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Results:
1-11
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Results: 11
Authors:
HORIKAWA T
TANIMURA J
KAWAHARA T
YAMAMUKA M
TARUTANI M
ONO K
Citation: T. Horikawa et al., EFFECTS OF POSTANNEALING ON DIELECTRIC-PROPERTIES OF (BA, SR)TIO3 THIN-FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION, IEICE transactions on electronics, E81C(4), 1998, pp. 497-504
Authors:
HORIKAWA T
YUUKI A
SHIBANO T
KAWAHARA T
MAKITA T
KUROIWA T
YAMAMUKA M
OOMORI T
MIKAMI N
ONO K
Citation: T. Horikawa et al., NOVEL STACKED CAPACITOR TECHNOLOGY FOR 1-GBIT DRAMS WITH (BA,SR)TIO3 THIN-FILMS, Electronics & communications in Japan. Part 2, Electronics, 80(5), 1997, pp. 70-78
Authors:
KAWAHARA T
YAMAMUKA M
TANIMURA J
TARUTANI M
KUROIWA T
HORIKAWA T
ONO K
Citation: T. Kawahara et al., INFLUENCE OF BUFFER LAYERS AND BARRIER METALS ON PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 36(9B), 1997, pp. 5874-5878
A MASS-SPECTROMETRIC STUDY OF REACTION-MECHANISMS IN CHEMICAL-VAPOR-DEPOSITION OF (BA, SR)TIO3 FILMS
Authors:
YAMAMUKA M
KAWAHARA T
HORIKAWA T
ONO K
Citation: M. Yamamuka et al., A MASS-SPECTROMETRIC STUDY OF REACTION-MECHANISMS IN CHEMICAL-VAPOR-DEPOSITION OF (BA, SR)TIO3 FILMS, JPN J A P 1, 36(4B), 1997, pp. 2555-2560
Authors:
KAWAHARA T
YAMAMUKA M
YUUKI A
ONO K
Citation: T. Kawahara et al., (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION ON RU ELECTRODES, JPN J A P 1, 35(9B), 1996, pp. 4880-4885
Authors:
YAMAMUKA M
KAWAHARA T
MAKITA T
YUUKI A
ONO K
Citation: M. Yamamuka et al., THERMAL-DESORPTION SPECTROSCOPY OF (BA, SR)TIO3 THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 35(2A), 1996, pp. 729-735
Authors:
MIKAMI N
KAWAHARA T
HORIKAWA T
YAMAMUKA M
MAKITA T
KUROIWA T
YUUKI A
SHIBANO T
OOMORI T
ONO K
SATOH S
ABE H
Citation: N. Mikami et al., (BA,SR)TIO3 CAPACITOR TECHNOLOGY FOR GBIT-SCALE DRAMS, Journal of the Korean Physical Society, 29, 1996, pp. 598-602
Authors:
KAWAHARA T
YAMAMUKA M
YUUKI A
ONO K
Citation: T. Kawahara et al., SURFACE MORPHOLOGIES AND ELECTRICAL-PROPERTIES OF (BA,SR)TIO3 FILMS PREPARED BY 2-STEP DEPOSITION OF LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 34(9B), 1995, pp. 5077-5082
Authors:
KAWAHARA T
YAMAMUKA M
MAKITA T
NAKA J
YUUKI A
MIKAMI N
ONO K
Citation: T. Kawahara et al., STEP COVERAGE AND ELECTRICAL-PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION USING TIO(DPM)(2), JPN J A P 1, 33(9B), 1994, pp. 5129-5134
Authors:
KAWAHARA T
YAMAMUKA M
MAKITA T
TSUTAHARA K
YUUKI A
ONO K
MATSUI Y
Citation: T. Kawahara et al., PREPARATION OF (BA, SR)TIO3 THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION USING LIQUID SOURCES, JPN J A P 1, 33(10), 1994, pp. 5897-5902
Authors:
SHIRAFUJI T
CHEN WM
YAMAMUKA M
TACHIBANA K
Citation: T. Shirafuji et al., MONTE-CARLO SIMULATION OF SURFACE-REACTIONS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON THIN-FILMS, JPN J A P 1, 32(11A), 1993, pp. 4946-4947
Risultati:
1-11
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