Citation: Ma. Sobolewski, Measuring the ion current in high-density plasmas using radio-frequency current and voltage measurements, J APPL PHYS, 90(6), 2001, pp. 2660-2671
Citation: Ma. Sobolewski, Sheath model for radio-frequency-biased, high-density plasmas valid for all omega/omega(i), PHYS REV E, 62(6), 2000, pp. 8540-8553
Citation: Ma. Sobolewski et Kl. Steffens, Electrical control of the spatial uniformity of reactive species in plasmas, J VAC SCI A, 17(6), 1999, pp. 3281-3292
Citation: Kl. Steffens et Ma. Sobolewski, Planar laser-induced fluorescence of CF2 in O-2/CF4 and O-2/C2F6 chamber-cleaning plasmas: Spatial uniformity and comparison to electrical measurements, J VAC SCI A, 17(2), 1999, pp. 517-527
Citation: Kl. Steffens et Ma. Sobolewski, Electrical control of plasma spatial uniformity investigated by planar laser-induced fluorescence, IEEE PLAS S, 27(1), 1999, pp. 74-75
Authors:
Entley, WR
Langan, JG
Felker, BS
Sobolewski, MA
Citation: Wr. Entley et al., Optimizing utilization efficiencies in electronegative discharges: The importance of the impedance phase angle, J APPL PHYS, 86(9), 1999, pp. 4825-4835
Citation: Ma. Sobolewski et al., Ion energy distributions and sheath voltages in a radio-frequency-biased, inductively coupled, high-density plasma reactor, J APPL PHYS, 85(8), 1999, pp. 3966-3975