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Results:
1-7
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Results: 7
Authors:
Golzhauser, A
Eck, W
Geyer, W
Stadler, V
Weimann, T
Hinze, P
Grunze, M
Citation: A. Golzhauser et al., Chemical nanolithography with electron beams, ADVAN MATER, 13(11), 2001, pp. 806
Authors:
Frey, S
Stadler, V
Heister, K
Eck, W
Zharnikov, M
Grunze, M
Zeysing, B
Terfort, A
Citation: S. Frey et al., Structure of thioaromatic self-assembled monolayers on gold and silver, LANGMUIR, 17(8), 2001, pp. 2408-2415
Authors:
Liu, HW
Bhushan, B
Eck, W
Stadler, V
Citation: Hw. Liu et al., Investigation of the adhesion, friction, and wear properties of biphenyl thiol self-assembled monolayers by atomic force microscopy, J VAC SCI A, 19(4), 2001, pp. 1234-1240
Authors:
Weimann, T
Geyer, W
Hinze, P
Stadler, V
Eck, W
Golzhauser, A
Citation: T. Weimann et al., Nanoscale patterning of self-assembled monolayers by e-beam lithography, MICROEL ENG, 57-8, 2001, pp. 903-907
Authors:
Golzhauser, A
Geyer, W
Stadler, V
Eck, W
Grunze, M
Edinger, K
Weimann, T
Hinze, P
Citation: A. Golzhauser et al., Nanoscale patterning of self-assembled monolayers with electrons, J VAC SCI B, 18(6), 2000, pp. 3414-3418
Authors:
Eck, W
Stadler, V
Geyer, W
Zharnikov, M
Golzhauser, A
Grunze, M
Citation: W. Eck et al., Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams - A first step towards chemical lithography, ADVAN MATER, 12(11), 2000, pp. 805-808
Authors:
Geyer, W
Stadler, V
Eck, W
Zharnikov, M
Golzhauser, A
Grunze, M
Citation: W. Geyer et al., Electron-induced crosslinking of aromatic self-assembled monolayers: Negative resists for nanolithography, APPL PHYS L, 75(16), 1999, pp. 2401-2403
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