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Results: 1-19 |
Results: 19
Role of hydrogen in hydrogenated microcrystalline silicon
Authors: Itoh, T Yamamoto, K Harada, H Yamana, N Yoshida, N Inouchi, H Nonomura, S Nitta, S
Citation: T. Itoh et al., Role of hydrogen in hydrogenated microcrystalline silicon, SOL EN MAT, 66(1-4), 2001, pp. 239-244
Absorption coefficient spectra of mu c-Si in the low-energy region 0.4-1.2eV
Authors: Kitao, J Harada, H Yoshida, N Kasuya, Y Nishio, M Sakamoto, T Itoh, T Nonomura, S Nitta, S
Citation: J. Kitao et al., Absorption coefficient spectra of mu c-Si in the low-energy region 0.4-1.2eV, SOL EN MAT, 66(1-4), 2001, pp. 245-251
The creation of hydrogen radicals by the hot-wire technique and its application for mu c-Si : H
Authors: Harada, H Yoshida, N Yamamoto, K Itoh, T Inagaki, K Inouchi, H Yamana, N Aoki, T Nonomura, S Nitta, S
Citation: H. Harada et al., The creation of hydrogen radicals by the hot-wire technique and its application for mu c-Si : H, SOL EN MAT, 66(1-4), 2001, pp. 253-258
Photoinduced effects on infrared and near infrared absorption of amorphousand microcrystalline Si measured by photothermal bending spectroscopy
Authors: Kitao, J Kasuya, Y Kunii, T Yoshida, N Nonomura, S
Citation: J. Kitao et al., Photoinduced effects on infrared and near infrared absorption of amorphousand microcrystalline Si measured by photothermal bending spectroscopy, ANAL SCI, 17, 2001, pp. S302-S304
Photo-induced volume changes in a-Si : H films prepared by Cat-CVD method
Authors: Hatano, T Nakae, Y Mori, H Ohkado, K Yoshida, N Nonomura, S Itoh, M Masuda, A Matsumura, H
Citation: T. Hatano et al., Photo-induced volume changes in a-Si : H films prepared by Cat-CVD method, THIN SOL FI, 395(1-2), 2001, pp. 84-86
Effect of r.f.-plasma assistance in hot-wire CVD on properties of mu c-Si : H
Authors: Itoh, T Inouchi, H Ohkado, K Chikusa, K Nakamura, N Kondo, H Yoshida, N Nonomura, S
Citation: T. Itoh et al., Effect of r.f.-plasma assistance in hot-wire CVD on properties of mu c-Si : H, THIN SOL FI, 395(1-2), 2001, pp. 217-220
Preparation of silicon-carbon alloy films by hot-wire CVD and their properties
Authors: Itoh, T Katoh, Y Fujiwara, T Fukunaga, K Nonomura, S Nitta, S
Citation: T. Itoh et al., Preparation of silicon-carbon alloy films by hot-wire CVD and their properties, THIN SOL FI, 395(1-2), 2001, pp. 240-243
Effect of the intercalation of Ne on electronic properties of C-60 solids
Authors: Bitoh, S Itoh, T Yoshida, S Nitta, S Nonomura, S
Citation: S. Bitoh et al., Effect of the intercalation of Ne on electronic properties of C-60 solids, MOLEC CRYST, 340, 2000, pp. 655-660
Intercalation of O-2 and its effect on the properties of C-60 and C-70 solids
Authors: Itoh, T Yasuda, R Go, T Nitta, S Nonomura, S
Citation: T. Itoh et al., Intercalation of O-2 and its effect on the properties of C-60 and C-70 solids, MOLEC CRYST, 340, 2000, pp. 661-666
Preparation and properties of one-dimensional C-60 nano-structure in a zeolite FSM-16
Authors: Kobayashi, N Nitta, S Habuchi, H Yasui, T Itoh, T Nonomura, S
Citation: N. Kobayashi et al., Preparation and properties of one-dimensional C-60 nano-structure in a zeolite FSM-16, MOLEC CRYST, 340, 2000, pp. 781-786
Annealing temperature dependence of the size of C-60 clusters in C-60-doped silicon oxide films
Authors: Hasegawa, I Nonomura, S
Citation: I. Hasegawa et S. Nonomura, Annealing temperature dependence of the size of C-60 clusters in C-60-doped silicon oxide films, J SOL-GEL S, 19(1-3), 2000, pp. 297-300
Characterization of low dielectric constant amorphous carbon nitride films
Authors: Aono, M Nitta, S Katsuno, T Itoh, T Nonomura, S
Citation: M. Aono et al., Characterization of low dielectric constant amorphous carbon nitride films, APPL SURF S, 159, 2000, pp. 341-344
Properties and electron field emission of highly resistive and transparentpolymer-like a-C : H
Authors: Saito, K Itoh, T Katoh, Y Okada, N Hatta, A Inomoto, H Nitta, S Nonomura, S Hiraki, A
Citation: K. Saito et al., Properties and electron field emission of highly resistive and transparentpolymer-like a-C : H, J NON-CRYST, 266, 2000, pp. 788-792
Structural stability for UV irradiation and dielectric properties of a-CNxfilms
Authors: Itoh, T Aono, M Yoshida, S Hattori, S Katsuno, T Nitta, S Nonomura, S
Citation: T. Itoh et al., Structural stability for UV irradiation and dielectric properties of a-CNxfilms, J NON-CRYST, 266, 2000, pp. 825-829
Characterization and role of hydrogen in nc-Si : H
Authors: Itoh, T Yamamoto, K Ushikoshi, K Nonomura, S Nitta, S
Citation: T. Itoh et al., Characterization and role of hydrogen in nc-Si : H, J NON-CRYST, 266, 2000, pp. 201-205
The light-induced metastable lattice expansion in hydrogenated amorphous silicon
Authors: Nonomura, S Yoshida, N Gotoh, T Sakamoto, T Matsuda, A Nitta, S
Citation: S. Nonomura et al., The light-induced metastable lattice expansion in hydrogenated amorphous silicon, J NON-CRYST, 266, 2000, pp. 474-480
A study on the correlation between the photoinduced volume expansion and the internal stress in hydrogenated amorphous silicon
Authors: Sakamoto, T Yoshida, N Harada, H Kishida, T Nonomura, S Gotoh, T Kondo, M Matsuda, A Itoh, T Nitta, S
Citation: T. Sakamoto et al., A study on the correlation between the photoinduced volume expansion and the internal stress in hydrogenated amorphous silicon, J NON-CRYST, 266, 2000, pp. 481-485
Localized electronic states related to O-2 intercalation and photoirradiation on C-60 films and C-70 films
Authors: Habuchi, H Nitta, S Han, DX Nonomura, S
Citation: H. Habuchi et al., Localized electronic states related to O-2 intercalation and photoirradiation on C-60 films and C-70 films, J APPL PHYS, 87(12), 2000, pp. 8580-8588
Structural and electronic properties of highly photoconductive amorphous carbon nitride
Authors: Iwasaki, T Aono, M Nitta, S Habuchi, H Itoh, T Nonomura, S
Citation: T. Iwasaki et al., Structural and electronic properties of highly photoconductive amorphous carbon nitride, DIAM RELAT, 8(2-5), 1999, pp. 440-445
Risultati: 1-19 |