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Results:
1-12
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Results: 12
Authors:
HEIMBROOK LA
BAIOCCHI FA
BITTNER TC
GEVA M
LUFTMAN HS
NAKAHARA S
Citation: La. Heimbrook et al., PRACTICAL PERSPECTIVE OF SHALLOW JUNCTION ANALYSIS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(1), 1996, pp. 202-212
Authors:
GRAEBNER JE
MUCHA JA
BAIOCCHI FA
Citation: Je. Graebner et al., SOURCES OF THERMAL-RESISTANCE IN CHEMICALLY VAPOR-DEPOSITED DIAMOND, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 682-687
Authors:
HUTTON RS
STEIN SM
BOYCE CH
CIRELLI RA
TAYLOR GN
BAIOCCHI FA
KOVALCHICK J
WHEELER DR
Citation: Rs. Hutton et al., POSITIVE-TONE SILYLATED, DRY-DEVELOPED, DEEP-ULTRAVIOLET RESIST WITH 0.2 MU-M RESOLUTION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3919-3924
Authors:
UHRICH KE
REICHMANIS E
BAIOCCHI FA
Citation: Ke. Uhrich et al., INFLUENCE OF POLYMER STRUCTURE ON THE MISCIBILITY OF PHOTOACID GENERATORS, Chemistry of materials, 6(3), 1994, pp. 295-301
Authors:
FRATELLO VJ
LICHT SJ
BRANDLE CD
OBRYAN HM
BAIOCCHI FA
Citation: Vj. Fratello et al., EFFECT OF BISMUTH DOPING ON THERMAL-EXPANSION AND MISFIT DISLOCATIONSIN EPITAXIAL IRON GARNETS, Journal of crystal growth, 142(1-2), 1994, pp. 93-102
Authors:
KATZ A
PEARTON SJ
NAKAHARA S
BAIOCCHI FA
LANE E
KOVALCHICK J
Citation: A. Katz et al., TANTALUM NITRIDE FILMS AS RESISTORS ON CHEMICAL-VAPOR-DEPOSITED DIAMOND SUBSTRATES (VOL 73, PG 5208, 1993), Journal of applied physics, 75(5), 1994, pp. 2736-2736
Authors:
GEORGIOU GE
ABIKO H
BAIOCCHI FA
HA NT
NAKAHARA S
Citation: Ge. Georgiou et al., THERMAL-STABILITY LIMITS OF THIN TISI2 - EFFECT ON SUBMICRON LINE RESISTANCE AND SHALLOW JUNCTION LEAKAGE, Journal of the Electrochemical Society, 141(5), 1994, pp. 1351-1356
Authors:
KATZ A
WANG KW
BAIOCCHI FA
DAUTREMONTSMITH WC
LANE E
LUFTMAN HS
VARMA RR
CURNAN H
Citation: A. Katz et al., TI PT/AU-SN METALLIZATION SCHEME FOR BONDING OF INP-BASED LASER-DIODES TO CHEMICAL-VAPOR-DEPOSITED DIAMOND SUBMOUNTS/, Materials chemistry and physics, 33(3-4), 1993, pp. 281-288
Authors:
GUINN KV
DONNELLY VM
GROSS ME
BAIOCCHI FA
PETROV I
GREENE JE
Citation: Kv. Guinn et al., DECOMPOSITION OF HEXAFLUOROACETYLACETONATE CU(I) VINYLTRIMETHYLSILANEON, AND DIFFUSION OF CU INTO SINGLE-CRYSTAL AND POLYCRYSTALLINE TITANIUM NITRIDE, Surface science, 295(1-2), 1993, pp. 219-229
Authors:
KATZ A
PEARTON SJ
NAKAHARA S
BAIOCCHI FA
LANE E
KOVALCHICK J
Citation: A. Katz et al., TANTALUM NITRIDE FILMS AS RESISTORS ON CHEMICAL-VAPOR-DEPOSITED DIAMOND SUBSTRATES, Journal of applied physics, 73(10), 1993, pp. 5208-5212
Authors:
KATZ A
FEINGOLD A
MORIYA N
NAKAHARA S
ABERNATHY CR
PEARTON SJ
ELROY A
GEVA M
BAIOCCHI FA
LUTHER LC
LANE E
Citation: A. Katz et al., GROWTH OF INP EPITAXIAL LAYERS BY RAPID THERMAL LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION, USING TERTIARYBUTYLPHOSPHINE, Applied physics letters, 63(21), 1993, pp. 2958-2960
Authors:
KATZ A
FEINGOLD A
MORIYA N
PEARTON SJ
GEVA M
BAIOCCHI FA
LUTHER LC
LANE E
Citation: A. Katz et al., RAPID THERMAL LOW-PRESSURE METALORGANIC CHEMICAL-VAPOR-DEPOSITION OF IN0.53GA0.47AS FILMS USING TERTIARYBUTYLARSINE, Applied physics letters, 63(19), 1993, pp. 2679-2681
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