Authors:
EICEMAN GA
PRESTON D
TIANO G
RODRIGUEZ J
PARMETER JE
Citation: Ga. Eiceman et al., QUANTITATIVE CALIBRATION OF VAPOR LEVELS OF TNT, RDX, AND PETN USING A DIFFUSION GENERATOR WITH GRAVIMETRY AND ION MOBILITY SPECTROMETRY, Talanta, 45(1), 1997, pp. 57-74
Citation: Je. Parmeter et al., TREATMENT OF INP SURFACES IN RADIO-FREQUENCY H-2 AND H-2 CH4/AR PLASMAS - IN-SITU COMPOSITIONAL ANALYSIS, ETCH RATES, AND SURFACE-ROUGHNESS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3563-3574
Authors:
VARTULI CB
PEARTON SJ
ABERNATHY CR
SHUL RJ
HOWARD AJ
KILCOYNE SP
PARMETER JE
HAGEROTTCRAWFORD M
Citation: Cb. Vartuli et al., HIGH-DENSITY PLASMA-ETCHING OF III-V NITRIDES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1011-1014
Authors:
PARMETER JE
PETERSEN GA
SMITH PM
APBLETT CA
REID JS
NORMAN JAT
HOCHBERG AK
ROBERTS DA
OMSTEAD TR
Citation: Je. Parmeter et al., CHARACTERIZATION OF THIN COPPER-FILMS GROWN VIA CHEMICAL-VAPOR-DEPOSITION USING LIQUID COINJECTION OF TRIMETHYLVINYLSILANE AND (HEXAFLUOROACETYLACETONATE) CU (TRIMETHYLVINYLSILANE), Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(1), 1995, pp. 130-136
Authors:
PETERSEN GA
PARMETER JE
APBLETT CA
GONZALES MF
SMITH PM
OMSTEAD TR
NORMAN JAT
Citation: Ga. Petersen et al., ENHANCED CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM (HFAC)CU(TMVS) USING LIQUID COINJECTION OF TMVS, Journal of the Electrochemical Society, 142(3), 1995, pp. 939-944
Citation: Rj. Shul et al., HIGH-TEMPERATURE ELECTRON-CYCLOTRON-RESONANCE ETCHING OF GAN, INN, AND ALN, Applied physics letters, 66(14), 1995, pp. 1761-1763
Citation: Je. Parmeter et al., SURFACE-REACTIONS OF TETRANEOPENTYL ZIRCONIUM ON ZIRCONIUM CARBIDE THIN-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 2107-2113
Citation: Jr. Creighton et Je. Parmeter, METAL CVD FOR MICROELECTRONIC APPLICATIONS - AN EXAMINATION OF SURFACE-CHEMISTRY AND KINETICS, Critical reviews in solid state and materials sciences, 18(2), 1993, pp. 175-238
Citation: Je. Parmeter, COPPER CVD CHEMISTRY ON A REACTIVE SUBSTRATE - CU(HFAC)2 AND HFACH ONPT(111), Journal of physical chemistry, 97(44), 1993, pp. 11530-11541