Authors: Lee, Y Barletta, WA Leung, KN Ngo, VV Scott, P Wilcox, M Zahir, N

Citation: Y. Lee et al., Multi-aperture extraction system with micro-beamlet switching capability, NUCL INST A, 474(1), 2001, pp. 86-92

Authors: Lee, Y Ji, Q Leung, KN Zahir, N

Citation: Y. Lee et al., Nanobeam production with the multicusp ion source, REV SCI INS, 71(2), 2000, pp. 722-724

Authors: Ngo, VV Barletta, W Gough, R Lee, Y Leung, KN Zahir, N Patterson, D

Citation: Vv. Ngo et al., Maskless micro-ion-beam reduction lithography, J VAC SCI B, 17(6), 1999, pp. 2783-2790

Authors: Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N

Citation: Y. Lee et al., Co-axial multicusp source for low axial energy spread ion beam production, NUCL INST A, 433(3), 1999, pp. 579-586

Authors: Lee, Y Gough, RA King, TJ Ji, Q Leung, KN McGill, RA Ngo, VV Williams, MD Zahir, N

Citation: Y. Lee et al., Maskless ion beam lithography system, MICROEL ENG, 46(1-4), 1999, pp. 469-472

Authors: Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N Fallman, W Tockler, M Bruenger, W

Citation: Y. Lee et al., Plasma source for ion and electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3367-3369