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Results: 1-13 |
Results: 13
Novel polymeric surfactants for improving chemical mechanical polishing performance of silicon oxide
Authors: Tseng, WT Kuo, PL Liao, CL Lu, R Lin, JF
Citation: Wt. Tseng et al., Novel polymeric surfactants for improving chemical mechanical polishing performance of silicon oxide, EL SOLID ST, 4(5), 2001, pp. G42-G45
Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanisms
Authors: Tseng, WT Lo, CH Lee, SC
Citation: Wt. Tseng et al., Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - I. Chemical formulation and reaction mechanisms, J ELCHEM SO, 148(5), 2001, pp. C327-C332
Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - II. Kinetics and microstructure
Authors: Tseng, WT Lo, CH Lee, SC
Citation: Wt. Tseng et al., Electroless deposition of Cu thin films with CuCl2-HNO3 based chemistry - II. Kinetics and microstructure, J ELCHEM SO, 148(5), 2001, pp. C333-C338
Microstructure-related resistivity change after chemical-mechanical polishof Al and W thin films
Authors: Tseng, WT Wang, YL Niu, J
Citation: Wt. Tseng et al., Microstructure-related resistivity change after chemical-mechanical polishof Al and W thin films, THIN SOL FI, 370(1-2), 2000, pp. 96-100
Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide
Authors: Lin, CF Tseng, WT Feng, MS
Citation: Cf. Lin et al., Formation and characteristics of silicon nanocrystals in plasma-enhanced chemical-vapor-deposited silicon-rich oxide, J APPL PHYS, 87(6), 2000, pp. 2808-2815
Impact of plasma-enhanced chemical vapor deposited oxide characteristics on interconnect via resistance and device performance of four-transistor static random access memory with polysilicon load resistors
Authors: Lin, CF Tseng, WT Feng, MS Wang, YL
Citation: Cf. Lin et al., Impact of plasma-enhanced chemical vapor deposited oxide characteristics on interconnect via resistance and device performance of four-transistor static random access memory with polysilicon load resistors, J VAC SCI B, 17(4), 1999, pp. 1456-1463
A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization
Authors: Lin, CF Tseng, WT Feng, MS Wang, YL
Citation: Cf. Lin et al., A ULSI shallow trench isolation process through the integration of multilayered dielectric process and chemical-mechanical planarization, THIN SOL FI, 347(1-2), 1999, pp. 248-252
A comparative study on the roles of velocity in the material removal rate during chemical mechanical polishing
Authors: Tseng, WT Chin, JH Kang, LC
Citation: Wt. Tseng et al., A comparative study on the roles of velocity in the material removal rate during chemical mechanical polishing, J ELCHEM SO, 146(5), 1999, pp. 1952-1959
Process optimization and integration for silicon oxide intermetal dielectric planarized by chemical mechanical polish
Authors: Lin, CF Tseng, WT Feng, MS
Citation: Cf. Lin et al., Process optimization and integration for silicon oxide intermetal dielectric planarized by chemical mechanical polish, J ELCHEM SO, 146(5), 1999, pp. 1984-1990
Optimization of multilayer thin film passivation processes for improving cache memory device performance
Authors: Lin, CF Tseng, WT Feng, MS
Citation: Cf. Lin et al., Optimization of multilayer thin film passivation processes for improving cache memory device performance, J ELCHEM SO, 146(4), 1999, pp. 1510-1516
Effects of film stress on the chemical mechanical polishing process
Authors: Tseng, WT Wang, YH Chin, JH
Citation: Wt. Tseng et al., Effects of film stress on the chemical mechanical polishing process, J ELCHEM SO, 146(11), 1999, pp. 4273-4280
Process optimization of plasma-enhanced chemical vapor deposited passivation thin films for improving nonvolatile memory IC performance
Authors: Lin, CF Tseng, WT Feng, MS
Citation: Cf. Lin et al., Process optimization of plasma-enhanced chemical vapor deposited passivation thin films for improving nonvolatile memory IC performance, JPN J A P 1, 37(12A), 1998, pp. 6364-6368
Synthesis and biological activities of aryl propargyl sulfone
Authors: Wu, MJ Lin, CF Chang, LJ Jing, PT Duh, TH Tseng, WT Lee, FC Wang, SS Chang, HO
Citation: Mj. Wu et al., Synthesis and biological activities of aryl propargyl sulfone, J CHIN CHEM, 45(6), 1998, pp. 783-788
Risultati: 1-13 |