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Results:
1-6
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Results: 6
Analysis of focused ion beam implantation of semiconductors by thermal microscopy
Authors:
Dietzel, D Rocken, H Pelzl, J Bein, BK
Citation:
D. Dietzel et al., Analysis of focused ion beam implantation of semiconductors by thermal microscopy, SURF COAT, 142, 2001, pp. 429-436
The heavy ion micro-projection setup at Bochum
Authors:
Stephan, A Meijer, J Weidenmuller, U Rocken, H Bukow, HH Burchard, M Zaitsev, A Volland, B Rangelow, IW
Citation:
A. Stephan et al., The heavy ion micro-projection setup at Bochum, NUCL INST B, 181, 2001, pp. 39-43
White electroluminescent nanostructures in silicon fabricated using focused ion implantation
Authors:
Rocken, H Meijer, J Stephan, A Weidenmuller, U Bukow, HH Rolfs, C
Citation:
H. Rocken et al., White electroluminescent nanostructures in silicon fabricated using focused ion implantation, NUCL INST B, 181, 2001, pp. 274-279
Synthesis of CoSi2-structures using ion microprobes
Authors:
Meijer, J Weidenmuller, U Baving, P Rocken, H Stephan, A Bukow, HH Rolfs, C
Citation:
J. Meijer et al., Synthesis of CoSi2-structures using ion microprobes, NUCL INST B, 161, 2000, pp. 898-903
Synthesis of silicide structures by high energy ion projection
Authors:
Weidenmuller, U Meijer, J Baving, P Rocken, H Bukow, HH Rolfs, C
Citation:
U. Weidenmuller et al., Synthesis of silicide structures by high energy ion projection, MICROEL ENG, 53(1-4), 2000, pp. 385-388
Microprobe as implanter for semiconductor devices
Authors:
Meijer, J Stephan, A Adamczewski, J Rocken, H Weidenmuller, U Bukow, HH Rolfs, C
Citation:
J. Meijer et al., Microprobe as implanter for semiconductor devices, NUCL INST B, 158(1-4), 1999, pp. 39-43
Risultati:
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