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Results: 1-25 | 26-28
Results: 1-25/28
INFLUENCE OF MISFIT DISLOCATION INTERACTIONS ON PHOTOLUMINESCENCE SPECTRA OF SIGE ON PATTERNED SI
Authors: WATSON GP BENTON JL XIE YH FITZGERALD EA
Citation: Gp. Watson et al., INFLUENCE OF MISFIT DISLOCATION INTERACTIONS ON PHOTOLUMINESCENCE SPECTRA OF SIGE ON PATTERNED SI, Journal of applied physics, 83(7), 1998, pp. 3773-3776
PHOTON TUNNELING MICROSCOPY OF LATENT RESIST IMAGES
Authors: LIDDLE JA FERNANDEZ AT CIRELLI R MKRTCHYAN MM NOVEMBRE AE PEABODY ML WATSON GP
Citation: Ja. Liddle et al., PHOTON TUNNELING MICROSCOPY OF LATENT RESIST IMAGES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2162-2166
DOSE MODIFICATION PROXIMITY EFFECT CORRECTION SCHEME WITH INHERENT FORWARD SCATTERING CORRECTIONS
Authors: WATSON GP FETTER LA LIDDLE JA
Citation: Gp. Watson et al., DOSE MODIFICATION PROXIMITY EFFECT CORRECTION SCHEME WITH INHERENT FORWARD SCATTERING CORRECTIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2309-2312
CHARACTERIZING PARTIAL COHERENCE UNIFORMITY IN A DEEP-ULTRAVIOLET STEP AND REPEAT TOOL
Authors: WATSON GP CIRELLI RA MKRTCHYAN M TRAVERS RJ
Citation: Gp. Watson et al., CHARACTERIZING PARTIAL COHERENCE UNIFORMITY IN A DEEP-ULTRAVIOLET STEP AND REPEAT TOOL, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2399-2403
TOWARDS 280 NM I-LINE RANDOM LOGIC LITHOGRAPHY WITH OFF-AXIS ILLUMINATION AND OPTICAL PROXIMITY CORRECTION
Authors: GRODNENSKY I WATSON GP GAROFALO J CASTRO D ZYCH L LEE W
Citation: I. Grodnensky et al., TOWARDS 280 NM I-LINE RANDOM LOGIC LITHOGRAPHY WITH OFF-AXIS ILLUMINATION AND OPTICAL PROXIMITY CORRECTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2422-2425
THE SCALPEL PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DEMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DIMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
MEASUREMENT OF THE BACKSCATTER COEFFICIENT USING RESIST RESPONSE CURVES FOR 20-100 KEV ELECTRON-BEAM LITHOGRAPHY ON SI
Authors: WATSON GP FU D BERGER SD TENNANT D FETTER L NOVEMBRE A BIDDICK C
Citation: Gp. Watson et al., MEASUREMENT OF THE BACKSCATTER COEFFICIENT USING RESIST RESPONSE CURVES FOR 20-100 KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4277-4282
MEASUREMENT OF THE MEAN FREE-PATH OF DISLOCATION GLIDE IN THE INGAAS GAAS MATERIALS SYSTEM/
Authors: MATRAGRANO MJ AST DG WATSON GP SHEALY JR
Citation: Mj. Matragrano et al., MEASUREMENT OF THE MEAN FREE-PATH OF DISLOCATION GLIDE IN THE INGAAS GAAS MATERIALS SYSTEM/, Journal of applied physics, 79(2), 1996, pp. 776-780
THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM
Authors: LIDDLE JA BERGER SD BIDDICK CJ BLAKEY MI BOLAN KJ BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J FARROW RC FELKER JA FETTER LA FREEMAN B HARRIOTT LR HOPKINS L HUGGINS HA KNUREK CS KRAUS JS MIXON DA MKRTCHYAN MM NOVEMBRE AE PEABODY ML SIMPSON WM TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WILLIAMS JK WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
PROXIMITY EFFECT CORRECTION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY)
Authors: LIDDLE JA WATSON GP BERGER SD MILLER PD
Citation: Ja. Liddle et al., PROXIMITY EFFECT CORRECTION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY), JPN J A P 1, 34(12B), 1995, pp. 6672-6678
SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS
Authors: HARRIOTT LR BERGER SD LIDDLE JA WATSON GP MKRTCHYAN MM
Citation: Lr. Harriott et al., SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2404-2408
ERROR BUDGET ANALYSIS OF THE SCALPEL(R) MASK FOR SUB-0.2 MU-M LITHOGRAPHY
Authors: LIDDLE JA HUGGINS HA WATSON GP
Citation: Ja. Liddle et al., ERROR BUDGET ANALYSIS OF THE SCALPEL(R) MASK FOR SUB-0.2 MU-M LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2483-2487
A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE
Authors: WATSON GP BERGER SD LIDDLE JA WASKIEWICZ WK
Citation: Gp. Watson et al., A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2504-2507
PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI
Authors: WATSON GP BERGER SD LIDDLE JA FETTER LA FARROW RC TARASCON RG MKRTCHYAN M NOVEMBRE AE BLAKEY MI BOLAN KJ POLI L
Citation: Gp. Watson et al., PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2535-2538
DETERMINATION OF THREADING DISLOCATION DENSITY IN HETEROEPITAXIAL LAYERS BY DIFFUSE-X-RAY SCATTERING
Authors: KOPPENSTEINER E SCHUH A BAUER G HOLY V WATSON GP FITZGERALD EA
Citation: E. Koppensteiner et al., DETERMINATION OF THREADING DISLOCATION DENSITY IN HETEROEPITAXIAL LAYERS BY DIFFUSE-X-RAY SCATTERING, Journal of physics. D, Applied physics, 28(4A), 1995, pp. 114-119
ELECTRON TRAPPING KINETICS AT DISLOCATIONS IN RELAXED GE0.3SI0.7 SI HETEROSTRUCTURES/
Authors: GRILLOT PN RINGEL SA FITZGERALD EA WATSON GP XIE YH
Citation: Pn. Grillot et al., ELECTRON TRAPPING KINETICS AT DISLOCATIONS IN RELAXED GE0.3SI0.7 SI HETEROSTRUCTURES/, Journal of applied physics, 77(7), 1995, pp. 3248-3256
MINORITY- AND MAJORITY-CARRIER TRAPPING IN STRAIN-RELAXED GE0.3SI0.7 SI HETEROSTRUCTURE DIODES GROWN BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION/
Authors: GRILLOT PN RINGEL SA FITZGERALD EA WATSON GP XIE YH
Citation: Pn. Grillot et al., MINORITY- AND MAJORITY-CARRIER TRAPPING IN STRAIN-RELAXED GE0.3SI0.7 SI HETEROSTRUCTURE DIODES GROWN BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION/, Journal of applied physics, 77(2), 1995, pp. 676-685
FROM RELAXED GESI BUFFERS TO FIELD-EFFECT TRANSISTORS - CURRENT STATUS AND FUTURE-PROSPECTS
Authors: XIE YH FITZGERALD EA MONROE D WATSON GP SILVERMAN PJ
Citation: Yh. Xie et al., FROM RELAXED GESI BUFFERS TO FIELD-EFFECT TRANSISTORS - CURRENT STATUS AND FUTURE-PROSPECTS, JPN J A P 1, 33(4B), 1994, pp. 2372-2377
LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV
Authors: TARASCON RG BOLAN K BLAKEY M CAMARDA RM FARROW RC FETTER LA HUGGINS HA KRAUS JS LIDDLE JA MIXON DA NOVEMBRE AE WATSON GP BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448
ABSORPTION AND LUMINESCENCE STUDIES OF FREESTANDING POROUS SILICON FILMS (VOL 49, PG 5386, 1994)
Authors: XIE YH HYBERTSEN MS WILSON WL IPRI SA CARVER GE BROWN WL DONS E WEIR BE KORTAN AR WATSON GP LIDDLE AJ
Citation: Yh. Xie et al., ABSORPTION AND LUMINESCENCE STUDIES OF FREESTANDING POROUS SILICON FILMS (VOL 49, PG 5386, 1994), Physical review. B, Condensed matter, 50(11), 1994, pp. 8138-8138
ABSORPTION AND LUMINESCENCE STUDIES OF FREESTANDING POROUS SILICON FILMS
Authors: XIE YH HYBERTSEN MS WILSON WL IPRI SA CARVER GE BROWN WL DONS E WEIR BE KORTAN AR WATSON GP LIDDLE AJ
Citation: Yh. Xie et al., ABSORPTION AND LUMINESCENCE STUDIES OF FREESTANDING POROUS SILICON FILMS, Physical review. B, Condensed matter, 49(8), 1994, pp. 5386-5397
RELAXED, LAW THREADING DEFECT DENSITY SI0.7GE0.3 EPITAXIAL LAYERS GROWN ON SI BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION
Authors: WATSON GP FITZGERALD EA XIE YH MONROE D
Citation: Gp. Watson et al., RELAXED, LAW THREADING DEFECT DENSITY SI0.7GE0.3 EPITAXIAL LAYERS GROWN ON SI BY RAPID THERMAL CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 75(1), 1994, pp. 263-269
COMPARISON OF MOBILITY-LIMITING MECHANISMS IN HIGH-MOBILITY SI1-XGEX HETEROSTRUCTURES
Authors: MONROE D XIE YH FITZGERALD EA SILVERMAN PJ WATSON GP
Citation: D. Monroe et al., COMPARISON OF MOBILITY-LIMITING MECHANISMS IN HIGH-MOBILITY SI1-XGEX HETEROSTRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(4), 1993, pp. 1731-1737
THE BARRIER TO MISFIT DISLOCATION GLIDE IN CONTINUOUS, STRAINED, EPITAXIAL LAYERS ON PATTERNED SUBSTRATES
Authors: WATSON GP AST DG ANDERSON TJ PATHANGEY B
Citation: Gp. Watson et al., THE BARRIER TO MISFIT DISLOCATION GLIDE IN CONTINUOUS, STRAINED, EPITAXIAL LAYERS ON PATTERNED SUBSTRATES, Journal of applied physics, 74(5), 1993, pp. 3103-3110
Risultati: 1-25 | 26-28