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Results:
1-19
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Results: 19
Authors:
Yacoot, A
Kuetgens, U
Koenders, L
Weimann, T
Citation: A. Yacoot et al., A combined scanning tunnelling microscope and x-ray interferometer, MEAS SCI T, 12(10), 2001, pp. 1660-1665
Authors:
Golzhauser, A
Eck, W
Geyer, W
Stadler, V
Weimann, T
Hinze, P
Grunze, M
Citation: A. Golzhauser et al., Chemical nanolithography with electron beams, ADVAN MATER, 13(11), 2001, pp. 806
Authors:
Weimann, T
Geyer, W
Hinze, P
Stadler, V
Eck, W
Golzhauser, A
Citation: T. Weimann et al., Nanoscale patterning of self-assembled monolayers by e-beam lithography, MICROEL ENG, 57-8, 2001, pp. 903-907
Authors:
Weimann, T
Scherer, H
Krupenin, VA
Muller, F
Niemeyer, E
Citation: T. Weimann et al., Four-angle evaporation method for the preparation of single electron tunneling devices, MICROEL ENG, 57-8, 2001, pp. 915-918
Authors:
Scherer, H
Weimann, T
Zorin, AB
Niemeyer, J
Citation: H. Scherer et al., The effect of thermal annealing on the properties of Al-AlOx-Al single electron tunneling transistors, J APPL PHYS, 90(5), 2001, pp. 2528-2532
Authors:
Golzhauser, A
Geyer, W
Stadler, V
Eck, W
Grunze, M
Edinger, K
Weimann, T
Hinze, P
Citation: A. Golzhauser et al., Nanoscale patterning of self-assembled monolayers with electrons, J VAC SCI B, 18(6), 2000, pp. 3414-3418
Authors:
Popel, R
Hagedorn, D
Weimann, T
Buchholz, FI
Niemeyer, J
Citation: R. Popel et al., Superconductor-normal metal-superconductor process development for the fabrication of small Josephson junctions in ramp type configuration, SUPERCOND S, 13(2), 2000, pp. 148-153
Authors:
Scherer, H
Weimann, T
Hinze, P
Samwer, PW
Zorin, AB
Niemeyer, J
Citation: H. Scherer et al., All-chromium single-electron tunneling devices fabricated by direct-writing multilayer technique, PHYSICA B, 284, 2000, pp. 1806-1807
Authors:
Weimann, T
Scherer, H
Hinze, P
Niemeyer, J
Citation: T. Weimann et al., Fabrication of metallic multilayer single electron tunneling devices usinglow-energy e-beam lithography, MICROEL ENG, 53(1-4), 2000, pp. 225-228
Authors:
Pavolotsky, AB
Weimann, T
Scherer, H
Krupenin, VA
Niemeyer, J
Zorin, AB
Citation: Ab. Pavolotsky et al., Multilayer technique for fabricating Nb junction circuits exhibiting charging effects, J VAC SCI B, 17(1), 1999, pp. 230-232
Authors:
Pavolotsky, AB
Weimann, T
Scherer, H
Niemeyer, J
Zorin, AB
Krupenin, VA
Citation: Ab. Pavolotsky et al., Novel method for fabricating deep submicron Nb/AlOx/Nb tunnel junctions based on spin-on glass planarization, IEEE APPL S, 9(2), 1999, pp. 3251-3254
Authors:
Dolata, R
Weimann, T
Scherer, HJ
Niemeyer, J
Citation: R. Dolata et al., Sub mu m Nb/AlOx/Nb Josephson junctions fabricated by anodization techniques, IEEE APPL S, 9(2), 1999, pp. 3255-3258
Authors:
Lotkhov, SV
Zangerle, H
Zorin, AB
Weimann, T
Scherer, H
Niemeyer, J
Citation: Sv. Lotkhov et al., Superconducting electrometer based on the resistively shunted Bloch transistor, IEEE APPL S, 9(2), 1999, pp. 3664-3667
Authors:
Zorin, AB
Lotkhov, SV
Pashkin, YA
Zangerle, H
Krupenin, VA
Weimann, T
Scherer, H
Niemeyer, J
Citation: Ab. Zorin et al., Highly sensitive electrometers based on single Cooper pair tunneling, J SUPERCOND, 12(6), 1999, pp. 747-755
Authors:
Philipp, G
Weimann, T
Hinze, P
Burghard, M
Weis, J
Citation: G. Philipp et al., Shadow evaporation method for fabrication of sub 10 nm gaps between metal electrodes, MICROEL ENG, 46(1-4), 1999, pp. 157-160
Authors:
Weimann, T
Hinze, P
Scherer, H
Niemeyer, J
Citation: T. Weimann et al., Fabrication of a metallic single electron tunneling transistor by multilayer technique using lithography with a scanning transmission electron microscope, MICROEL ENG, 46(1-4), 1999, pp. 165-168
Authors:
Krupenin, VA
Lotkhov, SV
Scherer, H
Weimann, T
Zorin, AB
Ahlers, FJ
Niemeyer, J
Wolf, H
Citation: Va. Krupenin et al., Charging and heating effects in a system of coupled single-electron tunneling devices, PHYS REV B, 59(16), 1999, pp. 10778-10784
Authors:
Scherer, H
Weimann, T
Hinze, P
Samwer, BW
Zorin, AB
Niemeyer, J
Citation: H. Scherer et al., Characterization of all-chromium tunnel junctions and single-electron tunneling devices fabricated by direct-writing multilayer technique, J APPL PHYS, 86(12), 1999, pp. 6956-6964
Authors:
Keck, M
Doderer, T
Huebener, RP
Traeuble, T
Dolata, R
Weimann, T
Niemeyer, J
Citation: M. Keck et al., Spatially resolved detection of phase locking in Josephson junction arrays, APPL SUPERC, 6(7-9), 1998, pp. 297-301
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