Authors:
Aderhold, J
Davydov, VY
Fedler, F
Klausing, H
Mistele, D
Rotter, T
Semchinova, O
Stemmer, J
Graul, J
Citation: J. Aderhold et al., InN thin films grown by metalorganic molecular beam epitaxy on sapphire substrates, J CRYST GR, 222(4), 2001, pp. 701-705
Authors:
Rotter, T
Mistele, D
Stemmer, J
Seyboth, M
Schwegler, V
Paprotta, S
Fedler, F
Klausing, H
Semchinova, OK
Aderhold, J
Graul, J
Citation: T. Rotter et al., First AlGaN/GaN metal oxide semiconductor heterostructure field effect transistor based on photoanodic oxide, ELECTR LETT, 37(11), 2001, pp. 715-716
Authors:
Klausing, H
Aderhold, J
Fedler, F
Mistele, D
Stemmer, J
Semchinova, O
Graul, J
Danhardt, J
Panzer, S
Citation: H. Klausing et al., Electron beam pumping in nitride vertical cavities with GaN/Al0.25Ga0.75N Bragg reflectors, MRS I J N S, 5, 2000, pp. NIL_562-NIL_567
Authors:
Stemmer, J
Fedler, F
Klausing, H
Mistele, D
Rotter, T
Semchinova, O
Aderhold, J
Sanchez, AM
Pacheco, FJ
Molina, SI
Fehrer, M
Hommel, D
Graul, J
Citation: J. Stemmer et al., High temperature AlN intermediate layer in GaN grown by molecular beam epitaxy, J CRYST GR, 216(1-4), 2000, pp. 15-20
Authors:
Emtsev, VV
Davydov, VY
Lundin, VV
Poloskin, DS
Aderhold, J
Klausing, H
Mistele, D
Rotter, T
Stemmer, J
Fedler, F
Semchinova, O
Graul, J
Citation: Vv. Emtsev et al., Annealing behaviour of electrically active point defects in gamma-irradiated n-GaN films, J CRYST GR, 210(1-3), 2000, pp. 273-277
Authors:
Rotter, T
Mistele, D
Stemmer, J
Fedler, F
Aderhold, J
Graul, J
Schwegler, V
Kirchner, C
Kamp, M
Heuken, M
Citation: T. Rotter et al., Photoinduced oxide film formation on n-type GaN surfaces using alkaline solutions, APPL PHYS L, 76(26), 2000, pp. 3923-3925