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Results: 1-15 |
Results: 15

Authors: Liu, ACY McCallum, JC Wong-Leung, J
Citation: Acy. Liu et al., Defect formation due to the crystallization of deep amorphous volumes formed in silicon by mega electron volt (MeV) ion implantation, J MATER RES, 16(11), 2001, pp. 3229-3237

Authors: Heitmann, J McCallum, JC Meijer, J Stephan, A Butz, T Zacharias, M
Citation: J. Heitmann et al., Si-doped luminescence gratings, NUCL INST B, 181, 2001, pp. 263-267

Authors: Morpeth, LD McCallum, JC Jamieson, DN
Citation: Ld. Morpeth et al., Structural characterisation of Ti : sapphire regions formed by localised high-energy implantation of Ti and O ions, NUCL INST B, 181, 2001, pp. 372-376

Authors: Liu, ACY McCallum, JC Wong-Leung, J
Citation: Acy. Liu et al., The crystallisation of deep amorphous wells in silicon produced by ion implantation, NUCL INST B, 175, 2001, pp. 164-168

Authors: Morpeth, LD McCallum, JC
Citation: Ld. Morpeth et Jc. Mccallum, Ti : sapphire formation via the co-implantation of Ti and O ions into sapphire, NUCL INST B, 175, 2001, pp. 537-541

Authors: Orwa, JO Jamieson, DN Prawer, S McCallum, JC
Citation: Jo. Orwa et al., Carbon diffusion and nanocrystalline diamond formation in carbon ion-implanted oxides studied by nuclear elastic scattering, NUCL INST B, 175, 2001, pp. 554-558

Authors: Orwa, JO Prawer, S Jamieson, DN Peng, JL McCallum, JC Nugent, KW Li, YJ Bursill, LA Withrow, SP
Citation: Jo. Orwa et al., Diamond nanocrystals formed by direct implantation of fused silica with carbon, J APPL PHYS, 90(6), 2001, pp. 3007-3018

Authors: Heitmann, J McCallum, JC Troger, W Butz, T Hesse, R
Citation: J. Heitmann et al., Concentration profiles and structural changes of silver intercalated titanium disulfide, NUCL INST B, 161, 2000, pp. 619-623

Authors: Prawer, S Peng, JL Orwa, JO McCallum, JC Jamieson, DN Bursill, LA
Citation: S. Prawer et al., Size dependence of structural stability in nanocrystalline diamond, PHYS REV B, 62(24), 2000, pp. R16360-R16363

Authors: Morpeth, LD McCallum, JC
Citation: Ld. Morpeth et Jc. Mccallum, Formation of Ti3+ in sapphire by co-implantation of Ti and O ions, APPL PHYS L, 76(4), 2000, pp. 424-426

Authors: Orwa, JO McCallum, JC Prawer, S Nugent, KW Jamieson, DN
Citation: Jo. Orwa et al., Diamond-like carbon nanocrystals formed by implanting fused quartz and sapphire (alpha-Al2O3) with carbon ions, DIAM RELAT, 8(8-9), 1999, pp. 1642-1647

Authors: Zhu, XF Williams, JS McCallum, JC
Citation: Xf. Zhu et al., Structural changes in ultra-high-dose self-implanted crystalline and amorphous silicon, NUCL INST B, 148(1-4), 1999, pp. 268-272

Authors: McCallum, JC
Citation: Jc. Mccallum, The kinetics of dopant-enhanced solid phase epitaxy in H-free amorphous silicon layers, NUCL INST B, 148(1-4), 1999, pp. 350-354

Authors: McCallum, JC Morpeth, LD
Citation: Jc. Mccallum et Ld. Morpeth, Synthesis of Ti : sapphire by ion implantation, NUCL INST B, 148(1-4), 1999, pp. 726-729

Authors: Zhu, XF Williams, JS Llewellyn, DJ McCallum, JC
Citation: Xf. Zhu et al., Instability of nanocavities in amorphous silicon, APPL PHYS L, 74(16), 1999, pp. 2313-2315
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