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Results: 1-20 |
Results: 20
ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS
Authors: WASKIEWICZ WK HARRIOTT LR LIDDLE JA STANTON ST BERGER SD MUNRO E ZHU X
Citation: Wk. Waskiewicz et al., ELECTRON-OPTICS METHOD FOR HIGH-THROUGHPUT IN A SCALPEL SYSTEM - PRELIMINARY-ANALYSIS, Microelectronic engineering, 42, 1998, pp. 215-218
PARITY EFFECT IN A SMALL SUPERCONDUCTING PARTICLE
Authors: BERGER SD HALPERIN BI
Citation: Sd. Berger et Bi. Halperin, PARITY EFFECT IN A SMALL SUPERCONDUCTING PARTICLE, Physical review. B, Condensed matter, 58(9), 1998, pp. 5213-5214
RELATION OF SMOKING TO BREAST-CANCER BY ESTROGEN-RECEPTOR STATUS
Authors: MORABIA A BERNSTEIN M RUIZ J HERITIER S BERGER SD BORISCH B
Citation: A. Morabia et al., RELATION OF SMOKING TO BREAST-CANCER BY ESTROGEN-RECEPTOR STATUS, International journal of cancer, 75(3), 1998, pp. 339-342
ADENOID CYSTIC-CARCINOMA OF THE BREAST - UTILITY OF IMMUNOCYTOCHEMICAL STUDY WITH COLLAGEN-IV ON FINE-NEEDLE-ASPIRATION
Authors: QUINODOZ IS BERGER SD SCHAFER P REMADI S
Citation: Is. Quinodoz et al., ADENOID CYSTIC-CARCINOMA OF THE BREAST - UTILITY OF IMMUNOCYTOCHEMICAL STUDY WITH COLLAGEN-IV ON FINE-NEEDLE-ASPIRATION, Diagnostic cytopathology, 16(5), 1997, pp. 442-445
THE SCALPEL PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DEMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., THE SCALPEL PROOF-OF-CONCEPT SYSTEM, Microelectronic engineering, 35(1-4), 1997, pp. 477-480
PAPILLARY-CYSTIC TUMOR OF THE PANCREAS
Authors: REMADI S MACGEE W DOUSSISANAGNOSTOPOULOU I BERGER SD ISMAIL A
Citation: S. Remadi et al., PAPILLARY-CYSTIC TUMOR OF THE PANCREAS, Diagnostic cytopathology, 15(5), 1996, pp. 398-402
HIGH EMITTANCE ELECTRON-GUN FOR PROJECTION LITHOGRAPHY
Authors: DEVORE W BERGER SD
Citation: W. Devore et Sd. Berger, HIGH EMITTANCE ELECTRON-GUN FOR PROJECTION LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3764-3769
PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM
Authors: HARRIOTT LR BERGER SD BIDDICK C BLAKEY MI BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J DIMARCO R FARROW RC FELKER JA FETTER L FREEMAN R HOPKINS L HUGGINS HA KNUREK CS KRAUS JS LIDDLE JA MKRTYCHAN M NOVEMBRE AE PEABODY ML TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WERDER KS WINDT D
Citation: Lr. Harriott et al., PRELIMINARY-RESULTS FROM A PROTOTYPE PROJECTION ELECTRON-BEAM STEPPER-SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY PROOF-OF-CONCEPT SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3825-3828
MEASUREMENT OF THE BACKSCATTER COEFFICIENT USING RESIST RESPONSE CURVES FOR 20-100 KEV ELECTRON-BEAM LITHOGRAPHY ON SI
Authors: WATSON GP FU D BERGER SD TENNANT D FETTER L NOVEMBRE A BIDDICK C
Citation: Gp. Watson et al., MEASUREMENT OF THE BACKSCATTER COEFFICIENT USING RESIST RESPONSE CURVES FOR 20-100 KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4277-4282
THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM
Authors: LIDDLE JA BERGER SD BIDDICK CJ BLAKEY MI BOLAN KJ BOWLER SW BRADY K CAMARDA RM CONNELLY WF CRORKEN A CUSTY J FARROW RC FELKER JA FETTER LA FREEMAN B HARRIOTT LR HOPKINS L HUGGINS HA KNUREK CS KRAUS JS MIXON DA MKRTCHYAN MM NOVEMBRE AE PEABODY ML SIMPSON WM TARASCON RG WADE HH WASKIEWICZ WK WATSON GP WILLIAMS JK WINDT DL
Citation: Ja. Liddle et al., THE SCATTERING WITH ANGULAR LIMITATION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCALPEL) SYSTEM, JPN J A P 1, 34(12B), 1995, pp. 6663-6671
PROXIMITY EFFECT CORRECTION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY)
Authors: LIDDLE JA WATSON GP BERGER SD MILLER PD
Citation: Ja. Liddle et al., PROXIMITY EFFECT CORRECTION IN PROJECTION ELECTRON-BEAM LITHOGRAPHY (SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON-BEAM LITHOGRAPHY), JPN J A P 1, 34(12B), 1995, pp. 6672-6678
SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS
Authors: HARRIOTT LR BERGER SD LIDDLE JA WATSON GP MKRTCHYAN MM
Citation: Lr. Harriott et al., SPACE-CHARGE EFFECTS IN PROJECTION CHARGED-PARTICLE LITHOGRAPHY SYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2404-2408
A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE
Authors: WATSON GP BERGER SD LIDDLE JA WASKIEWICZ WK
Citation: Gp. Watson et al., A BACKGROUND DOSE PROXIMITY EFFECT CORRECTION TECHNIQUE FOR SCATTERING WITH ANGULAR LIMITATION PROJECTION ELECTRON LITHOGRAPHY IMPLEMENTED IN HARDWARE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2504-2507
PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI
Authors: WATSON GP BERGER SD LIDDLE JA FETTER LA FARROW RC TARASCON RG MKRTCHYAN M NOVEMBRE AE BLAKEY MI BOLAN KJ POLI L
Citation: Gp. Watson et al., PRECISE MEASUREMENT OF THE EFFECTIVE BACKSCATTER COEFFICIENT FOR 100-KEV ELECTRON-BEAM LITHOGRAPHY ON SI, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2535-2538
STOCHASTIC SCATTERING IN CHARGED-PARTICLE PROJECTION SYSTEMS - A NEAREST-NEIGHBOR APPROACH
Authors: MKRTCHYAN MM LIDDLE JA BERGER SD HARRIOTT LR GIBSON JM SCHWARTZ AM
Citation: Mm. Mkrtchyan et al., STOCHASTIC SCATTERING IN CHARGED-PARTICLE PROJECTION SYSTEMS - A NEAREST-NEIGHBOR APPROACH, Journal of applied physics, 78(12), 1995, pp. 6888-6902
LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV
Authors: TARASCON RG BOLAN K BLAKEY M CAMARDA RM FARROW RC FETTER LA HUGGINS HA KRAUS JS LIDDLE JA MIXON DA NOVEMBRE AE WATSON GP BERGER SD
Citation: Rg. Tarascon et al., LITHOGRAPHIC PERFORMANCE OF A NEGATIVE RESIST UNDER SCATTERING WITH ANGULAR LIMITATION FOR PROJECTION ELECTRON LITHOGRAPHY EXPOSURE AT 100 KEV, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3444-3448
AN ANALYTICAL MODEL OF STOCHASTIC INTERACTION EFFECTS IN PROJECTION SYSTEMS USING A NEAREST-NEIGHBOR APPROACH
Authors: MKRTCHYAN MM LIDDLE JA BERGER SD HARRIOTT LR SCHWARTZ AM GIBSON JM
Citation: Mm. Mkrtchyan et al., AN ANALYTICAL MODEL OF STOCHASTIC INTERACTION EFFECTS IN PROJECTION SYSTEMS USING A NEAREST-NEIGHBOR APPROACH, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3508-3512
ENERGY-FILTERING THE THERMAL DIFFUSE BACKGROUND IN ELECTRON-DIFFRACTION
Authors: EAGLESHAM DJ BERGER SD
Citation: Dj. Eaglesham et Sd. Berger, ENERGY-FILTERING THE THERMAL DIFFUSE BACKGROUND IN ELECTRON-DIFFRACTION, Ultramicroscopy, 53(4), 1994, pp. 319-324
MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY
Authors: FARROW RC LIDDLE JA BERGER SD HUGGINS HA KRAUS JS CAMARDA RM TARASCON RG JURGENSEN CW KOLA RR FETTER L
Citation: Rc. Farrow et al., MARKS FOR ALIGNMENT AND REGISTRATION IN PROJECTION ELECTRON LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2175-2178
PARTICLE-PARTICLE INTERACTION EFFECTS IN IMAGE PROJECTION LITHOGRAPHYSYSTEMS
Authors: BERGER SD EAGLESHAM DJ FARROW RC FREEMAN RR KRAUS JS LIDDLE JA
Citation: Sd. Berger et al., PARTICLE-PARTICLE INTERACTION EFFECTS IN IMAGE PROJECTION LITHOGRAPHYSYSTEMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2294-2298
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