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Results: 1-12 |
Results: 12
Processing optimization of solution derived PbZr1-xTixO3 thin films for piezoelectric applications
Authors: Seifert, A Ledermann, N Hiboux, S Baborowski, J Muralt, P Setter, N
Citation: A. Seifert et al., Processing optimization of solution derived PbZr1-xTixO3 thin films for piezoelectric applications, INTEGR FERR, 35(1-4), 2001, pp. 1889-1896
Piezoelectric cantilever microphone for photoacoustic GAS detector
Authors: Ledermann, N Baborowski, J Seifert, A Willing, B Hiboux, S Muralt, P Setter, N Forster, M
Citation: N. Ledermann et al., Piezoelectric cantilever microphone for photoacoustic GAS detector, INTEGR FERR, 35(1-4), 2001, pp. 1907-1914
Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor
Authors: Baborowski, J Muralt, P Ledermann, N Colla, E Seifert, A Gentil, S Setter, N
Citation: J. Baborowski et al., Mechanisms of Pb(Zr0.53Ti0.47)O-3 thin film etching with ECR/RF reactor, INTEGR FERR, 31(1-4), 2000, pp. 261-271
Sputtered silicon carbide thin films as protective coating for MEMS applications
Authors: Ledermann, N Baborowski, J Muralt, P Xantopoulos, N Tellenbach, JM
Citation: N. Ledermann et al., Sputtered silicon carbide thin films as protective coating for MEMS applications, SURF COAT, 125(1-3), 2000, pp. 246-250
Etching of RuO2 and Pt thin films with ECR/RF reactor
Authors: Baborowski, J Muralt, P Ledermann, N Hiboux, S
Citation: J. Baborowski et al., Etching of RuO2 and Pt thin films with ECR/RF reactor, VACUUM, 56(1), 2000, pp. 51-56
Downscaling of Pb(Zr,Ti)O-3 film thickness for low-voltage ferroelectric capacitors: Effect of charge relaxation at the interfaces
Authors: Stolichnov, I Tagantsev, A Colla, E Gentil, S Hiboux, S Baborowski, J Muralt, P Setter, N
Citation: I. Stolichnov et al., Downscaling of Pb(Zr,Ti)O-3 film thickness for low-voltage ferroelectric capacitors: Effect of charge relaxation at the interfaces, J APPL PHYS, 88(4), 2000, pp. 2154-2156
Etching of platinum thin films with dual frequency ECR/RF reactor
Authors: Baborowski, J Muralt, P Ledermann, N
Citation: J. Baborowski et al., Etching of platinum thin films with dual frequency ECR/RF reactor, INTEGR FERR, 27(1-4), 1999, pp. 1287-1300
Surface chemical characterization of copper oxide and its relationship to adhesion in formed epoxy/copper interfaces
Authors: Love, BJ Baborowski, J Charbonnier, M Romand, M
Citation: Bj. Love et al., Surface chemical characterization of copper oxide and its relationship to adhesion in formed epoxy/copper interfaces, J ADHESION, 69(1-2), 1999, pp. 165-179
Fabrication and characterization of micromachined accelerometers based on PZT thin films
Authors: Baborowski, J Hediger, S Muralt, P Wuethrich, C
Citation: J. Baborowski et al., Fabrication and characterization of micromachined accelerometers based on PZT thin films, FERROELECTR, 224(1-4), 1999, pp. 711-718
The effect of bottom electrode on the performance of thin film based capacitors in the gigahertz region
Authors: Dube, DC Baborowski, J Muralt, P Setter, N
Citation: Dc. Dube et al., The effect of bottom electrode on the performance of thin film based capacitors in the gigahertz region, APPL PHYS L, 74(23), 1999, pp. 3546-3548
X-ray emission characterization of carbon and carbon nitride films obtained by physical vapor deposition
Authors: Baborowski, J Charbonnier, M Romand, M
Citation: J. Baborowski et al., X-ray emission characterization of carbon and carbon nitride films obtained by physical vapor deposition, J PHYS IV, 8(P5), 1998, pp. 279-286
X-ray emission analysis of copper oxide films formed on copper substrates
Authors: Baborowski, J Love, BJ Romand, M Charbonnier, M
Citation: J. Baborowski et al., X-ray emission analysis of copper oxide films formed on copper substrates, J PHYS IV, 8(P5), 1998, pp. 287-293
Risultati: 1-12 |