Authors: PETRESCU V MOUTHAAN AJ SCHOENMAKER W SALM C

Citation: V. Petrescu et al., MECHANICAL-STRESS EVOLUTION AND THE BLECH LENGTH - 2D SIMULATION OF EARLY ELECTROMIGRATION EFFECTS, Microelectronics and reliability, 38(6-8), 1998, pp. 1047-1050

Authors: MOUTHAAN TJ PETRESCU V

Citation: Tj. Mouthaan et V. Petrescu, THE MODELING OF RESISTANCE CHANGES IN THE EARLY PHASE OF ELECTROMIGRATION, Microelectronics and reliability, 38(1), 1998, pp. 99-105

Authors: BORGARINO M PETRESCU V BRIZZOLARA L DEMUNARI I FANTINI F

Citation: M. Borgarino et al., ELECTRICAL AND THERMAL SIMULATION OF LOCAL-EFFECTS FOR ELECTROMIGRATION, Semiconductor science and technology, 12(11), 1997, pp. 1369-1377

Authors: PETRESCU V MOUTHAAN AJ SCHOENMAKER W

Citation: V. Petrescu et al., EARLY RESISTANCE CHANGE AND STRESS ELECTROMIGRATION MODELING IN ALUMINUM INTERCONNECTS/, Microelectronics and reliability, 37(10-11), 1997, pp. 1491-1494