Authors:
Segal, AS
Galyukov, AO
Kondratyev, AV
Sid'ko, AP
Karpov, SY
Makarov, YN
Siebert, W
Storck, P
Citation: As. Segal et al., Comparison of silicon epitaxial growth on the 200-and 300-mm wafers from trichlorosilane in Centura reactors, MICROEL ENG, 56(1-2), 2001, pp. 93-98
Citation: Cg. Hurwitz et As. Segal, Application of pressure steps to mechanosensitive channels in membrane patches: a simple, economical, and fast system, PFLUG ARCH, 442(1), 2001, pp. 150-156
Authors:
Lang, R
Lee, G
Liu, WM
Tian, SL
Rafi, H
Orias, M
Segal, AS
Desir, GV
Citation: R. Lang et al., KCNA10: a novel ion channel functionally related to both voltage-gated potassium and CNG cation channels, AM J P-REN, 278(6), 2000, pp. F1013-F1021
Authors:
Segal, AS
Vorob'ev, AN
Karpov, SY
Mokhov, EN
Ramm, MG
Ramm, MS
Roenkov, AD
Vodakov, YA
Makarov, YN
Citation: As. Segal et al., Growth of silicon carbide by sublimation sandwich method in the atmosphereof inert gas, J CRYST GR, 208(1-4), 2000, pp. 431-441
Authors:
Vorob'ev, AN
Komissarov, AE
Segal, AS
Makarov, YN
Karpov, SY
Zhmakin, AI
Rupp, R
Citation: An. Vorob'Ev et al., Modeling analysis of gas phase nucleation in silicon carbide chemical vapor deposition, MAT SCI E B, 61-2, 1999, pp. 176-178