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Results: 1-25/64
Authors:
Trajkovic, T
Udrea, F
Waind, PR
Thomson, J
Amaratunga, GAJ
Milne, WI
Citation: T. Trajkovic et al., Optimum design of 1.4kV non-punch-through trench IGBTs: the next generation of high-power switching devices, IEE P-CIRC, 148(2), 2001, pp. 71-74
Authors:
Milne, WI
Teo, KBK
Chhowalla, M
Amaratunga, GAJ
Yuan, J
Robertson, J
Legagneux, P
Pirio, G
Pribat, D
Bouzehouane, K
Bruenger, W
Trautmann, C
Citation: Wi. Milne et al., Carbon films for use as the electron source in a parallel e-beam lithography system, NEW DIAM FR, 11(4), 2001, pp. 235-247
Authors:
Cui, JB
Robertson, J
Milne, WI
Citation: Jb. Cui et al., The effect of film resistance on electron field emission from amorphous carbon films, DIAM RELAT, 10(3-7), 2001, pp. 868-872
Authors:
Rodil, SE
Milne, WI
Robertson, J
Brown, LM
Citation: Se. Rodil et al., Dual ion plasma-beam sources used to maximise sp(3) C-C bonds in carbon nitride, DIAM RELAT, 10(3-7), 2001, pp. 1125-1131
Authors:
Canillas, A
Polo, MC
Andujar, JL
Sancho, J
Bosch, S
Robertson, J
Milne, WI
Citation: A. Canillas et al., Spectroscopic ellipsometric study of tetrahedral amorphous carbon films: optical properties and modelling, DIAM RELAT, 10(3-7), 2001, pp. 1132-1136
Authors:
Martinez, E
Andujar, JL
Polo, MC
Esteve, J
Robertson, J
Milne, WI
Citation: E. Martinez et al., Study of the mechanical properties of tetrahedral amorphous carbon films by nanoindentation and nanowear measurements, DIAM RELAT, 10(2), 2001, pp. 145-152
Authors:
Milne, WI
Ilie, A
Cui, JB
Ferrari, A
Robertson, J
Citation: Wi. Milne et al., Field emission from nano-cluster carbon films, DIAM RELAT, 10(2), 2001, pp. 260-264
Authors:
Tagliaferro, A
Milne, WI
Robertson, J
Silva, SRP
Amaratunga, GAJ
Citation: A. Tagliaferro et al., Proceedings of the 3rd Specialist Meeting on Amorphous Carbon (SMAC 2000) - Mondovi, Italy, 30 August-1 September 2000 - Preface, DIAM RELAT, 10(2), 2001, pp. V-V
Authors:
Udrea, F
Gardner, JW
Setiadi, D
Covington, JA
Dogaru, T
Lua, CC
Milne, WI
Citation: F. Udrea et al., Design and simulations of SOICMOS micro-hotplate gas sensors, SENS ACTU-B, 78(1-3), 2001, pp. 180-190
Authors:
Flewitt, AJ
Dyson, AP
Robertson, J
Milne, WI
Citation: Aj. Flewitt et al., Low temperature growth of silicon nitride by electron cyclotron resonance plasma enhanced chemical vapour deposition, THIN SOL FI, 383(1-2), 2001, pp. 172-177
Authors:
Lai, DF
Robertson, J
Milne, WI
Citation: Df. Lai et al., Plasma oxidation of silicon using an electron cyclotron wave resonance (ECWR) oxygen plasma, THIN SOL FI, 383(1-2), 2001, pp. 220-223
Authors:
Garner, DM
Udrea, F
Lim, HT
Ensell, G
Popescu, AE
Sheng, K
Milne, WI
Citation: Dm. Garner et al., Silicon-on-insulator power integrated circuits, MICROELEC J, 32(5-6), 2001, pp. 517-526
Authors:
Racine, B
Ferrari, AC
Morrison, NA
Hutchings, I
Milne, WI
Robertson, J
Citation: B. Racine et al., Properties of amorphous carbon-silicon alloys deposited by a high plasma density source, J APPL PHYS, 90(10), 2001, pp. 5002-5012
Authors:
Chhowalla, M
Teo, KBK
Ducati, C
Rupesinghe, NL
Amaratunga, GAJ
Ferrari, AC
Roy, D
Robertson, J
Milne, WI
Citation: M. Chhowalla et al., Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition, J APPL PHYS, 90(10), 2001, pp. 5308-5317
Authors:
Teo, KBK
Rodil, SE
Tsai, JTH
Ferrari, AC
Robertson, J
Milne, WI
Citation: Kbk. Teo et al., Effect of graphitic inclusions on the optical gap of tetrahedral amorphouscarbon films, J APPL PHYS, 89(7), 2001, pp. 3706-3710
Authors:
Cui, JB
Robertson, J
Milne, WI
Citation: Jb. Cui et al., Improved electron emission from carbon film using a resistive layer, J APPL PHYS, 89(6), 2001, pp. 3490-3493
Authors:
Rodil, SE
Ferrari, AC
Robertson, J
Milne, WI
Citation: Se. Rodil et al., Raman and infrared modes of hydrogenated amorphous carbon nitride, J APPL PHYS, 89(10), 2001, pp. 5425-5430
Authors:
Cui, JB
Robertson, J
Milne, WI
Citation: Jb. Cui et al., Field emission site densities of nanostructured carbon films deposited by a cathodic arc, J APPL PHYS, 89(10), 2001, pp. 5707-5711
Authors:
Morrison, NA
Rodil, SE
Robertson, J
Milne, WI
Citation: Na. Morrison et al., Chemical sputtering of ta-C: Implications for the deposition of carbon nitride, J APPL PHYS, 89(10), 2001, pp. 5754-5759
Authors:
Teo, KBK
Chhowalla, M
Amaratunga, GAJ
Milne, WI
Hasko, DG
Pirio, G
Legagneux, P
Wyczisk, F
Pribat, D
Citation: Kbk. Teo et al., Uniform patterned growth of carbon nanotubes without surface carbon, APPL PHYS L, 79(10), 2001, pp. 1534-1536
Authors:
Udrea, F
Garner, D
Sheng, K
Popescu, A
Lim, HT
Milne, WI
Citation: F. Udrea et al., SOI power devices, ELECT COMM, 12(1), 2000, pp. 27-40
Authors:
Rodil, S
Morrison, NA
Milne, WI
Robertson, J
Stolojan, V
Jayawardane, DN
Citation: S. Rodil et al., Deposition of carbon nitride films using an electron cyclotron wave resonance plasma source, DIAM RELAT, 9(3-6), 2000, pp. 524-529
Authors:
Kleinsorge, B
Ferrari, AC
Robertson, J
Milne, WI
Waidmann, S
Hearne, S
Citation: B. Kleinsorge et al., Bonding regimes of nitrogen in amorphous carbon, DIAM RELAT, 9(3-6), 2000, pp. 643-648
Authors:
Polo, MC
Andujar, JL
Hart, A
Robertson, J
Milne, WI
Citation: Mc. Polo et al., Preparation of tetrahedral amorphous carbon films by filtered cathodic vacuum arc deposition, DIAM RELAT, 9(3-6), 2000, pp. 663-667
Authors:
Conway, NMJ
Ferrari, AC
Flewitt, AJ
Robertson, J
Milne, WI
Tagliaferro, A
Beyer, W
Citation: Nmj. Conway et al., Defect and disorder reduction by annealing in hydrogenated tetrahedral amorphous carbon, DIAM RELAT, 9(3-6), 2000, pp. 765-770