Citation: Xd. Wang et al., A narrow photoluminescence linewidth of 19.2 meV at 1.35 mu m from In0.5Ga0.5As/GaAs quantum island structure grown by molecular beam epitaxy, CHIN PHYS L, 18(4), 2001, pp. 608-610
Citation: Zc. Niu et al., Modification of emission wavelength of self-assembled In(Ga)As/GaAs quantum dots covered by InxGa1-xAs(0 <= x <= 0.3) layer, J CRYST GR, 227, 2001, pp. 1062-1068
Citation: Xd. Wang et al., Effect of InxGa1-xAs (0 <= x <= 0.4) capping layer on self-assembled 1.3 mu m wavelength InAs/GaAs quantum islands, J CRYST GR, 223(3), 2001, pp. 363-368
Citation: Xd. Wang et al., Influence of InxGa1-xAs (0 <= x <= 0.3) cap layer on structural and optical properties of self-assembled InAs/GaAs quantum dots, JPN J A P 1, 39(9A), 2000, pp. 5076-5079
Citation: Xd. Wang et al., Study of self-assembled InAs quantum dot structure covered by InxGa1-xAs(0<= x <= 0.3) capping layer, ACT PHY C E, 49(11), 2000, pp. 2230-2234
Citation: Xd. Wang et al., 1.35 mu m photoluminescence from In0.5Ga0.5As/GaAs islands grown by molecular beam epitaxy via cycled (InAs)(1)/(GaAs)(1) monolayer deposition, J CRYST GR, 220(1-2), 2000, pp. 16-22
Citation: Gc. Sun et al., Microwave absorption characteristics of chiral materials with Fe3O4-polyaniline composite matrix, INT J ELECT, 87(6), 2000, pp. 735-740
Authors:
Niu, ZC
Notzel, R
Jahn, U
Schonherr, HP
Fricke, J
Ploog, KH
Citation: Zc. Niu et al., Self-limiting MBE growth and characterization of three-dimensionally confined nanostructures on patterned GaAs(311)A substrates, J ELEC MAT, 28(1), 1999, pp. 1-5
Authors:
Notzel, R
Schonherr, HP
Niu, ZC
Daweritz, L
Ploog, KH
Citation: R. Notzel et al., Uniform quantum wire and quantum dot arrays by atomic hydrogen assisted MBE on patterned high-index substrate: role of atomic hydrogen in natural self-faceting, J CRYST GR, 202, 1999, pp. 814-818
Authors:
Fricke, J
Notzel, R
Jahn, U
Niu, ZC
Schonherr, HP
Ramsteiner, M
Ploog, KH
Citation: J. Fricke et al., Patterned growth on GaAs (311)A substrates: Engineering of growth selectivity for lateral semiconductor nanostructures, J APPL PHYS, 86(5), 1999, pp. 2896-2900