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Results: 1-18 |
Results: 18
O- FORMATION FROM O-2 VIA RYDBERG-RYDBERG ELECTRON-TRANSFER
Authors: NAGESHA K PINNADUWAGE LA
Citation: K. Nagesha et La. Pinnaduwage, O- FORMATION FROM O-2 VIA RYDBERG-RYDBERG ELECTRON-TRANSFER, The Journal of chemical physics, 109(17), 1998, pp. 7124-7127
HIGH-RYDBERG FRAGMENT FORMATION VIA CORE DISSOCIATION OF SUPEREXCITEDRYDBERG MOLECULES
Authors: PINNADUWAGE LA ZHU YF
Citation: La. Pinnaduwage et Yf. Zhu, HIGH-RYDBERG FRAGMENT FORMATION VIA CORE DISSOCIATION OF SUPEREXCITEDRYDBERG MOLECULES, The Journal of chemical physics, 108(16), 1998, pp. 6633-6637
ELECTRON-ATTACHMENT TO PHOTOFRAGMENTS AND RYDBERG STATES IN LASER-IRRADIATED CCL2F2
Authors: PINNADUWAGE LA DATSKOS PG TAV C
Citation: La. Pinnaduwage et al., ELECTRON-ATTACHMENT TO PHOTOFRAGMENTS AND RYDBERG STATES IN LASER-IRRADIATED CCL2F2, Journal of applied physics, 84(7), 1998, pp. 3442-3450
ENHANCED FORMATION OF NEGATIVE-IONS BY ELECTRON-ATTACHMENT TO HIGHLY EXCITED MOLECULES IN A FLOWING AFTERGLOW PLASMA
Authors: DING WX MCCORKLE DL PINNADUWAGE LA
Citation: Wx. Ding et al., ENHANCED FORMATION OF NEGATIVE-IONS BY ELECTRON-ATTACHMENT TO HIGHLY EXCITED MOLECULES IN A FLOWING AFTERGLOW PLASMA, Journal of applied physics, 84(6), 1998, pp. 3051-3058
ELECTRON-ATTACHMENT TO BORON-TRICHLORIDE
Authors: TAV C DATSKOS PG PINNADUWAGE LA
Citation: C. Tav et al., ELECTRON-ATTACHMENT TO BORON-TRICHLORIDE, Journal of applied physics, 84(10), 1998, pp. 5805-5807
POTENTIAL-ENERGY SURFACES OF EXCITED-STATES OF H-2(-)
Authors: MEBEL AM LIN SH PINNADUWAGE LA
Citation: Am. Mebel et al., POTENTIAL-ENERGY SURFACES OF EXCITED-STATES OF H-2(-), Chemical physics letters, 285(1-2), 1998, pp. 114-120
PHOTOPHYSICAL AND ELECTRON-ATTACHMENT PROPERTIES OF ARF-EXCIMER-LASERIRRADIATED H-2
Authors: DATSKOS PG PINNADUWAGE LA KIELKOPF JF
Citation: Pg. Datskos et al., PHOTOPHYSICAL AND ELECTRON-ATTACHMENT PROPERTIES OF ARF-EXCIMER-LASERIRRADIATED H-2, Physical review. A, 55(6), 1997, pp. 4131-4142
ELECTRON-ATTACHMENT TO THERMALLY EXCITED TRICHLOROTRIFLUOROETHANE (1,1,2-C2CL3F3)
Authors: DATSKOS PG TAV C SAUERS I PINNADUWAGE LA
Citation: Pg. Datskos et al., ELECTRON-ATTACHMENT TO THERMALLY EXCITED TRICHLOROTRIFLUOROETHANE (1,1,2-C2CL3F3), Journal of physics. D, Applied physics, 30(18), 1997, pp. 2596-2602
ELECTRON-ATTACHMENT TO EXCITED-STATES OF SILANE - IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES
Authors: PINNADUWAGE LA DATSKOS PG
Citation: La. Pinnaduwage et Pg. Datskos, ELECTRON-ATTACHMENT TO EXCITED-STATES OF SILANE - IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES, Journal of applied physics, 81(12), 1997, pp. 7715-7727
LONG-TIME STABILITY OF SUPEREXCITED HIGH RYDBERG MOLECULAR-STATES
Authors: PINNADUWAGE LA ZHU YF
Citation: La. Pinnaduwage et Yf. Zhu, LONG-TIME STABILITY OF SUPEREXCITED HIGH RYDBERG MOLECULAR-STATES, Chemical physics letters, 277(1-3), 1997, pp. 147-152
ENHANCED ELECTRON-ATTACHMENT TO HIGHLY EXCITED MOLECULES USING A PLASMA MIXING SCHEME
Authors: PINNADUWAGE LA DING WX MCCORKLE DL
Citation: La. Pinnaduwage et al., ENHANCED ELECTRON-ATTACHMENT TO HIGHLY EXCITED MOLECULES USING A PLASMA MIXING SCHEME, Applied physics letters, 71(25), 1997, pp. 3634-3636
NOVEL TECHNIQUE FOR REAL-TIME MONITORING OF ELECTRON-ATTACHMENT TO LASER-EXCITED MOLECULES
Authors: PINNADUWAGE LA DATSKOS PG
Citation: La. Pinnaduwage et Pg. Datskos, NOVEL TECHNIQUE FOR REAL-TIME MONITORING OF ELECTRON-ATTACHMENT TO LASER-EXCITED MOLECULES, The Journal of chemical physics, 104(21), 1996, pp. 8382-8392
MASS IDENTIFICATION OF NEGATIVE-IONS IN EXCIMER-LASER-IRRADIATED TRIETHYLAMINE - ATOMIC REARRANGEMENTS IN ELECTRON-ATTACHMENT TO HIGHLY EXCITED-STATES
Authors: PINNADUWAGE LA MCCORKLE DL
Citation: La. Pinnaduwage et Dl. Mccorkle, MASS IDENTIFICATION OF NEGATIVE-IONS IN EXCIMER-LASER-IRRADIATED TRIETHYLAMINE - ATOMIC REARRANGEMENTS IN ELECTRON-ATTACHMENT TO HIGHLY EXCITED-STATES, Chemical physics letters, 255(4-6), 1996, pp. 410-418
ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES
Authors: PINNADUWAGE LA MARTIN MZ CHRISTOPHOROU LG
Citation: La. Pinnaduwage et al., ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES, Contributions to Plasma Physics, 35(4-5), 1995, pp. 433-438
EFFECT OF ELECTRON-TEMPERATURE ON NEGATIVE HYDROGEN-ION PRODUCTION INA LOW-PRESSURE AR DISCHARGE PLASMA WITH METHANE - COMMENT
Authors: PINNADUWAGE LA
Citation: La. Pinnaduwage, EFFECT OF ELECTRON-TEMPERATURE ON NEGATIVE HYDROGEN-ION PRODUCTION INA LOW-PRESSURE AR DISCHARGE PLASMA WITH METHANE - COMMENT, Applied physics letters, 67(7), 1995, pp. 1034-1034
LASING IN AL FOLLOWING PHOTOIONIZATION AND NEUTRALIZATION IN THE PRESENCE OF H-2 - THE ROLE OF H-
Authors: KIELKOPF JF PINNADUWAGE LA CHRISTOPHOROU LG
Citation: Jf. Kielkopf et al., LASING IN AL FOLLOWING PHOTOIONIZATION AND NEUTRALIZATION IN THE PRESENCE OF H-2 - THE ROLE OF H-, Physical review. A, 49(4), 1994, pp. 2675-2680
VERIFICATION OF H- FORMATION IN ULTRAVIOLET-LASER-IRRADIATED HYDROGEN- IMPLICATIONS FOR NEGATIVE-ION AND NEUTRAL BEAM TECHNOLOGIES
Authors: PINNADUWAGE LA CHRISTOPHOROU LG
Citation: La. Pinnaduwage et Lg. Christophorou, VERIFICATION OF H- FORMATION IN ULTRAVIOLET-LASER-IRRADIATED HYDROGEN- IMPLICATIONS FOR NEGATIVE-ION AND NEUTRAL BEAM TECHNOLOGIES, Journal of applied physics, 76(1), 1994, pp. 46-54
ENHANCED NEGATIVE-ION FORMATION IN ULTRAVIOLET-LASER IRRADIATED SILANE - IMPLICATIONS FOR PLASMA DEPOSITION OF AMORPHOUS-SILICON
Authors: PINNADUWAGE LA MARTIN MZ CHRISTOPHOROU LG
Citation: La. Pinnaduwage et al., ENHANCED NEGATIVE-ION FORMATION IN ULTRAVIOLET-LASER IRRADIATED SILANE - IMPLICATIONS FOR PLASMA DEPOSITION OF AMORPHOUS-SILICON, Applied physics letters, 65(20), 1994, pp. 2571-2573
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