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Results: 1-10 |
Results: 10
Writing an arbitrary non-periodic pattern using interference lithography
Authors: Pau, S Watson, GP Nalamasu, O
Citation: S. Pau et al., Writing an arbitrary non-periodic pattern using interference lithography, J MOD OPT, 48(7), 2001, pp. 1211-1223
Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates
Authors: Watson, GP Kizilyalli, IC Nalamasu, O Cirelli, RA Miller, M Wang, Y Pati, B Radosevich, J Kohler, R Freyman, R Klemens, F Mansfield, W Vaidya, H Timko, A Trimble, L Frackoviak, J
Citation: Gp. Watson et al., Implementing advanced lithography technology: A 100 MHz, 1 V digital signal processor fabricated with phase shifted gates, J VAC SCI B, 18(6), 2000, pp. 2877-2880
Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography
Authors: Cirelli, RA Bude, J Houlihan, F Gabor, A Watson, GP Weber, GR Klemens, FP Sweeney, J Mansfield, WM Nalamasu, O
Citation: Ra. Cirelli et al., Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography, MICROEL ENG, 53(1-4), 2000, pp. 87-90
A 2 million transistor digital signal processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology
Authors: Watson, GP Kizilyalli, IC Miller, M Wang, YT Pati, B Cirelli, RA Nalamasu, O Radosevich, J Kohler, R Freyman, R Baumann, F Klemens, F Mansfield, W Vaidya, H Frackoviak, J Timko, A Barr, DL Bolan, K
Citation: Gp. Watson et al., A 2 million transistor digital signal processor with 120 nm gates fabricated by 248 nm wavelength phase shift technology, MICROEL ENG, 53(1-4), 2000, pp. 101-104
Sub-wavelength printing using multiple overlapping masks
Authors: Pau, S Nalamasu, O Cirelli, R Frackoviak, J Timko, A Watson, GP Klemens, F Timp, G
Citation: S. Pau et al., Sub-wavelength printing using multiple overlapping masks, MICROEL ENG, 53(1-4), 2000, pp. 119-122
Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists
Authors: Pau, S Trimble, LE Blatchford, JW Watson, GP Frackoviak, J Cirelli, R Nalamasu, O
Citation: S. Pau et al., Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists, J VAC SCI B, 17(6), 1999, pp. 2499-2506
Single-layer resist design for 193nm lithography
Authors: Nalamasu, O Houlihan, FM Cirelli, RA Watson, GP Reichmanis, E
Citation: O. Nalamasu et al., Single-layer resist design for 193nm lithography, SOL ST TECH, 42(5), 1999, pp. 29
Characterizing GHOST proximity effect correction effectiveness by determining the worst-case error
Authors: Watson, GP Berger, SD Liddle, JA
Citation: Gp. Watson et al., Characterizing GHOST proximity effect correction effectiveness by determining the worst-case error, J VAC SCI B, 16(6), 1998, pp. 3256-3261
Electron scattering and transmission through SCALPEL masks
Authors: Mkrtchyan, MM Liddle, JA Novembre, AE Waskiewicz, WK Watson, GP Harriott, LR Muller, DA
Citation: Mm. Mkrtchyan et al., Electron scattering and transmission through SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3385-3391
193 nm single layer resist strategies, concepts, and recent results
Authors: Nalamasu, O Houlihan, FM Cirelli, RA Timko, AG Watson, GP Hutton, RS Kometani, JM Reichmanis, E Gabor, A Medina, A Slater, S
Citation: O. Nalamasu et al., 193 nm single layer resist strategies, concepts, and recent results, J VAC SCI B, 16(6), 1998, pp. 3716-3721
Risultati: 1-10 |