AAAAAA
Results:
1-21
|
Results: 21
Authors:
Raptis, I
Citation: I. Raptis, Resist lithographic performance enhancement based on solvent removal measurements by optical interferometry, JPN J A P 1, 40(9A), 2001, pp. 5310-5311
Authors:
Raptis, I
Zapatrin, RR
Citation: I. Raptis et Rr. Zapatrin, Algebraic description of spacetime foam, CLASS QUANT, 18(20), 2001, pp. 4187-4212
Authors:
Mladenov, G
Vutova, K
Raptis, I
Argitis, P
Rangelow, I
Citation: G. Mladenov et al., Simulation of latent image formation for ion beam projection lithography, MICROEL ENG, 57-8, 2001, pp. 335-342
Authors:
Diakoumakos, CD
Raptis, I
Tserepi, A
Argitis, P
Citation: Cd. Diakoumakos et al., Negative (meth)acrylate resist materials based on novel crosslinking chemistry, MICROEL ENG, 57-8, 2001, pp. 539-545
Authors:
Tserepi, A
Valamontes, ES
Tegou, E
Raptis, I
Gogolides, E
Citation: A. Tserepi et al., Surface and line-edge roughness in plasma-developed resists, MICROEL ENG, 57-8, 2001, pp. 547-554
Authors:
Raptis, I
Glezos, N
Valamontes, E
Zervas, E
Argitis, P
Citation: I. Raptis et al., Electron beam lithography simulation for high resolution and high-density patterns, VACUUM, 62(2-3), 2001, pp. 263-271
Authors:
Mallios, A
Raptis, I
Citation: A. Mallios et I. Raptis, Finitary spacetime sheaves of quantum causal sets: Curving quantum causality, INT J THEOR, 40(11), 2001, pp. 1885-1928
Authors:
Raptis, I
Nowotny, B
Glezos, N
Gentili, M
Meneghini, G
Citation: I. Raptis et al., Electron beam lithography simulation on homogeneous and multilayer substrates, JPN J A P 1, 39(2A), 2000, pp. 635-644
Authors:
Patsis, GP
Tserepi, A
Raptis, I
Glezos, N
Gogolides, E
Valamontes, ES
Citation: Gp. Patsis et al., Surface and line-edge roughness in solution and plasma developed negative tone resists: Experiment and simulation, J VAC SCI B, 18(6), 2000, pp. 3292-3296
Authors:
Glezos, N
Argitis, P
Velessiotis, D
Raptis, I
Hatzakis, M
Hudek, P
Kostic, I
Citation: N. Glezos et al., Aqueous base development and acid diffusion length optimization in negative epoxy resist for electron beam lithography, J VAC SCI B, 18(6), 2000, pp. 3431-3434
Authors:
Argitis, P
Glezos, N
Vasilopoulou, M
Raptis, I
Hatzakis, M
Everett, J
Meneghini, G
Palumbo, A
Ardito, M
Hudek, P
Kostic, I
Citation: P. Argitis et al., Aqueous base developable epoxy resist for high sensitivity electron beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 453-456
Authors:
Raptis, I
Velessiotis, D
Vasilopoulou, M
Argitis, P
Citation: I. Raptis et al., Development mechanism study by dissolution monitoring of positive methacrylate photoresists, MICROEL ENG, 53(1-4), 2000, pp. 489-492
Authors:
Raptis, I
Citation: I. Raptis, Finitary spacetime sheaves, INT J THEOR, 39(6), 2000, pp. 1703-1716
Authors:
Raptis, I
Citation: I. Raptis, Algebraic quantization of causal sets, INT J THEOR, 39(5), 2000, pp. 1233-1240
Authors:
Raptis, I
Zapatrin, RR
Citation: I. Raptis et Rr. Zapatrin, Quantization of discretized spacetimes and the correspondence principle, INT J THEOR, 39(1), 2000, pp. 1-13
Authors:
Patsis, GP
Glezos, N
Raptis, I
Valamontes, ES
Citation: Gp. Patsis et al., Simulation of roughness in chemically amplified resists using percolation theory, J VAC SCI B, 17(6), 1999, pp. 3367-3370
Authors:
Koskinas, J
Raptis, I
Manika, Z
Hadziyannis, S
Citation: J. Koskinas et al., Overlapping syndrome of autoimmune hepatitis and primary sclerosing cholangitis associated with pyoderma gangrenosum and ulcerative colitis, EUR J GASTR, 11(12), 1999, pp. 1421-1424
Authors:
Kaloterakis, A
Filiotou, A
Koskinas, J
Raptis, I
Zouboulis, C
Michelakakis, H
Hadziyannis, S
Citation: A. Kaloterakis et al., Systemic AL amyloidosis in Gaucher disease. A case report and review of the literature, J INTERN M, 246(6), 1999, pp. 587-590
Authors:
Rosenbusch, A
Cui, Z
DiFabrizio, E
Gentili, M
Glezos, N
Meneghini, G
Nowotny, B
Patsis, G
Prewett, P
Raptis, I
Citation: A. Rosenbusch et al., Simulation of chemically amplified resist processes for 150 nm e-beam lithography, MICROEL ENG, 46(1-4), 1999, pp. 379-382
Authors:
Seo, Y
Lee, K
Yi, M
Seo, E
Choi, BK
Kim, O
Raptis, I
Argitis, P
Hatzakis, M
Citation: Y. Seo et al., Evaluation of advanced epoxy novolac resist, EPR, for sub 100nm synchrotron x-ray proximity lithography, MICROEL ENG, 46(1-4), 1999, pp. 461-464
Authors:
Tegou, E
Gogolides, E
Argitis, P
Raptis, I
Meneghini, G
Cui, Z
Citation: E. Tegou et al., Silylation and dry development of chemically amplified resists SAL601(1),AZPN114*(1), and epoxidised resist (EPR*(1)) for high resolution electron-beam lithography, JPN J A P 1, 37(12B), 1998, pp. 6873-6876
Risultati:
1-21
|