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Results: 1-25 | 26-42
Results: 1-25/42
MICROINDENTATION MEASUREMENTS OF GLASSY-CARBON IMPLANTED WITH HIGH-ENERGY TITANIUM IONS
Authors: NAKAO S SAITOH K IKEYAMA M NIWA H TANEMURA S MIYAGAWA Y MIYAGAWA S JIN P BELL T WIELUNSKI LS SWAIN MV
Citation: S. Nakao et al., MICROINDENTATION MEASUREMENTS OF GLASSY-CARBON IMPLANTED WITH HIGH-ENERGY TITANIUM IONS, Surface & coatings technology, 104, 1998, pp. 384-388
HIGH-ENERGY COIMPLANTATION OF TI AND O IONS INTO SAPPHIRE
Authors: NAKAO S IKEYAMA M TAZAWA M JIN P NIWA H TANEMURA S MIYAGAWA Y MIYAGAWA S SAITOH K
Citation: S. Nakao et al., HIGH-ENERGY COIMPLANTATION OF TI AND O IONS INTO SAPPHIRE, Materials chemistry and physics, 54(1-3), 1998, pp. 342-345
HIGH-ENERGY CU AND O ION COIMPLANTATION INTO SILICA GLASSES
Authors: NAKAO S SAITOH K IKEYAMA M NIWA H TANEMURA S MIYAGAWA Y MIYAGAWA S TAZAWA M JIN P
Citation: S. Nakao et al., HIGH-ENERGY CU AND O ION COIMPLANTATION INTO SILICA GLASSES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 246-251
HIGH-ENERGY W ION-IMPLANTATION INTO VO2 THIN-FILM
Authors: JIN P NAKAO S TANEMURA S
Citation: P. Jin et al., HIGH-ENERGY W ION-IMPLANTATION INTO VO2 THIN-FILM, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 141(1-4), 1998, pp. 419-424
TUNGSTEN DOPING INTO VANADIUM DIOXIDE THERMOCHROMIC FILMS BY HIGH-ENERGY ION-IMPLANTATION AND THERMAL ANNEALING
Authors: JIN P NAKAO S TANEMURA S
Citation: P. Jin et al., TUNGSTEN DOPING INTO VANADIUM DIOXIDE THERMOCHROMIC FILMS BY HIGH-ENERGY ION-IMPLANTATION AND THERMAL ANNEALING, Thin solid films, 324(1-2), 1998, pp. 151-158
NEW MATERIAL DESIGN WITH V1-XWXO2 FILM FOR SKY RADIATOR TO OBTAIN TEMPERATURE STABILITY
Authors: TAZAWA M JIN P YOSHIMURA K MIKI T TANEMURA S
Citation: M. Tazawa et al., NEW MATERIAL DESIGN WITH V1-XWXO2 FILM FOR SKY RADIATOR TO OBTAIN TEMPERATURE STABILITY, Solar energy, 64(1-3), 1998, pp. 3-7
GROWTH OF SAMARIUM MONOSULFIDE THIN-FILMS BY COSPUTTERING DEPOSITION
Authors: JIN P TAZAWA M HUANG JF TANEMURA S
Citation: P. Jin et al., GROWTH OF SAMARIUM MONOSULFIDE THIN-FILMS BY COSPUTTERING DEPOSITION, Journal of crystal growth, 191(1-2), 1998, pp. 285-289
OPTICAL-CONSTANTS OF V1-XWXO2 FILMS
Authors: TAZAWA M JIN P TANEMURA S
Citation: M. Tazawa et al., OPTICAL-CONSTANTS OF V1-XWXO2 FILMS, Applied optics, 37(10), 1998, pp. 1858-1861
ANNEALING OF SILICA GLASSES IMPLANTED WITH HIGH-ENERGY COPPER IONS
Authors: NAKAO S MIYAGAWA Y SAITOH K IKEYAMA M NIWA H TANEMURA S MIYAGAWA S TAZAWA M
Citation: S. Nakao et al., ANNEALING OF SILICA GLASSES IMPLANTED WITH HIGH-ENERGY COPPER IONS, JPN J A P 1, 36(12B), 1997, pp. 7681-7685
INVESTIGATION OF SOLID-STATE PB DOPED TIO2 SOLAR-CELL
Authors: MOSADDEQURRAHMAN M KRISHNA KM MIKI T SOGA T IGARASHI K TANEMURA S UMENO M
Citation: M. Mosaddequrrahman et al., INVESTIGATION OF SOLID-STATE PB DOPED TIO2 SOLAR-CELL, Solar energy materials and solar cells, 48(1-4), 1997, pp. 123-130
OPTICAL-PROPERTIES OF ALUMINA CERAMICS AS A SUBSTRATE OF THIN-FILM SOLAR-CELLS
Authors: TAZAWA M YOSHIMURA K IGARASHI K TANEMURA S
Citation: M. Tazawa et al., OPTICAL-PROPERTIES OF ALUMINA CERAMICS AS A SUBSTRATE OF THIN-FILM SOLAR-CELLS, Solar energy materials and solar cells, 48(1-4), 1997, pp. 315-320
TIO2 ELECTROCHROMIC THIN-FILMS BY REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING
Authors: YOSHIMURA K MIKI T TANEMURA S
Citation: K. Yoshimura et al., TIO2 ELECTROCHROMIC THIN-FILMS BY REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(5), 1997, pp. 2673-2676
DEPENDENCE OF MICROSTRUCTURE AND THERMOCHROMISM ON SUBSTRATE-TEMPERATURE FOR SPUTTER-DEPOSITED VO2 EPITAXIAL-FILMS
Authors: JIN P YOSHIMURA K TANEMURA S
Citation: P. Jin et al., DEPENDENCE OF MICROSTRUCTURE AND THERMOCHROMISM ON SUBSTRATE-TEMPERATURE FOR SPUTTER-DEPOSITED VO2 EPITAXIAL-FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 1113-1117
DEPTH PROFILES OF NITROGEN-IMPLANTED INTO ZIRCONIUM AT HIGH FLUENCE
Authors: TANEMURA S MIYAGAWA Y MIYAGAWA S
Citation: S. Tanemura et al., DEPTH PROFILES OF NITROGEN-IMPLANTED INTO ZIRCONIUM AT HIGH FLUENCE, Bunseki Kagaku, 46(7), 1997, pp. 549-553
FORMATION OF ALUMINA FINE PARTICLES BY A MAGNETRON SPUTTERING-GAS AGGREGATION METHOD
Authors: GOTO M MURAKAMI J TAI Y YOSHIMURA K IGARASHI K TANEMURA S
Citation: M. Goto et al., FORMATION OF ALUMINA FINE PARTICLES BY A MAGNETRON SPUTTERING-GAS AGGREGATION METHOD, Zeitschrift fur Physik. D, Atoms, molecules and clusters, 40(1-4), 1997, pp. 115-118
NETWORK STRUCTURE OF FINE SILICA PARTICLES
Authors: IGARASHI K TAJIRI K TANEMURA S NANBU R FUKUNAGA T
Citation: K. Igarashi et al., NETWORK STRUCTURE OF FINE SILICA PARTICLES, Zeitschrift fur Physik. D, Atoms, molecules and clusters, 40(1-4), 1997, pp. 562-565
OPTICAL-PROPERTIES OF PB DOPED TIO2 NANOCRYSTALLINE THIN-FILMS - A PHOTOLUMINESCENCE SPECTROSCOPIC STUDY
Authors: KRISHNA KM MOSADDEQURRAHMAN M MIKI T SOGA T IGARASHI K TANEMURA S UMENO M
Citation: Km. Krishna et al., OPTICAL-PROPERTIES OF PB DOPED TIO2 NANOCRYSTALLINE THIN-FILMS - A PHOTOLUMINESCENCE SPECTROSCOPIC STUDY, Applied surface science, 114, 1997, pp. 149-154
INFLUENCES OF ION SPECIES (GE-GE FILMS INDUCED BY HIGH-ENERGY ION IRRADIATION(, SB+, AU2+) ON CRYSTALLIZATION OF AMORPHOUS)
Authors: NAKAO S SAITOH K IKEYAMA M NIWA H TANEMURA S MIYAGAWA Y MIYAGAWA S
Citation: S. Nakao et al., INFLUENCES OF ION SPECIES (GE-GE FILMS INDUCED BY HIGH-ENERGY ION IRRADIATION(, SB+, AU2+) ON CRYSTALLIZATION OF AMORPHOUS), Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 82-85
CROSS-SECTIONAL OBSERVATIONS BY HRTEM OF THE STRUCTURE OF NICKEL-OXIDE ELECTROCHROMIC THIN-FILMS IN THE AS-DEPOSITED STATE AND THE BLEACHEDSTATE
Authors: YOSHIMURA K MIKI T TANEMURA S
Citation: K. Yoshimura et al., CROSS-SECTIONAL OBSERVATIONS BY HRTEM OF THE STRUCTURE OF NICKEL-OXIDE ELECTROCHROMIC THIN-FILMS IN THE AS-DEPOSITED STATE AND THE BLEACHEDSTATE, Materials research bulletin, 32(7), 1997, pp. 839-845
ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY DC MAGNETRON SPUTTERING
Authors: YOSHIMURA K MIKI T TANEMURA S
Citation: K. Yoshimura et al., ELECTROCHROMIC PROPERTIES OF NIOBIUM OXIDE THIN-FILMS PREPARED BY DC MAGNETRON SPUTTERING, Journal of the Electrochemical Society, 144(9), 1997, pp. 2982-2985
STRUCTURAL AND OPTICAL CHARACTERIZATION OF PBXTI1-XO2 FILM PREPARED BY SOL-GEL METHOD
Authors: MOSADDEQURRAHMAN M MIKI T KRISHNA KM SOGA T IGARASHI K TANEMURA S UMENO M
Citation: M. Mosaddequrrahman et al., STRUCTURAL AND OPTICAL CHARACTERIZATION OF PBXTI1-XO2 FILM PREPARED BY SOL-GEL METHOD, Materials science & engineering. B, Solid-state materials for advanced technology, 41(1), 1996, pp. 67-71
DEPTH PROFILING OF IMPLANTED NITROGEN USI NG NARROW NUCLEAR RESONANCES .1. AUTOMATIC DATA-ACQUISITION
Authors: TANEMURA S MIYAGAWA Y MIYAGAWA S
Citation: S. Tanemura et al., DEPTH PROFILING OF IMPLANTED NITROGEN USI NG NARROW NUCLEAR RESONANCES .1. AUTOMATIC DATA-ACQUISITION, Bunseki Kagaku, 45(8), 1996, pp. 753-757
DEPTH PROFILING OF IMPLANTED NITROGEN USI NG NARROW NUCLEAR RESONANCES .2. DATA-ANALYSIS TO OBTAIN THE DEPTH PROFILE FROM AN EXCITATION CURVE
Authors: TANEMURA S MIYAGAWA Y MIYAGAWA S
Citation: S. Tanemura et al., DEPTH PROFILING OF IMPLANTED NITROGEN USI NG NARROW NUCLEAR RESONANCES .2. DATA-ANALYSIS TO OBTAIN THE DEPTH PROFILE FROM AN EXCITATION CURVE, Bunseki Kagaku, 45(8), 1996, pp. 759-763
MICROSTRUCTURE OF GERMANIUM FILMS CRYSTALLIZED BY HIGH-ENERGY ION IRRADIATION
Authors: NAKAO S SAITOH K IKEYAMA M NIWA H TANEMURA S MIYAGAWA Y MIYAGAWA S
Citation: S. Nakao et al., MICROSTRUCTURE OF GERMANIUM FILMS CRYSTALLIZED BY HIGH-ENERGY ION IRRADIATION, Thin solid films, 282(1-2), 1996, pp. 10-13
THIN-FILM USED TO OBTAIN A CONSTANT-TEMPERATURE LOWER THAN THE AMBIENT
Authors: TAZAWA M JIN P TANEMURA S
Citation: M. Tazawa et al., THIN-FILM USED TO OBTAIN A CONSTANT-TEMPERATURE LOWER THAN THE AMBIENT, Thin solid films, 282(1-2), 1996, pp. 232-234
Risultati: 1-25 | 26-42