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Results: 1-25/30
Authors:
IDRISS H
SEEBAUER EG
Citation: H. Idriss et Eg. Seebauer, PHOTOOXIDATION OF ETHANOL ON FE-TI OXIDE PARTICULATES, Langmuir, 14(21), 1998, pp. 6146-6150
Authors:
DITCHFIELD R
LLERARODRIGUEZ D
SEEBAUER EG
Citation: R. Ditchfield et al., NONTHERMAL EFFECTS OF PHOTON ILLUMINATION ON SURFACE-DIFFUSION, Physical review letters, 81(6), 1998, pp. 1259-1262
Authors:
IDRISS H
MILLER A
SEEBAUER EG
Citation: H. Idriss et al., PHOTOREACTIONS OF ETHANOL AND MTBE ON METAL-OXIDE PARTICLES IN THE TROPOSPHERE, Catalysis today, 33(1-3), 1997, pp. 215-225
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, PRACTICAL PROCESSING ISSUES IN TITANIUM SILICIDE CVD, Applied surface science, 119(1-2), 1997, pp. 41-49
Authors:
ALLEN CE
DITCHFIELD R
SEEBAUER EG
Citation: Ce. Allen et al., SURFACE-DIFFUSION OF GE ON SI(111) - EXPERIMENT AND SIMULATION, Physical review. B, Condensed matter, 55(19), 1997, pp. 13304-13313
Authors:
SEEBAUER EG
DITCHFIELD R
Citation: Eg. Seebauer et R. Ditchfield, FIXING HIDDEN PROBLEMS WITH THERMAL BUDGET, Solid state technology, 40(10), 1997, pp. 111
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, KINETICS OF TISI2 FORMATION AND SILICON CONSUMPTION DURING CHEMICAL-VAPOR-DEPOSITION, Journal of the Electrochemical Society, 144(6), 1997, pp. 2122-2137
Authors:
DITCHFIELD R
SEEBAUER EG
Citation: R. Ditchfield et Eg. Seebauer, RAPID THERMAL-PROCESSING - FIXING PROBLEMS WITH THE CONCEPT OF THERMAL BUDGET, Journal of the Electrochemical Society, 144(5), 1997, pp. 1842-1849
Authors:
IDRISS H
SEEBAUER EG
Citation: H. Idriss et Eg. Seebauer, FAST PHOTOREACTIONS OF OXYGENATES ON TROPOSPHERIC FLY-ASH PARTICLES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 1627-1632
Authors:
SOUTHWELL RP
MENDICINO MA
SEEBAUER EG
Citation: Rp. Southwell et al., OPTIMIZATION OF SELECTIVE TISI2 CHEMICAL-VAPOR-DEPOSITION BY MECHANISTIC CHEMICAL-KINETICS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 928-934
Authors:
ALLEN CE
DITCHFIELD R
SEEBAUER EG
Citation: Ce. Allen et al., SURFACE-DIFFUSION OF IN ON SI(111) - EVIDENCE FOR SURFACE-IONIZATION EFFECTS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(1), 1996, pp. 22-29
Authors:
SUNI II
SEEBAUER EG
Citation: Ii. Suni et Eg. Seebauer, SURFACE SELF-DIFFUSION AT HIGH-TEMPERATURES - NEW SIMULATIONAL INSIGHTS, Thin solid films, 272(2), 1996, pp. 229-234
Authors:
ALLEN CE
SEEBAUER EG
Citation: Ce. Allen et Eg. Seebauer, SURFACE DIFFUSIVITIES AND REACTION-RATE CONSTANTS - MAKING A QUANTITATIVE EXPERIMENTAL CONNECTION, The Journal of chemical physics, 104(7), 1996, pp. 2557-2565
Authors:
HANSEN DA
HALBACH MR
SEEBAUER EG
Citation: Da. Hansen et al., EXPERIMENTAL MEASUREMENTS OF FAST ADSORPTION-KINETICS OF H-2 ON VICINAL SI(100) AND (111) SURFACES, The Journal of chemical physics, 104(18), 1996, pp. 7338-7343
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, A PREDICTIVE KINETIC-MODEL FOR THE CHEMICAL-VAPOR-DEPOSITION OF TISI2, Journal of the Electrochemical Society, 143(5), 1996, pp. 1726-1736
Authors:
DITCHFIELD R
MENDICINO MA
SEEBAUER EG
Citation: R. Ditchfield et al., ADSORPTION OF CHLORINE ON TISI2 - APPLICATION TO ETCHING AND DEPOSITION OF SILICIDE FILMS, Journal of the Electrochemical Society, 143(1), 1996, pp. 266-271
Authors:
ALLEN CE
SEEBAUER EG
Citation: Ce. Allen et Eg. Seebauer, SURFACE-DIFFUSION OF SB ON SI(111) MEASURED BY 2ND-HARMONIC MICROSCOPY, Langmuir, 11(1), 1995, pp. 186-190
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, ADSORPTION OF TICL4 ON TISI2 - APPLICATION TO SILICIDE CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(2), 1995, pp. 221-229
Authors:
SEEBAUER EG
ALLEN CE
Citation: Eg. Seebauer et Ce. Allen, ESTIMATING SURFACE-DIFFUSION COEFFICIENTS, Progress in Surface Science, 49(3), 1995, pp. 265-330
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, DIFFERENTIAL-CONVERSION TEMPERATURE-PROGRAMMED DESORPTION - A NEW METHOD FOR OBTAINING BIMOLECULAR SURFACE RATE CONSTANTS, Surface science, 340(3), 1995, pp. 281-292
Authors:
SOUTHWELL RP
SEEBAUER EG
Citation: Rp. Southwell et Eg. Seebauer, SIH4 ON TISI2 - AN INVESTIGATION OF GAS-ADSORPTION ON METAL-LIKE COMPOUNDS, Surface science, 329(1-2), 1995, pp. 107-114
Authors:
MENDICINO MA
SEEBAUER EG
Citation: Ma. Mendicino et Eg. Seebauer, KINETICS OF SALICIDE CONTACT FORMATION FOR THIN-FILM SOI TRANSISTORS, Journal of the Electrochemical Society, 142(2), 1995, pp. 28-30
Authors:
MENDICINO MA
SOUTHWELL RP
SEEBAUER EG
Citation: Ma. Mendicino et al., CHEMICAL-VAPOR-DEPOSITION OF TISI2 USING SIH4 AND TICL4, Thin solid films, 253(1-2), 1994, pp. 473-478
Authors:
SEEBAUER EG
Citation: Eg. Seebauer, QUANTITATIVE EXTRACTION OF CONTINUOUS DISTRIBUTIONS OF ENERGY-STATES AND PREEXPONENTIAL FACTORS FROM THERMAL-DESORPTION SPECTRA, Surface science, 316(3), 1994, pp. 391-405
Authors:
SUNI II
SEEBAUER EG
Citation: Ii. Suni et Eg. Seebauer, A NEW PHYSICAL PICTURE FOR SURFACE-DIFFUSION AT HIGH-TEMPERATURES, Surface science, 301(1-3), 1994, pp. 120000235-120000238