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Results: 1-11 |
Results: 11

Authors: WOOD OR WHITE DL BJORKHOLM JE FETTER LE TENNANT DM MACDOWELL AA LAFONTAINE B KUBIAK GD
Citation: Or. Wood et al., USE OF ATTENUATED PHASE MASKS IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2448-2451

Authors: KANIA DR GAINES DP SWEENEY DS SOMMARGREN GE LAFONTAINE B VERNON SP TICHENOR DA BJORKHOLM JE ZERNIKE F KESTNER RN
Citation: Dr. Kania et al., PRECISION OPTICAL ASPHERES FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3706-3708

Authors: BJORKHOLM JE MACDOWELL AA WOOD OR TAN Z LAFONTAINE B TENNANT DM
Citation: Je. Bjorkholm et al., PHASE-MEASURING INTERFEROMETRY USING EXTREME-ULTRAVIOLET RADIATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2919-2922

Authors: WHITE DL WOOD OR BJORKHOLM JE SPECTOR S MACDOWELL AA LAFONTAINE B
Citation: Dl. White et al., MODIFICATION OF THE COHERENCE OF UNDULATOR RADIATION, Review of scientific instruments, 66(2), 1995, pp. 1930-1933

Authors: TAN ZQ MACDOWELL AA LAFONTAINE B BJORKHOLM JE TENNANT D TAYLOR D HIMEL M FREEMAN RR WASKIEWICZ WK WINDT DL SPECTOR S RAYCHAUDHURI AK STULEN RH NG W CERRINA F
Citation: Zq. Tan et al., AT-WAVELENGTH METROLOGY OF 13-NM LITHOGRAPHY IMAGING OPTICS, Review of scientific instruments, 66(2), 1995, pp. 2241-2243

Authors: LAFONTAINE B MACDOWELL AA TAN ZQ WHITE DL TAYLOR GN WOOD OR BJORKHOLM JE TENNANT DM HULBERT SL
Citation: B. Lafontaine et al., SUBMICRON, SOFT-X-RAY FLUORESCENCE IMAGING, Applied physics letters, 66(3), 1995, pp. 282-284

Authors: KUBIAK GD TICHENOR DA RAYCHAUDHURI AK MALINOWSKI ME STULEN RH HANEY SJ BERGER KW NISSEN RP WILKERSON GA PAUL PH BJORKHOLM JE FETTER LA FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR WASKIEWICZ WK WHITE DL WINDT DL JEWELL TE
Citation: Gd. Kubiak et al., CHARACTERIZATION OF AN EXPANDED-FIELD SCHWARZSCHILD OBJECTIVE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3820-3825

Authors: WOOD OR BJORKHOLM JE FETTER L HIMEL MD TENNANT DM MACDOWELL AA LAFONTAINE B GRIFFITH JE TAYLOR GN WASKIEWICZ WK WINDT DL KORTRIGHT JB GULLIKSON EK NGUYEN K
Citation: Or. Wood et al., WAVELENGTH DEPENDENCE OF THE RESIST SIDEWALL ANGLE IN EXTREME-ULTRAVIOLET LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3841-3845

Authors: SPECTOR SJ TENNANT DM TAN Z BJORKHOLM JE
Citation: Sj. Spector et al., FABRICATION OF DIFFRACTIVE OPTICAL-COMPONENTS FOR AN EXTREME-ULTRAVIOLET SHEARING INTERFEROMETER, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3846-3850

Authors: TICHENOR DA KUBIAK GD MALINOWSKI ME STULEN RH HANEY SJ BERGER KW BROWN LA SWEATT WC BJORKHOLM JE FREEMAN RR HIMEL MD MACDOWELL AA TENNANT DM WOOD OR BOKOR J JEWELL TE MANSFIELD WM WASKIEWICZ WK WHITE DL WINDT DL
Citation: Da. Tichenor et al., SOFT-X-RAY PROJECTION LITHOGRAPHY EXPERIMENTS USING SCHWARZSCHILD IMAGING OPTICS, Applied optics, 32(34), 1993, pp. 7068-7071

Authors: MACDOWELL AA BJORKHOLM JE EARLY K FREEMAN RR HIMEL MD MULGREW PP SZETO LH TAYLOR DW TENNANT DM WOOD OR BOKOR J EICHNER L JEWELL TE WASKIEWICZ WK WHITE DL WINDT DL DSOUZA RM SILFVAST WT ZERNIKE F
Citation: Aa. Macdowell et al., SOFT-X-RAY PROJECTION IMAGING WITH A 1 1 RING-FIELD OPTIC/, Applied optics, 32(34), 1993, pp. 7072-7078
Risultati: 1-11 |