Citation: Ch. Kim et al., A simple low-temperature laser-doping employing phosphosilicate glass and borosilicate glass films for the source and drain formation in poly-Si thinfilm transistors, THIN SOL FI, 397(1-2), 2001, pp. 4-7
Authors:
Teodorescu, VS
Nistor, LC
Popescu, M
Mihailescu, IN
Gyorgy, E
Van Landuyt, J
Perrone, A
Citation: Vs. Teodorescu et al., Transmission electron microscopy study of silicon nitride amorphous films obtained by reactive pulsed laser deposition, THIN SOL FI, 397(1-2), 2001, pp. 12-16
Citation: Da. Tonova et Aa. Konova, Characterization of inhomogeneous dielectric coatings with arbitrary refractive index profiles by multiple angle of incidence ellipsometry, THIN SOL FI, 397(1-2), 2001, pp. 17-23
Citation: Y. Choi et al., Microstructural observation and wear properties of thin chrome layers prepared by pulse plating, THIN SOL FI, 397(1-2), 2001, pp. 24-29
Citation: T. Chraska et Ah. King, Transmission electron microscopy study of rapid solidification of plasma sprayed zirconia - part I. First splat solidification, THIN SOL FI, 397(1-2), 2001, pp. 30-39
Citation: T. Chraska et Ah. King, Transmission electron microscopy study of rapid solidification of plasma sprayed zirconia - part II. Interfaces and subsequent splat solidification, THIN SOL FI, 397(1-2), 2001, pp. 40-48
Citation: Sk. Park et al., Deposition of indium-tin-oxide films on polymer substrates for applicationin plastic-based flat panel displays, THIN SOL FI, 397(1-2), 2001, pp. 49-55
Authors:
Karuppuchamy, S
Yoshida, T
Sugiura, T
Minoura, H
Citation: S. Karuppuchamy et al., Self-assembly of ZnO/riboflavin 5 '-phosphate thin films by one-step electrodeposition and its characterization, THIN SOL FI, 397(1-2), 2001, pp. 63-69
Citation: Kk. Choi et Sw. Rhee, Chemical vapor deposition of copper film from hexafluoroacetylacetonateCu((I))vinylcyclohexane, THIN SOL FI, 397(1-2), 2001, pp. 70-77
Authors:
Miller, KA
John, C
Zhang, KZ
Nicholson, KT
McFeely, FR
Holl, MMB
Citation: Ka. Miller et al., Self-limiting chemical vapor deposition of an ultra-thin silicon oxide film using tri-(tert-butoxy)silanol, THIN SOL FI, 397(1-2), 2001, pp. 78-82
Citation: Cy. Wang et al., Elimination Of O-2 plasma damage of low-k methyl silsesquioxane film by Asimplantation, THIN SOL FI, 397(1-2), 2001, pp. 90-94
Citation: H. Zhu et al., Fourier transform infrared spectroscopy and oxygen luminescence probing combined study of modified sol-gel derived film, THIN SOL FI, 397(1-2), 2001, pp. 95-101
Authors:
Oberg, K
Persson, P
Shchukarev, A
Eliasson, B
Citation: K. Oberg et al., Comparison of monolayer films of stearic acid and methyl stearate on an Al2O3 surface, THIN SOL FI, 397(1-2), 2001, pp. 102-108
Authors:
Sun, YM
Lee, SY
Lemonds, AM
Engbrecht, ER
Veldman, S
Lozano, J
White, JM
Ekerdt, JG
Emesh, I
Pfeifer, K
Citation: Ym. Sun et al., Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers, THIN SOL FI, 397(1-2), 2001, pp. 109-115
Authors:
Giovanardi, C
Luches, P
di Bona, A
Borghi, A
Valeri, S
Citation: C. Giovanardi et al., Structure and growth mode of thin Co films on Fe(001): comparison of purely thermal and ion-assisted deposition, THIN SOL FI, 397(1-2), 2001, pp. 116-124
Citation: Hs. Mavi et al., Photoluminescence and Raman study of porous silicon synthesized by visibleand infrared laser etching, THIN SOL FI, 397(1-2), 2001, pp. 125-132
Authors:
Fukuma, T
Kobayashi, K
Horiuchi, T
Yamada, H
Matsushige, K
Citation: T. Fukuma et al., Structures and local electrical properties of ferroelectric polymer thin films in thermal process investigated by dynamic-mode atomic force microscopy, THIN SOL FI, 397(1-2), 2001, pp. 133-137
Citation: A. Travlos et al., Epitaxial dysprosium silicide films on silicon: growth, structure and electrical properties, THIN SOL FI, 397(1-2), 2001, pp. 138-142
Citation: L. Zhang et Rs. Subramanian, A model of abrasive-free removal of copper films using an aqueous hydrogenperoxide-glycine solution, THIN SOL FI, 397(1-2), 2001, pp. 143-151