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Results: 1-7 |
Results: 7
Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS
Authors: Guillot, J Fabreguette, F Imhoff, L Heintz, O de Lucas, MCM Sacilotti, M Domenichini, B Bourgeois, S
Citation: J. Guillot et al., Amorphous TiO2 in LP-OMCVD TiNxOy thin films revealed by XPS, APPL SURF S, 177(4), 2001, pp. 268-272
Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiNxOy films as a function of the growth temperature: a percolation approach
Authors: Fabreguette, F Maglione, M Imhoff, L Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M
Citation: F. Fabreguette et al., Conductimetry and impedance spectroscopy study of low pressure metal organic chemical vapor deposition TiNxOy films as a function of the growth temperature: a percolation approach, APPL SURF S, 175, 2001, pp. 574-578
Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth
Authors: Fabreguette, F Imhoff, L Heintz, O Maglione, M Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M
Citation: F. Fabreguette et al., Structural and in depth characterization of newly designed conducting/insulating TiNxOy/TiO2 multilayers obtained by one step LP-MOCVD growth, APPL SURF S, 175, 2001, pp. 685-690
Correlation between the electrical properties and morphology of low-pressure MOCVD titanium oxynitride thin films grown at various temperatures
Authors: Fabreguette, F Imhoff, L Maglione, M Domenichini, B de Lucas, MCM Sibillot, P Bourgeois, S Sacilotti, M
Citation: F. Fabreguette et al., Correlation between the electrical properties and morphology of low-pressure MOCVD titanium oxynitride thin films grown at various temperatures, CHEM VAPOR, 6(3), 2000, pp. 109-114
Temperature and substrate influence on the structure of TiNxOy thin films grown by low pressure metal organic chemical vapour deposition
Authors: Fabreguette, F Imhoff, L Guillot, J Domenichini, B de Lucas, MC Sibillot, P Bourgeois, S Sacilotti, M
Citation: F. Fabreguette et al., Temperature and substrate influence on the structure of TiNxOy thin films grown by low pressure metal organic chemical vapour deposition, SURF COAT, 125(1-3), 2000, pp. 396-399
Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films
Authors: Gauthier, V Bourgeois, S Sibillot, P Maglione, M Sacilotti, M
Citation: V. Gauthier et al., Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films, THIN SOL FI, 340(1-2), 1999, pp. 175-182
Temperature dependence of AllnAs band gap energy and AllnAs/InP band offsets
Authors: Abraham, P Perez, MAG Benyattou, T Guillot, G Sacilotti, M Letartre, X
Citation: P. Abraham et al., Temperature dependence of AllnAs band gap energy and AllnAs/InP band offsets, MATER SCI T, 14(12), 1998, pp. 1291-1294
Risultati: 1-7 |