: Mv. Malyshev et Vm. Donnelly, Diagnostics of inductively coupled chlorine plasmas: Measurement of Cl-2 and Cl number densities, J APPL PHYS, 88(11), 2000, pp. 6207-6215
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Citation: Mv. Malyshev et Vm. Donnelly, Trace rare gases optical emission spectroscopy: Nonintrusive method for measuring electron temperatures in low-pressure, low-temperature plasmas, PHYS REV E, 60(5), 1999, pp. 6016-6029