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Results:
1-6
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Results: 6
Multi-aperture extraction system with micro-beamlet switching capability
Authors:
Lee, Y Barletta, WA Leung, KN Ngo, VV Scott, P Wilcox, M Zahir, N
Citation:
Y. Lee et al., Multi-aperture extraction system with micro-beamlet switching capability, NUCL INST A, 474(1), 2001, pp. 86-92
Nanobeam production with the multicusp ion source
Authors:
Lee, Y Ji, Q Leung, KN Zahir, N
Citation:
Y. Lee et al., Nanobeam production with the multicusp ion source, REV SCI INS, 71(2), 2000, pp. 722-724
Maskless micro-ion-beam reduction lithography
Authors:
Ngo, VV Barletta, W Gough, R Lee, Y Leung, KN Zahir, N Patterson, D
Citation:
Vv. Ngo et al., Maskless micro-ion-beam reduction lithography, J VAC SCI B, 17(6), 1999, pp. 2783-2790
Co-axial multicusp source for low axial energy spread ion beam production
Authors:
Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N
Citation:
Y. Lee et al., Co-axial multicusp source for low axial energy spread ion beam production, NUCL INST A, 433(3), 1999, pp. 579-586
Maskless ion beam lithography system
Authors:
Lee, Y Gough, RA King, TJ Ji, Q Leung, KN McGill, RA Ngo, VV Williams, MD Zahir, N
Citation:
Y. Lee et al., Maskless ion beam lithography system, MICROEL ENG, 46(1-4), 1999, pp. 469-472
Plasma source for ion and electron beam lithography
Authors:
Lee, Y Gough, RA Leung, KN Vujic, J Williams, MD Zahir, N Fallman, W Tockler, M Bruenger, W
Citation:
Y. Lee et al., Plasma source for ion and electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3367-3369
Risultati:
1-6
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