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Results: 1-9 |
Results: 9
Calculated photoelectron angular distributions of omega-(n-pyrrolyl)alkanethiol self-assembled monolayers for distinguishing between different arrangements of the pyrrole groups
Authors: Hasegawa, S Yakushi, K Inokuchi, H Kamiya-Okudaira, K Ueno, N Seki, K Morikawa, E Saile, V
Citation: S. Hasegawa et al., Calculated photoelectron angular distributions of omega-(n-pyrrolyl)alkanethiol self-assembled monolayers for distinguishing between different arrangements of the pyrrole groups, J ELEC SPEC, 120(1-3), 2001, pp. 121-129
Angle-resolved photoemission measurements of omega-(n-pyrrolyl)alkanethiolself-assembled monolayers using in-situ sample preparation apparatus
Authors: Hasegawa, S Horigome, T Yakushi, K Inokuchi, H Okudaira-Kamiya, K Ueno, N Seki, K Willicut, RJ McCarley, RL Morikawa, E Saile, V
Citation: S. Hasegawa et al., Angle-resolved photoemission measurements of omega-(n-pyrrolyl)alkanethiolself-assembled monolayers using in-situ sample preparation apparatus, J ELEC SPEC, 113(2-3), 2001, pp. 101-107
Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation
Authors: Dattoli, G Doria, A Gallerano, GP Giannessi, L Hesch, K Moser, HO Ottaviani, PL Pellegrin, E Rossmanith, R Steininger, R Saile, V Wust, J
Citation: G. Dattoli et al., Extreme ultraviolet (EUV) sources for lithography based on synchrotron radiation, NUCL INST A, 474(3), 2001, pp. 259-272
Chemically inert membrane separator fabricated with the AMANDA-process
Authors: Rummler, Z Bacher, W Saile, V Schomburg, WK
Citation: Z. Rummler et al., Chemically inert membrane separator fabricated with the AMANDA-process, MICROSYST T, 6(5), 2000, pp. 189-191
ANKA - a synchrotron light source for X-ray based micromachining
Authors: Gottert, J Moser, HO Pantenburg, FJ Saile, V Steininger, R
Citation: J. Gottert et al., ANKA - a synchrotron light source for X-ray based micromachining, MICROSYST T, 6(3), 2000, pp. 113-116
Pendant group orientation of poly(2-vinylnaphthalene) thin film surface studied by near-edge x-ray absorption fine structure spectroscopy (NEXAFS) and angle-resolved ultraviolet photoelectron spectroscopy (ARUPS)
Authors: Morikawa, E Saile, V Okudaira, KK Azuma, Y Meguro, K Harada, Y Seki, K Hasegawa, S Ueno, N
Citation: E. Morikawa et al., Pendant group orientation of poly(2-vinylnaphthalene) thin film surface studied by near-edge x-ray absorption fine structure spectroscopy (NEXAFS) and angle-resolved ultraviolet photoelectron spectroscopy (ARUPS), J CHEM PHYS, 112(23), 2000, pp. 10476-10481
AMANDA - surface micromachining, molding, and diaphragm transfer
Authors: Schomburg, WK Ahrens, R Bacher, W Martin, J Saile, V
Citation: Wk. Schomburg et al., AMANDA - surface micromachining, molding, and diaphragm transfer, SENS ACTU-A, 76(1-3), 1999, pp. 343-348
Surface molecular orientation of poly(2-vinylnaphalene) thin films: ARUPS and NEXAFS studies
Authors: Okudaira, KK Morikawa, E Hite, DA Hasegawa, S Ishii, H Imamura, M Shimada, H Azuma, Y Meguro, K Harada, Y Saile, V Seki, K Ueno, N
Citation: Kk. Okudaira et al., Surface molecular orientation of poly(2-vinylnaphalene) thin films: ARUPS and NEXAFS studies, J ELEC SPEC, 103, 1999, pp. 389-392
Electronic structure and molecular orientation of well-ordered polyethylene oligomer (n-C44H90) on Cu(100) and Au(111) surfaces studied by UV photoemission and low energy electron diffraction
Authors: Ishii, H Morikawa, E Tang, SJ Yoshimura, D Ito, E Okudaira, K Miyamae, T Hasegawa, S Sprunger, PT Ueno, N Seki, K Saile, V
Citation: H. Ishii et al., Electronic structure and molecular orientation of well-ordered polyethylene oligomer (n-C44H90) on Cu(100) and Au(111) surfaces studied by UV photoemission and low energy electron diffraction, J ELEC SPEC, 103, 1999, pp. 559-564
Risultati: 1-9 |