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Citation: Bm. Kostishko et Am. Orlov, INFLUENCE OF SUCCESSIVE ELECTRON AND LASER IRRADIATION ON THE PHOTOLUMINESCENCE OF POROUS SILICON, Technical physics, 43(3), 1998, pp. 318-322
Citation: Bm. Kostishko et al., ACTIVATION-ENERGY OF ELECTRON-STIMULATED QUENCHING OF THE PHOTOLUMINESCENCE OF N-TYPE POROUS SILICON, Technical physics letters, 23(9), 1997, pp. 714-716
Citation: Bm. Kostishko et al., STOICHIOMETRY AND PROPERTIES OF UNDOPED INDIUM OXIDE-FILMS PREPARED BY REACTIVE EVAPORATION, Inorganic materials, 33(8), 1997, pp. 816-819
Citation: Bm. Kostishko et al., EVOLUTION OF POROUS SILICON LUMINESCENCE UNDER THE SIMULTANEOUS THERMAL AND LASER EFFECTS, Pis'ma v Zurnal tehniceskoj fiziki, 22(10), 1996, pp. 68-73
Citation: Am. Orlov et al., EFFECT OF DIFFUSION-PROCESSES ON THE CONTACT MELTING OF METALLIZATIONLAYERS IN SI-SI-A (GE-A)-AL STRUCTURES, Inorganic materials, 32(3), 1996, pp. 246-249
Citation: Bm. Kostishko et al., CHEMICAL TREATMENT OF POROUS SILICON AND MODIFICATION OF ITS PHOTOLUMINESCENCE DUE TO CONTINUOUS LASER EXPOSURE, Pis'ma v Zurnal tehniceskoj fiziki, 21(19), 1995, pp. 32-37
Authors:
KOSTISHKO BM
ORLOV AM
MIKOV SN
EMELYANOVA TG
Citation: Bm. Kostishko et al., A STUDY OF HYDROGEN GROUPS AND THEIR ARRANGEMENT IN POROUS SILICON USING AUGER-ELECTRON SPECTROSCOPY, Inorganic materials, 31(4), 1995, pp. 410-412
Citation: Bm. Kostishko et al., STUDY OF THE DEPTH PROFILE OF PHOSPHORUS DIFFUSION IN SILICON BY AUGER-ELECTRON SPECTROSCOPY, Inorganic materials, 30(6), 1994, pp. 794-795