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Results:
1-7
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Results: 7
Authors:
NAIK MB
LAKSHMANAN SK
WENTORF RH
REEVES RR
GILL WN
Citation: Mb. Naik et al., THERMAL CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM HEXAFLUOROACETYLACETONATE CU(I) VINYLTRIMETHYLSILANE - KINETIC-STUDIES, Journal of crystal growth, 193(1-2), 1998, pp. 133-147
Authors:
NAIK MB
GILL WN
WENTORF RH
REEVES RR
Citation: Mb. Naik et al., CVD OF COPPER USING COPPER(I) AND COPPER(II) BETA-DIKETONATES, Thin solid films, 262(1-2), 1995, pp. 60-66
Authors:
KIM DH
WENTORF RH
GILL WN
Citation: Dh. Kim et al., SELECTIVE DEPOSITION OF COPPER BY CHEMICAL-VAPOR-DEPOSITION USING CU(HFA)(2), Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(1), 1994, pp. 153-157
Authors:
BOVENKERK HP
BUNDY FP
CHRENKO RM
CODELLA PJ
STRONG HM
WENTORF RH
Citation: Hp. Bovenkerk et al., ERRORS IN DIAMOND SYNTHESIS, Nature, 365(6441), 1993, pp. 19-19
Authors:
KIM DH
WENTORF RH
GILL WN
Citation: Dh. Kim et al., NUCLEATION OF COPPER ON TIW AND TIN DURING CHEMICAL-VAPOR-DEPOSITION, Journal of applied physics, 74(8), 1993, pp. 5164-5166
Authors:
KIM DH
WENTORF RH
GILL WN
Citation: Dh. Kim et al., FILM GROWTH-KINETICS OF CHEMICAL-VAPOR-DEPOSITION OF COPPER FROM CU(HFA)2, Journal of the Electrochemical Society, 140(11), 1993, pp. 3267-3272
Authors:
KIM DH
WENTORF RH
GILL WN
Citation: Dh. Kim et al., LOW-PRESSURE CHEMICALLY VAPOR-DEPOSITED COPPER-FILMS FOR ADVANCED DEVICE METALLIZATION, Journal of the Electrochemical Society, 140(11), 1993, pp. 3273-3279
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1-7
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