Authors: LAUWERS A NAEM A DEPOTTER M MAEX K

Citation: A. Lauwers et al., EFFECT OF IMPLANTATION OXIDE ON THE TI-SILICIDATION AND CO-SILICIDATION OF NARROW DIFFUSION AND POLY-LINES, Thin solid films, 320(1), 1998, pp. 122-127

Authors: BARDWELL JA EVANS RJ DRAPER N ROLFE SJ NAEM A SIMARDNORMANDIN M

Citation: Ja. Bardwell et al., DOPANT DEPTH PROFILING BY ANODIC SECTIONING USING 0.1 M HCL ELECTROLYTE, Journal of the Electrochemical Society, 143(11), 1996, pp. 256-258

Authors: SARAN M NAEM A

Citation: M. Saran et A. Naem, APPLICATION OF ULTRAVIOLET DIFFUSE-REFLECTANCE IN THE STUDY OF SILICIDE FILMS, Journal of the Electrochemical Society, 142(5), 1995, pp. 1688-1692

Authors: DAS SR SHEERGAR K XU DX NAEM A

Citation: Sr. Das et al., THICKNESS DEPENDENCE OF THE PROPERTIES AND THERMAL-STABILITY OF PTSI FILMS, Thin solid films, 253(1-2), 1994, pp. 467-472