Citation: Acy. Liu et al., Defect formation due to the crystallization of deep amorphous volumes formed in silicon by mega electron volt (MeV) ion implantation, J MATER RES, 16(11), 2001, pp. 3229-3237
Citation: Ld. Morpeth et al., Structural characterisation of Ti : sapphire regions formed by localised high-energy implantation of Ti and O ions, NUCL INST B, 181, 2001, pp. 372-376
Citation: Ld. Morpeth et Jc. Mccallum, Ti : sapphire formation via the co-implantation of Ti and O ions into sapphire, NUCL INST B, 175, 2001, pp. 537-541
Authors:
Heitmann, J
McCallum, JC
Troger, W
Butz, T
Hesse, R
Citation: J. Heitmann et al., Concentration profiles and structural changes of silver intercalated titanium disulfide, NUCL INST B, 161, 2000, pp. 619-623
Authors:
Orwa, JO
McCallum, JC
Prawer, S
Nugent, KW
Jamieson, DN
Citation: Jo. Orwa et al., Diamond-like carbon nanocrystals formed by implanting fused quartz and sapphire (alpha-Al2O3) with carbon ions, DIAM RELAT, 8(8-9), 1999, pp. 1642-1647