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Results: 1-25/31
Authors:
Tsakova, V
Winkels, S
Schultze, JW
Citation: V. Tsakova et al., Crystallization kinetics of Pd in composite films of PEDT, J ELEC CHEM, 500(1-2), 2001, pp. 574-583
Authors:
Efimov, I
Winkels, S
Schultze, JW
Citation: I. Efimov et al., EQCM study of electropolymerization and redox cycling of 3,4-polyethylenedioxythiophene, J ELEC CHEM, 499(1), 2001, pp. 169-175
Authors:
Haisch, T
Mittemeijer, EJ
Schultze, JW
Citation: T. Haisch et al., Influences of material inhomogeneities in 100Cr6 steel on the electrochemical metal dissolution process, Z METALLKUN, 92(5), 2001, pp. 417-422
Authors:
Reier, T
Schultze, JW
Osterle, W
Buchal, C
Citation: T. Reier et al., The growth of aligned AlN-nanocrystals in aluminium after nitrogen-ion implantation at 330 K, THIN SOL FI, 385(1-2), 2001, pp. 29-35
Authors:
Schultze, JW
Staikov, G
Citation: Jw. Schultze et G. Staikov, Special issue - Electrochemical micro- and nano-system technologies - A Selection of Papers from the Third International Symposium on ElectrochemicalMicrosystem Technologies (EMT-3), held at Garmisch-Partenkirchen, Germany 10-15 September 2000, ELECTR ACT, 47(1-2), 2001, pp. 1-1
Authors:
Schultze, JW
Bressel, A
Citation: Jw. Schultze et A. Bressel, Principles of electrochemical micro- and nano-system technologies, ELECTR ACT, 47(1-2), 2001, pp. 3-21
Authors:
Semenikhin, OA
Stromberg, C
Ehrenburg, MR
Konig, U
Schultze, JW
Citation: Oa. Semenikhin et al., Photoelectrochemical properties and microstructuring of polythiophenes, ELECTR ACT, 47(1-2), 2001, pp. 171-180
Authors:
Haisch, T
Mittemeijer, E
Schultze, JW
Citation: T. Haisch et al., Electrochemical machining of the steel 100Cr6 in aqueous NaCl and NaNO3 solutions: microstructure of surface films formed by carbides, ELECTR ACT, 47(1-2), 2001, pp. 235-241
Authors:
Poghossian, A
Luth, H
Schultze, JW
Schoning, MJ
Citation: A. Poghossian et al., (Bio-)chemical and physical microsensor arrays using an identical transducer principle, ELECTR ACT, 47(1-2), 2001, pp. 243-249
Authors:
Bloess, H
Staikov, G
Schultze, JW
Citation: H. Bloess et al., AFM induced formation of SiO2 structures in the electrochemical nanocell, ELECTR ACT, 47(1-2), 2001, pp. 335-344
Authors:
Ehlers, C
Konig, U
Staikov, G
Schultze, JW
Citation: C. Ehlers et al., Role of surface states in electrodeposition of Pb on n-Ge(111), ELECTR ACT, 47(1-2), 2001, pp. 379-385
Authors:
Haegel, FH
Schlupen, J
Schultze, JW
Winkels, S
Stromberg, C
Citation: Fh. Haegel et al., Anodic polymerization of thiophene microemulsions and liquid derivatives from crystals, ELECTR ACT, 46(26-27), 2001, pp. 3973-3984
Authors:
Tsakova, V
Borissov, D
Ranguelov, B
Stromberg, C
Schultze, JW
Citation: V. Tsakova et al., Electrochemical incorporation of copper in polyaniline layers, ELECTR ACT, 46(26-27), 2001, pp. 4213-4222
Authors:
Ronkel, F
Schultze, JW
Citation: F. Ronkel et Jw. Schultze, Electrochemical aspects of porous silicon formation, J POROUS MA, 7(1-3), 2000, pp. 11-16
Authors:
Schmitt, G
Fassbender, F
Luth, H
Schoning, MJ
Schultze, JW
Buss, G
Citation: G. Schmitt et al., Passivation and corrosion of microelectrode arrays, MATER CORRO, 51(1), 2000, pp. 20-25
Authors:
Fassbender, F
Schmitt, G
Schoning, MJ
Luth, H
Buss, G
Schultze, JW
Citation: F. Fassbender et al., Optimization of passivation layers for corrosion protection of silicon-based microelectrode arrays, SENS ACTU-B, 68(1-3), 2000, pp. 128-133
Authors:
Schoning, MJ
Buss, G
Fassbender, F
Gluck, O
Emons, H
Schmitt, G
Schultze, JW
Luth, H
Citation: Mj. Schoning et al., A silicon-based microelectrode array for chemical analysis, SENS ACTU-B, 65(1-3), 2000, pp. 284-287
Authors:
Schoning, MJ
Kurowski, A
Thust, M
Kordos, P
Schultze, JW
Luth, H
Citation: Mj. Schoning et al., Capacitive microsensors for biochemical sensing based on porous silicon technology, SENS ACTU-B, 64(1-3), 2000, pp. 59-64
Authors:
Tsakova, V
Winkels, S
Schultze, JW
Citation: V. Tsakova et al., Anodic polymerization of 3,4-ethylenedioxythiophene from aqueous microemulsions, ELECTR ACT, 46(5), 2000, pp. 759-768
Authors:
Schultze, JW
Citation: Jw. Schultze, Electrochemical Materials Science - An introduction to Symposium 4 of the 50th Anniversary of ISE 'Electrochemistry and Materials: Synthesis and Characterization', ELECTR ACT, 45(20), 2000, pp. 3193-3203
Authors:
Schultze, JW
Musiani, M
Osaka, T
Citation: Jw. Schultze et al., ISE 99: Electrochemical Materials Science, ELECTR ACT, 45(20), 2000, pp. XI-XI
Authors:
Inzelt, G
Pineri, M
Schultze, JW
Vorotyntsev, MA
Citation: G. Inzelt et al., Electron and proton conducting polymers: recent developments and prospects, ELECTR ACT, 45(15-16), 2000, pp. 2403-2421
Authors:
Schultze, JW
Lohrengel, MM
Citation: Jw. Schultze et Mm. Lohrengel, Stability, reactivity and breakdown of passive films. Problems of recent and future research, ELECTR ACT, 45(15-16), 2000, pp. 2499-2513
Authors:
Lehnert, W
Leiva, E
Schmickler, W
Schultze, JW
Citation: W. Lehnert et al., A simple method for calculating the corrugation of metal surfaces, CHEM PHYS, 247(2), 1999, pp. 207-214
Authors:
Pfohl, C
Rie, KT
Hirschfeld, MK
Schultze, JW
Citation: C. Pfohl et al., Evaluation of the corrosion behaviour of wear-resistant PACVD coatings, SURF COAT, 112(1-3), 1999, pp. 114-117