Authors:
GOGUENHEIM D
BRAVAIX A
VUILLAUME D
VARROT M
REVIL N
MORTINI P
Citation: D. Goguenheim et al., HOT-CARRIER RELIABILITY IN N-MOSFETS USED AS PASS-TRANSISTORS, Microelectronics and reliability, 38(4), 1998, pp. 539-544
Authors:
GOGUENHEIM D
BRAVAIX A
VUILLAUME D
MONDON F
CANDELIER P
JOURDAIN M
MEINERTZHAGEN A
Citation: D. Goguenheim et al., A COUPLED I(V) AND CHARGE-PUMPING ANALYSIS OF STRESS-INDUCED LEAKAGE CURRENTS IN 5NM-THICK GATE OXIDES, Microelectronic engineering, 36(1-4), 1997, pp. 141-144
Authors:
BRAVAIX A
GOGUENHEIM D
VUILLAUME D
REVIL N
VARROT M
MORTINI P
Citation: A. Bravaix et al., INFLUENCES OF THE DIFFERENT DEGRADATION MECHANISMS IN AC-STRESSED P-MOSFETS DURING PASS TRANSISTOR OPERATION, Microelectronic engineering, 36(1-4), 1997, pp. 305-308
Citation: A. Bravaix et D. Vuillaume, ANALYSIS OF THE HOT-CARRIER DEGRADATION OF DEEP-SUBMICROMETER LARGE-ANGLE-TILT-IMPLANTED DRAIN (LATID) MOSFETS, Solid-state electronics, 41(9), 1997, pp. 1293-1301
Authors:
VUILLAUME D
BRAVAIX A
GOGUENHEIM D
MARCHETAUX JC
BOUDOU A
Citation: D. Vuillaume et al., HOT-HOLE INDUCED NEGATIVE OXIDE CHARGES IN N-MOSFETS, I.E.E.E. transactions on electron devices, 43(9), 1996, pp. 1473-1474
Authors:
BRAVAIX A
VUILLAUME D
GOGUENHEIM D
DORVAL D
HAOND M
Citation: A. Bravaix et al., IMPROVED HOT-CARRIER IMMUNITY OF P-MOSFETS WITH 8NM THICK NITRIDED GATE-OXIDE DURING BIDIRECTIONAL STRESSING, Microelectronic engineering, 28(1-4), 1995, pp. 273-276
Authors:
BRAVAIX A
VUILLAUME D
THIRION V
DORVAL D
STRABONI A
Citation: A. Bravaix et al., DAMAGE-INDUCED BY CARRIER INJECTION IN 8 NM THICK OXIDES AND NITRIDEDOXIDES, Journal of non-crystalline solids, 187, 1995, pp. 365-368
Citation: A. Bravaix et D. Vuillaume, LIFETIME PREDICTION METHODS FOR P-MOSFETS - A COMPARATIVE-STUDY OF STANDARD AND CHARGE-PUMPING LIFETIME CRITERIA, I.E.E.E. transactions on electron devices, 42(1), 1995, pp. 101-108