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Results:
1-21
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Results: 21
Authors:
KODANDAPANI R
PIO F
NI CZ
PICCIALLI G
KLEMSZ M
MCKERCHER S
MAKI RA
ELY KR
Citation: R. Kodandapani et al., A NEW PATTERN FOR HELIX-TURN-HELIX RECOGNITION REVEALED BY THE PU.1-ETS-DOMAIN DNA COMPLEX (VOL 380, PG 456, 1996), Nature, 392(6676), 1998, pp. 630-630
Authors:
ANDERSON KL
SMITH KA
PIO F
TORBETT BE
MAKI RA
Citation: Kl. Anderson et al., NEUTROPHILS DEFICIENT IN PU.1 DO NOT TERMINALLY DIFFERENTIATE OR BECOME FUNCTIONALLY COMPETENT, Blood, 92(5), 1998, pp. 1576-1585
Authors:
LOMBARDO A
WANG Y
NI CZ
DAI X
DICKINSON CD
KODANDAPANI R
CHIANG S
WHITE CA
PIO F
XUONG NH
HAMLIN RC
RUOSLAHTI E
ELY KR
Citation: A. Lombardo et al., CONFORMATIONAL FLEXIBILITY AND CRYSTALLIZATION OF TANDEMLY LINKED TYPE-III MODULES OF HUMAN FIBRONECTIN, Protein science, 5(9), 1996, pp. 1934-1938
Authors:
PIO F
KODANDAPANI R
NI CZ
PICCIALLI G
MCKERCHER S
KLEMSZ M
MAKI RA
ELY KR
Citation: F. Pio et al., CRYSTAL-STRUCTURE OF PU.1 ETS DOMAIN-DNA COMPLEX - A NEW PATTERN FOR HELIX-TURN-HELIX RECOGNITION, The FASEB journal, 10(6), 1996, pp. 794-794
Authors:
VINCENT E
PAPADAS C
RIVA C
PIO F
GHIBAUDO G
Citation: E. Vincent et al., RELIABILITY ISSUES OF FURNACE NITRIDATED OXIDES PREPARED WITH REDUCEDTHERMAL BUDGET IN N2O AMBIENT, Solid-state electronics, 39(7), 1996, pp. 1051-1054
Authors:
KODANDAPANI R
PIO F
NI CZ
PICCIALLI G
KLEMSZ M
MCKERCHER S
MAKI RA
ELY KR
Citation: R. Kodandapani et al., A NEW PATTERN FOR HELIX-TURN-HELIX RECOGNITION REVEALED BY THE PU.1 ETS-DOMAIN-DNA COMPLEX, Nature, 380(6573), 1996, pp. 456-460
Authors:
PIO F
Citation: F. Pio, SHEET RESISTANCE AND LAYOUT EFFECTS IN ACCELERATED TESTS FOR DIELECTRIC RELIABILITY EVALUATION, Microelectronics, 27(7), 1996, pp. 675-685
Authors:
PIO F
KODANDAPANI R
NI CZ
SHEPARD W
KLEMSZ M
MCKERCHER SR
MAKI RA
ELY KR
Citation: F. Pio et al., NEW INSIGHTS ON DNA RECOGNITION BY ETS PROTEIN FROM THE CRYSTAL-STRUCTURE OF THE PU.1 ETS DOMAIN DNA COMPLEX (VOL 271, PG 23329, 1996), The Journal of biological chemistry, 271(51), 1996, pp. 33156-33156
Authors:
PIO F
KODANDAPANI R
NI CZ
SHEPARD W
KLEMSZ M
MCKERCHER SR
MAKI RA
ELY KR
Citation: F. Pio et al., NEW INSIGHTS ON DNA RECOGNITION BY ETS PROTEINS FROM THE CRYSTAL-STRUCTURE OF THE PU.1 ETS DOMAIN DNA COMPLEX, The Journal of biological chemistry, 271(38), 1996, pp. 23329-23337
Authors:
BOUVET D
CLIVAZ PA
DUTOIT M
COLUZZA C
ALMEIDA J
MARGARITONDO G
PIO F
Citation: D. Bouvet et al., INFLUENCE OF NITROGEN PROFILE AN ELECTRICAL CHARACTERISTICS OF FURNACE-NITRIDED OR RAPID THERMALLY NITRIDED SILICON DIOXIDE FILMS, Journal of applied physics, 79(9), 1996, pp. 7114-7122
Authors:
PIO F
NI CZ
MITCHELL RS
KNIGHT J
MCKERCHER S
KLEMSZ M
LOMBARDO A
MAKI RA
ELY KR
Citation: F. Pio et al., COCRYSTALLIZATION OF AN ETS DOMAIN (PU.1) IN COMPLEX WITH DNA - ENGINEERING THE LENGTH OF BOTH PROTEIN AND OLIGONUCLEOTIDE, The Journal of biological chemistry, 270(41), 1995, pp. 24258-24263
Authors:
PAPADAS C
PANANAKAKIS G
GHIBAUDO G
RIVA C
PIO F
GHEZZI P
Citation: C. Papadas et al., MODELING OF THE INTRINSIC RETENTION CHARACTERISTICS OF FLOTOX EEPROM CELLS UNDER ELEVATED-TEMPERATURE CONDITIONS, I.E.E.E. transactions on electron devices, 42(4), 1995, pp. 678-682
Authors:
PAPADAS C
GHIBAUDO G
PIO F
MONSERIE C
PANANAKAKIS G
MORTINI P
RIVA C
Citation: C. Papadas et al., ON THE CHARGE BUILDUP MECHANISMS IN GATE DIELECTRICS, Solid-state electronics, 37(3), 1994, pp. 495-505
Authors:
BELLAFIORE N
PIO F
RIVA C
Citation: N. Bellafiore et al., THIN SIO2-FILMS NITRIDED IN N2O, Microelectronics, 25(7), 1994, pp. 495-500
Authors:
LEBIHAN R
ANDREBENOIT E
PAPADAS C
PIO F
RIVA C
Citation: R. Lebihan et al., IMPACT OF FURNACE NITRIDATION TIME IN N2O AMBIENT ON THE QUALITY OF THE SI SIO2 SYSTEM/, Microelectronics, 25(7), 1994, pp. 577-582
Authors:
GUZZI M
MARTINI M
PALEARI A
PIO F
VEDDA A
AZZONI CB
Citation: M. Guzzi et al., NEUTRON-IRRADIATION EFFECTS IN AMORPHOUS SIO2 - OPTICAL-ABSORPTION AND ELECTRON-PARAMAGNETIC-RESONANCE, Journal of physics. Condensed matter, 5(43), 1993, pp. 8105-8116
Authors:
PIO F
RAVAZZI L
RIVA C
Citation: F. Pio et al., INFLUENCE OF SERIES RESISTANCE IN OXIDE PARAMETER EXTRACTION DATA FROM ACCELERATED TESTS, Microelectronics and reliability, 33(11-12), 1993, pp. 1657-1663
Authors:
CAPPELLETTI P
GHEZZI P
PIO F
RIVA C
Citation: P. Cappelletti et al., WAFER LEVEL TUNNEL OXIDE RELIABILITY EVALUATION BY MEANS OF THE EXPONENTIALLY RAMPED CURRENT STRESS METHOD, Microelectronics and reliability, 33(10), 1993, pp. 1579-1596
Authors:
PAPADAS C
GHIBAUDO G
PANANAKAKIS G
PIO F
RIVA C
GHEZZI P
Citation: C. Papadas et al., IMPACT OF REACTIVE ION ETCHING USING O2+CHF3 PLASMA ON THE ENDURANCE PERFORMANCE OF FLOTOX EEPROM CELLS, I.E.E.E. transactions on electron devices, 40(8), 1993, pp. 1549-1551
Authors:
PAPADAS C
GHIBAUDO G
PIO F
RIVA C
MORTINI P
PANANAKAKIS G
Citation: C. Papadas et al., INFLUENCE OF RAPID THERMAL NITRIDATION PROCESS IN N2O AMBIENT ON THE ENDURANCE PERFORMANCE OF FLOTOX EEPROM CELLS, Electronics Letters, 29(2), 1993, pp. 242-243
Authors:
GHEZZI P
PIO F
QUEIROLO G
RIVA C
Citation: P. Ghezzi et al., A STUDY OF THE OXIDE GROWN ON WSI2, Semiconductor science and technology, 6(7), 1991, pp. 684-689
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