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Results:
1-15
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Results: 15
Authors:
FOSTER JE
WANG W
WENDT AE
BOOSKE J
Citation: Je. Foster et al., ANTENNA SPUTTERING IN AN INTERNAL INDUCTIVELY-COUPLED PLASMA FOR IONIZED PHYSICAL VAPOR-DEPOSITION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 532-535
Authors:
FOSTER JE
WENDT AE
WANG WW
BOOSKE JH
Citation: Je. Foster et al., DETERMINATION OF METAL VAPOR ION CONCENTRATION IN AN ARGON COPPER PLASMA FOR IONIZED PHYSICAL VAPOR-DEPOSITION/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(4), 1998, pp. 2198-2203
Authors:
WANG W
FOSTER J
WENDT AE
BOOSKE JH
ONUOHA T
SANDSTROM PW
LIU H
GEARHART SS
HERSHKOWITZ N
Citation: W. Wang et al., MAGNETIC-FIELD-ENHANCED RF ARGON PLASMA FOR IONIZED SPUTTERING OF COPPER, Applied physics letters, 71(12), 1997, pp. 1622-1624
Authors:
KIRMSE KHR
WENDT AE
DISCH SB
WU JZ
ABRAHAM IC
MEYER JA
BREUN RA
WOODS RC
Citation: Khr. Kirmse et al., SIO2 TO SI SELECTIVITY MECHANISMS IN HIGH-DENSITY FLUOROCARBON PLASMA-ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 710-715
Authors:
STITTSWORTH JA
WENDT AE
Citation: Ja. Stittsworth et Ae. Wendt, REACTOR GEOMETRY AND PLASMA UNIFORMITY IN A PLANAR INDUCTIVELY-COUPLED RADIO-FREQUENCY ARGON DISCHARGE, Plasma sources science & technology, 5(3), 1996, pp. 429-435
Authors:
STITTSWORTH JA
WENDT AE
Citation: Ja. Stittsworth et Ae. Wendt, STRIATIONS IN A RADIO-FREQUENCY PLANAR INDUCTIVELY-COUPLED PLASMA, IEEE transactions on plasma science, 24(1), 1996, pp. 125-126
Authors:
WENDT AE
MAHONEY LJ
Citation: Ae. Wendt et Lj. Mahoney, RADIO-FREQUENCY INDUCTIVE DISCHARGE SOURCE DESIGN FOR LARGE-AREA PROCESSING, Pure and applied chemistry, 68(5), 1996, pp. 1055-1058
Authors:
MEYER JA
MAU R
WENDT AE
Citation: Ja. Meyer et al., PLASMA PROPERTIES DETERMINED WITH INDUCTION LOOP PROBES IN A PLANAR INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of applied physics, 79(3), 1996, pp. 1298-1302
Authors:
MEYER JA
WENDT AE
Citation: Ja. Meyer et Ae. Wendt, MEASUREMENTS OF ELECTROMAGNETIC-FIELDS IN A PLANAR RADIOFREQUENCY INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of applied physics, 78(1), 1995, pp. 90-96
Authors:
CIELASZYK ES
KIRMSE KHR
STEWART RA
WENDT AE
Citation: Es. Cielaszyk et al., MECHANISMS FOR POLYCRYSTALLINE SILICON DEFECT PASSIVATION BY HYDROGENATION IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA, Applied physics letters, 67(21), 1995, pp. 3099-3101
Authors:
BEALE DF
WENDT AE
MAHONEY LJ
Citation: Df. Beale et al., SPATIALLY-RESOLVED OPTICAL-EMISSION FOR CHARACTERIZATION OF A PLANAR RADIO-FREQUENCY INDUCTIVELY-COUPLED DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(5), 1994, pp. 2775-2779
Authors:
KIRMSE KHR
WENDT AE
OEHRLEIN GS
ZHANG Y
Citation: Khr. Kirmse et al., FLUOROCARBON HIGH-DENSITY PLASMAS .8. STUDY OF THE ION FLUX COMPOSITION AT THE SUBSTRATE IN ELECTRON-CYCLOTRON-RESONANCE ETCHING PROCESSES USING FLUOROCARBON GASES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(4), 1994, pp. 1287-1292
Authors:
MAHONEY LJ
WENDT AE
BARRIOS E
RICHARDS CJ
SHOHET JL
Citation: Lj. Mahoney et al., ELECTRON-DENSITY AND ENERGY-DISTRIBUTIONS IN A PLANAR INDUCTIVELY-COUPLED DISCHARGE, Journal of applied physics, 76(4), 1994, pp. 2041-2047
Authors:
KOLOBOV VI
BEALE DF
MAHONEY LJ
WENDT AE
Citation: Vi. Kolobov et al., NONLOCAL ELECTRON KINETICS IN A LOW-PRESSURE INDUCTIVELY-COUPLED RADIOFREQUENCY DISCHARGE, Applied physics letters, 65(5), 1994, pp. 537-539
Authors:
MEYER JA
KIRMSE KHR
JENG JS
PEREZMONTERO SY
MAYNARD HL
WENDT AE
TAYLOR JW
HERSHKOWITZ N
Citation: Ja. Meyer et al., EXPERIMENTS WITH BACK SIDE GAS-COOLING USING AN ELECTROSTATIC WAFER HOLDER IN AN ELECTRON-CYCLOTRON-RESONANCE ETCHING TOOL, Applied physics letters, 64(15), 1994, pp. 1926-1928
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1-15
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