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Results: 1-16 |
Results: 16

Authors: HARTMANN J SIEMROTH P SCHULTRICH B RAUSCHENBACH B
Citation: J. Hartmann et al., CHARACTERIZATION OF CARBON NITRIDE PRODUCED BY HIGH-CURRENT VACUUM-ARC DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(6), 1997, pp. 2983-2987

Authors: SIEMROTH P ZIMMER O SCHULKE T VETTER J
Citation: P. Siemroth et al., VACUUM-ARC EVAPORATION WITH PROGRAMMABLE EROSION AND DEPOSITION PROFILE, Surface & coatings technology, 94-5(1-3), 1997, pp. 592-596

Authors: SCHULTRICH B SIEMROTH P SCHEIBE HJ
Citation: B. Schultrich et al., HIGH-RATE DEPOSITION BY VACUUM-ARC METHODS, Surface & coatings technology, 93(1), 1997, pp. 64-68

Authors: WENZEL C URBANSKY N KLIMES W SIEMROTH P SCHULKE T
Citation: C. Wenzel et al., GAP FILLING WITH PVD PROCESSES FOR COPPER METALLIZED INTEGRATED-CIRCUITS, Microelectronic engineering, 33(1-4), 1997, pp. 31-38

Authors: KLEINERT H GROSSER S SCHULTRICH B SIEMROTH P
Citation: H. Kleinert et al., ACTIVATING ADHEREND SURFACES BY APPLYING ARC-DISCHARGE TREATMENT, International journal of adhesion and adhesives, 17(3), 1997, pp. 203-206

Authors: SIEMROTH P SCHULKE T WITKE T
Citation: P. Siemroth et al., INVESTIGATION OF CATHODE SPOTS AND PLASMA FORMATION OF VACUUM ARCS BYHIGH-SPEED MICROSCOPY AND SPECTROSCOPY, IEEE transactions on plasma science, 25(4), 1997, pp. 571-579

Authors: SCHULKE T ANDERS A SIEMROTH P
Citation: T. Schulke et al., MACROPARTICLE FILTERING OF HIGH-CURRENT VACUUM-ARC PLASMAS, IEEE transactions on plasma science, 25(4), 1997, pp. 660-664

Authors: SCHEIBE HJ SCHULTRICH B ZIEGELE H SIEMROTH P
Citation: Hj. Scheibe et al., DEPOSITION OF SUPERHARD AMORPHOUS-CARBON FILMS BY PULSED-ARC SOURCES, IEEE transactions on plasma science, 25(4), 1997, pp. 685-688

Authors: WITKE T LENK A SIEMROTH P
Citation: T. Witke et al., CHANNEL SPARK DISCHARGES FOR THIN-FILM TECHNOLOGY, IEEE transactions on plasma science, 25(4), 1997, pp. 758-762

Authors: SIEMROTH P WENZEL C KLIMES W SCHULTRICH B SCHULKE T
Citation: P. Siemroth et al., METALLIZATION OF SUBMICRON TRENCHES AND VIAS WITH HIGH-ASPECT-RATIO, Thin solid films, 308, 1997, pp. 455-459

Authors: SCHULKE T SIEMROTH P
Citation: T. Schulke et P. Siemroth, VACUUM-ARC CATHODE SPOTS AS A SELF-SIMILARITY PHENOMENON, IEEE transactions on plasma science, 24(1), 1996, pp. 63-64

Authors: SIEMROTH P SCHULTRICH B SCHULKE T
Citation: P. Siemroth et al., FUNDAMENTAL PROCESSES IN VACUUM-ARC DEPOSITION, Surface & coatings technology, 74-5(1-3), 1995, pp. 92-96

Authors: SIEMROTH P SCHIILKE T WITKE T
Citation: P. Siemroth et al., MICROSCOPIC HIGH-SPEED INVESTIGATIONS OF VACUUM-ARC CATHODE SPOTS, IEEE transactions on plasma science, 23(6), 1995, pp. 919-925

Authors: SIEMROTH P SCHULKE T WITKE T
Citation: P. Siemroth et al., HIGH-CURRENT ARC - A NEW SOURCE FOR HIGH-RATE DEPOSITION, Surface & coatings technology, 68, 1994, pp. 314-319

Authors: SIEMROTH P WITKE T SCHULKE T LENK A
Citation: P. Siemroth et al., SHORT-TIME INVESTIGATION OF LASER AND ARC-ASSISTED DEPOSITION PROCESSES, Surface & coatings technology, 68, 1994, pp. 713-718

Authors: SCHULTRICH B SCHEIBE HJ GRANDREMY G SCHNEIDER D SIEMROTH P
Citation: B. Schultrich et al., ELASTIC-MODULUS OF DIAMOND-LIKE CARBON-FILMS PREPARED BY PULSED VACUUM-ARC, Thin solid films, 253(1-2), 1994, pp. 125-129
Risultati: 1-16 |