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Results: 1-10 |
Results: 10
TEMPERATURE-INDUCED DIFFUSION IN MO SI MULTILAYER MIRRORS/
Authors: VOORMA HJ LOUIS E KOSTER NB BIJKERK F
Citation: Hj. Voorma et al., TEMPERATURE-INDUCED DIFFUSION IN MO SI MULTILAYER MIRRORS/, Journal of applied physics, 83(9), 1998, pp. 4700-4708
FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/
Authors: VOORMA HJ LOUIS E KOSTER NB BIJKERK F ZIJLSTRA T DEGROOT LEM ROUSSEEUW BAC ROMIJN J VANDERDRIFT EWJM FRIEDRICH J
Citation: Hj. Voorma et al., FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 293-298
ANGULAR AND ENERGY-DEPENDENCE OF ION-BOMBARDMENT OF MO SI MULTILAYERS/
Authors: VOORMA HJ LOUIS E BIJKERK F ABDALI S
Citation: Hj. Voorma et al., ANGULAR AND ENERGY-DEPENDENCE OF ION-BOMBARDMENT OF MO SI MULTILAYERS/, Journal of applied physics, 82(4), 1997, pp. 1876-1881
CHARACTERIZATION OF MULTILAYERS BY FOURIER-ANALYSIS OF X-RAY REFLECTIVITY
Authors: VOORMA HJ LOUIS E KOSTER NB BIJKERK F SPILLER E
Citation: Hj. Voorma et al., CHARACTERIZATION OF MULTILAYERS BY FOURIER-ANALYSIS OF X-RAY REFLECTIVITY, Journal of applied physics, 81(9), 1997, pp. 6112-6119
EXAFS MEASUREMENTS ON THE STRUCTURE OF MO SI MULTILAYERS PRODUCED USING ION-BOMBARDMENT AND INCREASED DEPOSITION TEMPERATURE/
Authors: VOORMA HJ VANDORSSEN GE LOUIS E KOSTER NB SMITH AD ROPER MD BIJKERK F
Citation: Hj. Voorma et al., EXAFS MEASUREMENTS ON THE STRUCTURE OF MO SI MULTILAYERS PRODUCED USING ION-BOMBARDMENT AND INCREASED DEPOSITION TEMPERATURE/, Applied surface science, 93(3), 1996, pp. 221-230
EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS
Authors: BIJKERK F SHMAENOK LA LOUIS E VOORMA HJ KOSTER NB BRUINEMAN C BASTIAENSEN RKFJ VANDERDRIFT EWJM ROMIJN J DEGROOT LEM ROUSSEEUW BAC ZIJLSTRA T PLATONOV YY SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
MULTILAYER COATED REFLECTIVE OPTICS FOR EXTREME UV LITHOGRAPHY
Authors: LOUIS E VOORMA HJ KOSTER NB BIJKERK F PLATONOV YY ZUEV SY ANDREEV SS SHAMOV EA SALASHCHENKO NN
Citation: E. Louis et al., MULTILAYER COATED REFLECTIVE OPTICS FOR EXTREME UV LITHOGRAPHY, Microelectronic engineering, 27(1-4), 1995, pp. 235-238
SOME APPLICATIONS OF NANOMETER-SCALE STRUCTURES FOR CURRENT AND FUTURE X-RAY SPACE RESEARCH
Authors: CHRISTENSEN FE ABDALI S FREDERIKSEN PK HORNSTRUP A RASMUSSEN I WESTERGAARD NJ SCHNOPPER HW LOUIS E VOORMA HJ KOSTER N WIEBICKE H HALM I GEPPERT U SILVER E LEGROS M BOROZDIN K JOENSEN KD GORENSTEIN P WOOD J GUTMAN G
Citation: Fe. Christensen et al., SOME APPLICATIONS OF NANOMETER-SCALE STRUCTURES FOR CURRENT AND FUTURE X-RAY SPACE RESEARCH, Journal de physique. III, 4(9), 1994, pp. 1599-1612
ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT
Authors: LOUIS E VOORMA HJ KOSTER NB SHMAENOK L BIJKERK F SCHLATMANN R VERHOEVEN J PLATONOV YY VANDORSSEN GE PADMORE HA
Citation: E. Louis et al., ENHANCEMENT OF REFLECTIVITY OF MULTILAYER MIRRORS FOR SOFT-X-RAY PROJECTION LITHOGRAPHY BY TEMPERATURE OPTIMIZATION AND ION-BOMBARDMENT, Microelectronic engineering, 23(1-4), 1994, pp. 215-218
SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES
Authors: LOUIS E BIJKERK F SHMAENOK L VOORMA HJ VANDERWIEL MJ SCHLATMANN R VERHOEVEN J VANDERDRIFT EWJM ROMIJN J ROUSSEEUW BAC VOSS F DESOR R NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
Risultati: 1-10 |